KR100236273B1 - 클린룸용 보관고 - Google Patents

클린룸용 보관고 Download PDF

Info

Publication number
KR100236273B1
KR100236273B1 KR1019930000637A KR930000637A KR100236273B1 KR 100236273 B1 KR100236273 B1 KR 100236273B1 KR 1019930000637 A KR1019930000637 A KR 1019930000637A KR 930000637 A KR930000637 A KR 930000637A KR 100236273 B1 KR100236273 B1 KR 100236273B1
Authority
KR
South Korea
Prior art keywords
container
storage
cleaning
lid
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019930000637A
Other languages
English (en)
Korean (ko)
Other versions
KR930016317A (ko
Inventor
히또시 가와노
앗쯔시 오꾸노
마사노리 쯔다
미쯔히로 하야시
뎃베이 야마시따
마사나오 무라다
쯔요시 다나까
데루야 모리따
아끼오 나까무라
Original Assignee
이노마다 시게오
신코덴키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이노마다 시게오, 신코덴키 가부시키가이샤 filed Critical 이노마다 시게오
Publication of KR930016317A publication Critical patent/KR930016317A/ko
Application granted granted Critical
Publication of KR100236273B1 publication Critical patent/KR100236273B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3406—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door or cover
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3404—Storage means

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Ventilation (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1019930000637A 1992-01-27 1993-01-20 클린룸용 보관고 Expired - Fee Related KR100236273B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP92-12311 1992-01-27
JP04012311A JP3082389B2 (ja) 1992-01-27 1992-01-27 クリーンルーム用保管庫

Publications (2)

Publication Number Publication Date
KR930016317A KR930016317A (ko) 1993-08-26
KR100236273B1 true KR100236273B1 (ko) 1999-12-15

Family

ID=11801776

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930000637A Expired - Fee Related KR100236273B1 (ko) 1992-01-27 1993-01-20 클린룸용 보관고

Country Status (3)

Country Link
JP (1) JP3082389B2 (https=)
KR (1) KR100236273B1 (https=)
TW (1) TW227545B (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530081U (ja) * 1991-09-25 1993-04-20 新明和工業株式会社 フツク格納式クレーン
WO1996030288A1 (en) * 1995-03-27 1996-10-03 Toyo Umpanki Co., Ltd. Container handling device and control system
US5980183A (en) * 1997-04-14 1999-11-09 Asyst Technologies, Inc. Integrated intrabay buffer, delivery, and stocker system
US6379096B1 (en) * 1999-02-22 2002-04-30 Scp Global Technologies, Inc. Buffer storage system
CN100468697C (zh) * 2005-08-16 2009-03-11 力晶半导体股份有限公司 半导体元件的制造方法
CN100446220C (zh) * 2005-08-16 2008-12-24 力晶半导体股份有限公司 半导体元件的制造方法
EP2453310B1 (en) * 2006-06-19 2015-12-09 Entegris, Inc. System for purging reticle storage
KR100958793B1 (ko) * 2007-09-28 2010-05-18 주식회사 실트론 웨이퍼 쉽핑박스의 세정을 위한 박스 크리너
JP4412391B2 (ja) * 2007-11-16 2010-02-10 村田機械株式会社 搬送車システム
JP2009196748A (ja) 2008-02-20 2009-09-03 Murata Mach Ltd 載置台
US11501991B2 (en) * 2016-06-08 2022-11-15 Murata Machinery, Ltd. Container storage and container storage method
CN111365957B (zh) * 2020-04-16 2023-05-09 重庆电力高等专科学校 镀铬管清洗烘干生产线
KR102709447B1 (ko) * 2021-12-27 2024-09-26 세메스 주식회사 세정 모듈, 보관 시스템 및 보관 장치의 세정 방법
US12569097B2 (en) 2021-12-27 2026-03-10 Semes Co., Ltd. Cleaning module, storage system, and cleaning method for storage apparatus
CN115215030B (zh) * 2022-07-14 2024-03-19 深圳市创新特科技有限公司 一种用于无尘室的立体仓储系统
CN116788695B (zh) * 2023-07-12 2026-02-24 山东省农业科学院 一种生物农药低温贮存系统
CN117246669B (zh) * 2023-10-07 2025-11-28 捷螺智能设备(苏州)有限公司 一种晶圆储存盒仓储用自动化存取一体柜

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6036205A (ja) * 1983-08-08 1985-02-25 Hitachi Ltd 収納装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4995430A (en) 1989-05-19 1991-02-26 Asyst Technologies, Inc. Sealable transportable container having improved latch mechanism

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6036205A (ja) * 1983-08-08 1985-02-25 Hitachi Ltd 収納装置

Also Published As

Publication number Publication date
TW227545B (https=) 1994-08-01
KR930016317A (ko) 1993-08-26
JPH05201506A (ja) 1993-08-10
JP3082389B2 (ja) 2000-08-28

Similar Documents

Publication Publication Date Title
KR100236273B1 (ko) 클린룸용 보관고
US5363867A (en) Article storage house in a clean room
KR102606448B1 (ko) 박판 형상 기판 유지 장치 및 유지 장치를 구비하는 반송 로봇
JP3277550B2 (ja) 可搬式密閉コンテナ用ガスパージユニット
JP4729237B2 (ja) 材料搬送システム乃至方法、搬入ポートモジュール
US5697750A (en) Controlled environment enclosure and mechanical interface
KR102626528B1 (ko) 국소 퍼지 기능을 갖는 반송 장치
KR100304127B1 (ko) 가반식 밀폐 컨테이너를 사용한 전자기판 처리시스템과 그의 장치
KR100406337B1 (ko) 기판이송및처리시스템
CN101048327B (zh) 搬运系统及基板处理装置
US5806574A (en) Portable closed container
JPH05286567A (ja) クリーンルーム用密閉式コンテナ
TWI867379B (zh) Ｅｆｅｍ及ｅｆｅｍ之氣體置換方法
CN106856664A (zh) 装载口及装载口的气氛置换方法
KR20080012116A (ko) 클린 스토커와 물품의 보관방법
KR19990082011A (ko) 진공 일체형 표준 메카니컬 인터페이스 시스템
CN101409220A (zh) 被处理体的导入口机构和处理系统
JPH081923B2 (ja) クリーン搬送方法及び装置
KR20050010944A (ko) 수직 캐로셀과 오버헤드 호이스트의 조합을 기본으로 하는반도체 제조를 위한 자동화 재료 처리 시스템
JPH10256346A (ja) カセット搬出入機構及び半導体製造装置
JP2982461B2 (ja) クリーンルーム用保管庫
JP3769425B2 (ja) 電子部品の製造装置および電子部品の製造方法
JP3240698B2 (ja) 可搬式密閉コンテナのパージステーション
JPH1074815A (ja) 搬送方法及びその装置
JPH04233747A (ja) キャリアストッカ

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R14-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

FPAY Annual fee payment

Payment date: 20110823

Year of fee payment: 13

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20120930

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20120930

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000