KR0142107B1 - Method of forming electric circuit using anodic oxidation - Google Patents
Method of forming electric circuit using anodic oxidationInfo
- Publication number
- KR0142107B1 KR0142107B1 KR97015859A KR19970015859A KR0142107B1 KR 0142107 B1 KR0142107 B1 KR 0142107B1 KR 97015859 A KR97015859 A KR 97015859A KR 19970015859 A KR19970015859 A KR 19970015859A KR 0142107 B1 KR0142107 B1 KR 0142107B1
- Authority
- KR
- South Korea
- Prior art keywords
- electric circuit
- anodic oxidation
- forming electric
- forming
- anodic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823475—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type interconnection or wiring or contact manufacturing related aspects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
- H01L21/28079—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being a single metal, e.g. Ta, W, Mo, Al
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/911—Differential oxidation and etching
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14331992 | 1992-05-09 | ||
JP28235292A JP3150792B2 (ja) | 1992-05-09 | 1992-09-28 | 電子回路の作製方法 |
JP36019292A JP3121944B2 (ja) | 1992-05-09 | 1992-12-28 | 電子回路の作製方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR0142107B1 true KR0142107B1 (en) | 1998-07-15 |
Family
ID=27318616
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930007911A KR0119467B1 (ko) | 1992-05-09 | 1993-05-08 | 전자회로 |
KR97015859A KR0142107B1 (en) | 1992-05-09 | 1997-04-28 | Method of forming electric circuit using anodic oxidation |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930007911A KR0119467B1 (ko) | 1992-05-09 | 1993-05-08 | 전자회로 |
Country Status (3)
Country | Link |
---|---|
US (3) | US5576225A (ko) |
KR (2) | KR0119467B1 (ko) |
CN (1) | CN1115722C (ko) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5468987A (en) * | 1991-03-06 | 1995-11-21 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for forming the same |
KR960001611B1 (ko) | 1991-03-06 | 1996-02-02 | 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 | 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법 |
US6624450B1 (en) | 1992-03-27 | 2003-09-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for forming the same |
US5576225A (en) * | 1992-05-09 | 1996-11-19 | Semiconductor Energy Laboratory Co., Ltd. | Method of forming electric circuit using anodic oxidation |
US6624477B1 (en) | 1992-10-09 | 2003-09-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
TW232751B (en) * | 1992-10-09 | 1994-10-21 | Semiconductor Energy Res Co Ltd | Semiconductor device and method for forming the same |
JPH0730125A (ja) * | 1993-07-07 | 1995-01-31 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JPH08250743A (ja) * | 1995-03-07 | 1996-09-27 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
JPH08250746A (ja) * | 1995-03-13 | 1996-09-27 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
US5866444A (en) * | 1995-03-21 | 1999-02-02 | Semiconductor Energy Laboratory Co. | Integrated circuit and method of fabricating the same |
JP3474309B2 (ja) * | 1995-03-24 | 2003-12-08 | 株式会社半導体エネルギー研究所 | アクティブマトリクス型の液晶表示装置の作製方法 |
JP3176253B2 (ja) * | 1995-05-25 | 2001-06-11 | シャープ株式会社 | 回路基板 |
JP3299888B2 (ja) * | 1996-07-10 | 2002-07-08 | 富士通株式会社 | プラズマディスプレイパネル及びその製造方法 |
US6037713A (en) * | 1996-11-25 | 2000-03-14 | Fujitsu Limited | Display panel having compound film covered electrodes |
US6576069B1 (en) | 1998-05-22 | 2003-06-10 | Cabot Corporation | Tantalum-silicon alloys and products containing the same and processes of making the same |
EP1041641B1 (en) | 1999-03-26 | 2015-11-04 | Semiconductor Energy Laboratory Co., Ltd. | A method for manufacturing an electrooptical device |
JP4827276B2 (ja) | 1999-07-05 | 2011-11-30 | 株式会社半導体エネルギー研究所 | レーザー照射装置、レーザー照射方法及び半導体装置の作製方法 |
TW544727B (en) * | 1999-08-13 | 2003-08-01 | Semiconductor Energy Lab | Method of manufacturing a semiconductor device |
US6548370B1 (en) | 1999-08-18 | 2003-04-15 | Semiconductor Energy Laboratory Co., Ltd. | Method of crystallizing a semiconductor layer by applying laser irradiation that vary in energy to its top and bottom surfaces |
US7078321B2 (en) | 2000-06-19 | 2006-07-18 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method of manufacturing the same |
US6610612B2 (en) * | 2000-12-13 | 2003-08-26 | The University Of Maryland | Method of efficient controllable and repeatable wet oxidation in a phosphorous-rich III-V material system |
US6659331B2 (en) * | 2002-02-26 | 2003-12-09 | Applied Materials, Inc | Plasma-resistant, welded aluminum structures for use in semiconductor apparatus |
TWI266108B (en) * | 2003-05-01 | 2006-11-11 | Seiko Epson Corp | Electrical wiring structure, manufacturing method of electrical c wiring structure, substrate for optical device having electrical wiring structure and electro-optical device, and method for manufacturing electro-optical device |
US8461628B2 (en) * | 2005-03-18 | 2013-06-11 | Kovio, Inc. | MOS transistor with laser-patterned metal gate, and method for making the same |
US9165917B2 (en) * | 2009-05-28 | 2015-10-20 | Globalfoundries Inc. | In-line stacking of transistors for soft error rate hardening |
US8102033B2 (en) * | 2009-05-28 | 2012-01-24 | International Business Machines Corporation | Reduced soft error rate through metal fill and placement |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3775262A (en) * | 1972-02-09 | 1973-11-27 | Ncr | Method of making insulated gate field effect transistor |
GB2107115B (en) * | 1981-07-17 | 1985-05-09 | Citizen Watch Co Ltd | Method of manufacturing insulated gate thin film effect transitors |
FR2588418B1 (fr) * | 1985-10-03 | 1988-07-29 | Bull Sa | Procede de formation d'un reseau metallique multicouche d'interconnexion des composants d'un circuit integre de haute densite et circuit integre en resultant |
US5262336A (en) * | 1986-03-21 | 1993-11-16 | Advanced Power Technology, Inc. | IGBT process to produce platinum lifetime control |
KR920000077B1 (ko) * | 1987-07-28 | 1992-01-06 | 가부시키가이샤 도시바 | 반도체장치의 제조방법 |
US5166085A (en) * | 1987-09-09 | 1992-11-24 | Casio Computer Co., Ltd. | Method of manufacturing a thin film transistor |
JPH0690373B2 (ja) * | 1987-11-19 | 1994-11-14 | シャープ株式会社 | アクティブマトリクス基板 |
US4960719A (en) * | 1988-02-04 | 1990-10-02 | Seikosha Co., Ltd. | Method for producing amorphous silicon thin film transistor array substrate |
GB2220792B (en) * | 1988-07-13 | 1991-12-18 | Seikosha Kk | Silicon thin film transistor and method for producing the same |
JP3009438B2 (ja) * | 1989-08-14 | 2000-02-14 | 株式会社日立製作所 | 液晶表示装置 |
ATE139866T1 (de) * | 1990-02-19 | 1996-07-15 | Canon Kk | Verfahren zum herstellen von abgeschiedener metallschicht, die aluminium als hauptkomponente enthält, mit anwendung von alkylaluminiumhydrid |
JPH04107831A (ja) * | 1990-08-27 | 1992-04-09 | Sharp Corp | 半導体装置の製造方法 |
KR960001611B1 (ko) * | 1991-03-06 | 1996-02-02 | 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 | 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법 |
JPH0824104B2 (ja) * | 1991-03-18 | 1996-03-06 | 株式会社半導体エネルギー研究所 | 半導体材料およびその作製方法 |
US5202274A (en) * | 1991-06-14 | 1993-04-13 | Samsung Electronics Co., Ltd. | Method of fabricating thin film transistor |
KR930005549B1 (ko) * | 1991-06-17 | 1993-06-23 | 삼성전자 주식회사 | 표시패널 및 그의 제조방법 |
US5576225A (en) * | 1992-05-09 | 1996-11-19 | Semiconductor Energy Laboratory Co., Ltd. | Method of forming electric circuit using anodic oxidation |
-
1993
- 1993-04-28 US US08/053,227 patent/US5576225A/en not_active Expired - Lifetime
- 1993-05-08 KR KR1019930007911A patent/KR0119467B1/ko not_active IP Right Cessation
-
1995
- 1995-06-02 US US08/460,426 patent/US5677559A/en not_active Expired - Lifetime
-
1996
- 1996-01-29 CN CN96103218A patent/CN1115722C/zh not_active Expired - Fee Related
-
1997
- 1997-04-28 KR KR97015859A patent/KR0142107B1/ko not_active IP Right Cessation
- 1997-06-30 US US08/885,872 patent/US5972742A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5677559A (en) | 1997-10-14 |
KR0119467B1 (ko) | 1997-10-17 |
US5576225A (en) | 1996-11-19 |
CN1115722C (zh) | 2003-07-23 |
KR930024138A (ko) | 1993-12-22 |
CN1145533A (zh) | 1997-03-19 |
US5972742A (en) | 1999-10-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A107 | Divisional application of patent | ||
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20110314 Year of fee payment: 14 |
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LAPS | Lapse due to unpaid annual fee |