KE2908A - Improvements in or relating to the processing of radiation-sensitive members - Google Patents

Improvements in or relating to the processing of radiation-sensitive members

Info

Publication number
KE2908A
KE2908A KE2908A KE290878A KE2908A KE 2908 A KE2908 A KE 2908A KE 2908 A KE2908 A KE 2908A KE 290878 A KE290878 A KE 290878A KE 2908 A KE2908 A KE 2908A
Authority
KE
Kenya
Prior art keywords
relating
radiation
processing
sensitive members
sensitive
Prior art date
Application number
KE2908A
Other languages
English (en)
Inventor
Hans Wielinga
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10304895&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KE2908(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vickers Ltd filed Critical Vickers Ltd
Publication of KE2908A publication Critical patent/KE2908A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
KE2908A 1974-07-08 1978-12-07 Improvements in or relating to the processing of radiation-sensitive members KE2908A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB30264/74A GB1513368A (en) 1974-07-08 1974-07-08 Processing of radiation-sensitive members

Publications (1)

Publication Number Publication Date
KE2908A true KE2908A (en) 1979-01-19

Family

ID=10304895

Family Applications (1)

Application Number Title Priority Date Filing Date
KE2908A KE2908A (en) 1974-07-08 1978-12-07 Improvements in or relating to the processing of radiation-sensitive members

Country Status (26)

Country Link
US (1) US4294910A (it)
JP (1) JPS612518B2 (it)
AT (1) AT356147B (it)
BE (1) BE831075A (it)
BR (1) BR7504303A (it)
CA (1) CA1061160A (it)
CH (1) CH600394A5 (it)
CS (1) CS212748B2 (it)
DD (1) DD120088A5 (it)
DE (1) DE2530422C2 (it)
DK (1) DK144956C (it)
ES (1) ES439238A1 (it)
FI (1) FI59680C (it)
FR (1) FR2277682A1 (it)
GB (1) GB1513368A (it)
HK (1) HK74778A (it)
IE (1) IE41395B1 (it)
IT (1) IT1039749B (it)
KE (1) KE2908A (it)
LU (1) LU72927A1 (it)
NL (1) NL187283C (it)
NO (1) NO151765C (it)
PL (1) PL109957B1 (it)
SE (1) SE415612B (it)
SU (1) SU569272A3 (it)
ZA (1) ZA754248B (it)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1534424A (en) * 1975-06-04 1978-12-06 Fuji Photo Film Co Ltd Process for the production of planographic printing plate
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
DE2855393A1 (de) * 1978-12-21 1980-07-03 Hoechst Ag Verfahren zum herstellen von flachdruckformen
US4259369A (en) * 1979-12-13 1981-03-31 International Business Machines Corporation Image hardening process
US4355096A (en) 1980-07-11 1982-10-19 American Hoechst Corporation Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof
GB2099371B (en) * 1981-06-01 1984-12-19 Polychrome Corp Finisher for lithographic printing plates
GB8314918D0 (en) * 1983-05-31 1983-07-06 Vickers Plc Radiation sensitive compositions
DE3410522A1 (de) * 1984-03-22 1985-10-03 Hoechst Ag, 6230 Frankfurt Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform
JPS6231859A (ja) * 1985-08-01 1987-02-10 Fuji Photo Film Co Ltd 製版方法
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
AU6629286A (en) * 1985-11-27 1987-07-01 Macdermid, Inc. Thermally stabilized photoresist images
CA1329719C (en) * 1987-07-31 1994-05-24 Tadao Toyama Lithographic printing plate and method of treating the same
GB8822956D0 (en) * 1988-09-30 1988-11-09 Cookson Graphics Plc Baking treatment of lithographic printing plate
US5180654A (en) * 1988-11-29 1993-01-19 E. I. Du Pont De Nemours And Company Processing radiation sensitive members with aqueous ethyl hexyl sulphate treatment prior to burn-in step
GB8918161D0 (en) * 1989-08-09 1989-09-20 Du Pont Improvements in or relating to radiation sensitive compounds
US5213950A (en) * 1991-01-30 1993-05-25 Sun Chemical Corporation Pre-bake printing plate composition
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
DE60037951T2 (de) 1999-05-21 2009-02-05 Fujifilm Corp. Fotoempfindliche Zusammensetzung und Flachdruckplatte, die diese Zusammensetzung verwendet
EP1211065B1 (en) 2000-11-30 2009-01-14 FUJIFILM Corporation Planographic printing plate precursor
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
JP4150261B2 (ja) 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP4471101B2 (ja) 2004-07-30 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL80569C (it) * 1949-07-23
US2958599A (en) * 1958-02-14 1960-11-01 Azoplate Corp Diazo compounds and printing plates manufactured therefrom
GB1059623A (en) * 1962-09-06 1967-02-22 Sumner Williams Inc Light-sensitive plates for use in the production of positive printing plates
DE1447963B2 (de) * 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US3482977A (en) * 1966-02-11 1969-12-09 Sylvania Electric Prod Method of forming adherent masks on oxide coated semiconductor bodies
US3652273A (en) * 1967-09-11 1972-03-28 Ibm Process using polyvinyl butral topcoat on photoresist layer
US3615937A (en) * 1968-06-17 1971-10-26 Ibm Plasticizer additive to photoresist for the reduction of pin holes
US3573975A (en) * 1968-07-10 1971-04-06 Ibm Photochemical fabrication process
US3586554A (en) * 1969-01-15 1971-06-22 Ibm Process for increasing photoresist adhesion to a semiconductor by treating the semiconductor with a disilylamide
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3707373A (en) * 1969-03-17 1972-12-26 Eastman Kodak Co Lithographic plate developers
US3705055A (en) * 1970-09-18 1972-12-05 Western Electric Co Method of descumming photoresist patterns
JPS5031485B2 (it) * 1971-12-28 1975-10-11
JPS5031486B2 (it) * 1971-12-28 1975-10-11
US3860426A (en) * 1972-12-22 1975-01-14 Eastman Kodak Co Subbed lithographic printing plate

Also Published As

Publication number Publication date
IE41395B1 (en) 1979-12-19
LU72927A1 (it) 1976-02-04
AT356147B (de) 1980-04-10
DK144956C (da) 1982-11-29
FI59680B (fi) 1981-05-29
NO752440L (it) 1976-01-09
DK306475A (da) 1976-01-09
FI751976A (it) 1976-01-09
US4294910A (en) 1981-10-13
DE2530422A1 (de) 1976-01-29
FR2277682B1 (it) 1982-04-16
HK74778A (en) 1978-12-29
IT1039749B (it) 1979-12-10
AU8272775A (en) 1977-03-10
NL187283C (nl) 1991-08-01
PL109957B1 (en) 1980-06-30
NO151765C (no) 1985-05-29
NO151765B (no) 1985-02-18
CA1061160A (en) 1979-08-28
SE415612B (sv) 1980-10-13
DK144956B (da) 1982-07-12
JPS612518B2 (it) 1986-01-25
JPS5134001A (it) 1976-03-23
CH600394A5 (it) 1978-06-15
SE7507761L (sv) 1976-01-09
IE41395L (en) 1976-01-08
ZA754248B (en) 1976-06-30
FI59680C (fi) 1981-09-10
SU569272A3 (ru) 1977-08-15
DE2530422C2 (de) 1982-08-19
GB1513368A (en) 1978-06-07
BE831075A (fr) 1975-11-03
ATA523675A (de) 1977-08-15
FR2277682A1 (fr) 1976-02-06
ES439238A1 (es) 1977-02-16
NL7508115A (nl) 1976-01-12
DD120088A5 (it) 1976-05-20
BR7504303A (pt) 1976-07-06
CS212748B2 (en) 1982-03-26

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