AT356147B - Verfahren zum behandeln einer strahlungs- empfindlichen platte - Google Patents

Verfahren zum behandeln einer strahlungs- empfindlichen platte

Info

Publication number
AT356147B
AT356147B AT523675A AT523675A AT356147B AT 356147 B AT356147 B AT 356147B AT 523675 A AT523675 A AT 523675A AT 523675 A AT523675 A AT 523675A AT 356147 B AT356147 B AT 356147B
Authority
AT
Austria
Prior art keywords
radiation
treating
sensitive plate
sensitive
plate
Prior art date
Application number
AT523675A
Other languages
English (en)
Other versions
ATA523675A (de
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10304895&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AT356147(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vickers Ltd filed Critical Vickers Ltd
Publication of ATA523675A publication Critical patent/ATA523675A/de
Application granted granted Critical
Publication of AT356147B publication Critical patent/AT356147B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
AT523675A 1974-07-08 1975-07-08 Verfahren zum behandeln einer strahlungs- empfindlichen platte AT356147B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB30264/74A GB1513368A (en) 1974-07-08 1974-07-08 Processing of radiation-sensitive members

Publications (2)

Publication Number Publication Date
ATA523675A ATA523675A (de) 1977-08-15
AT356147B true AT356147B (de) 1980-04-10

Family

ID=10304895

Family Applications (1)

Application Number Title Priority Date Filing Date
AT523675A AT356147B (de) 1974-07-08 1975-07-08 Verfahren zum behandeln einer strahlungs- empfindlichen platte

Country Status (26)

Country Link
US (1) US4294910A (de)
JP (1) JPS612518B2 (de)
AT (1) AT356147B (de)
BE (1) BE831075A (de)
BR (1) BR7504303A (de)
CA (1) CA1061160A (de)
CH (1) CH600394A5 (de)
CS (1) CS212748B2 (de)
DD (1) DD120088A5 (de)
DE (1) DE2530422C2 (de)
DK (1) DK144956C (de)
ES (1) ES439238A1 (de)
FI (1) FI59680C (de)
FR (1) FR2277682A1 (de)
GB (1) GB1513368A (de)
HK (1) HK74778A (de)
IE (1) IE41395B1 (de)
IT (1) IT1039749B (de)
KE (1) KE2908A (de)
LU (1) LU72927A1 (de)
NL (1) NL187283C (de)
NO (1) NO151765C (de)
PL (1) PL109957B1 (de)
SE (1) SE415612B (de)
SU (1) SU569272A3 (de)
ZA (1) ZA754248B (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1534424A (en) * 1975-06-04 1978-12-06 Fuji Photo Film Co Ltd Process for the production of planographic printing plate
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
DE2855393A1 (de) * 1978-12-21 1980-07-03 Hoechst Ag Verfahren zum herstellen von flachdruckformen
US4259369A (en) * 1979-12-13 1981-03-31 International Business Machines Corporation Image hardening process
US4355096A (en) 1980-07-11 1982-10-19 American Hoechst Corporation Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof
GB2099371B (en) * 1981-06-01 1984-12-19 Polychrome Corp Finisher for lithographic printing plates
GB8314918D0 (en) * 1983-05-31 1983-07-06 Vickers Plc Radiation sensitive compositions
DE3410522A1 (de) * 1984-03-22 1985-10-03 Hoechst Ag, 6230 Frankfurt Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform
JPS6231859A (ja) * 1985-08-01 1987-02-10 Fuji Photo Film Co Ltd 製版方法
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
EP0247153A4 (de) * 1985-11-27 1988-05-19 Macdermid Inc Thermisch stabilisierte, lichtwiderstandsfähige bilder.
CA1329719C (en) * 1987-07-31 1994-05-24 Tadao Toyama Lithographic printing plate and method of treating the same
GB8822956D0 (en) * 1988-09-30 1988-11-09 Cookson Graphics Plc Baking treatment of lithographic printing plate
US5180654A (en) * 1988-11-29 1993-01-19 E. I. Du Pont De Nemours And Company Processing radiation sensitive members with aqueous ethyl hexyl sulphate treatment prior to burn-in step
GB8918161D0 (en) * 1989-08-09 1989-09-20 Du Pont Improvements in or relating to radiation sensitive compounds
US5213950A (en) * 1991-01-30 1993-05-25 Sun Chemical Corporation Pre-bake printing plate composition
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
ATE385463T1 (de) 1999-05-21 2008-02-15 Fujifilm Corp Fotoempfindliche zusammensetzung und flachdruckplatte, die diese zusammensetzung verwendet
EP2036721B1 (de) 2000-11-30 2011-02-09 FUJIFILM Corporation Flachdruckplattenvorläufer
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
JP4150261B2 (ja) 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP4471101B2 (ja) 2004-07-30 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP2006058430A (ja) 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
US8883401B2 (en) 2009-09-24 2014-11-11 Fujifilm Corporation Lithographic printing original plate
US8828648B2 (en) 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE907739C (de) * 1949-07-23 1954-02-18 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares lichtempfindliches Material
US2958599A (en) * 1958-02-14 1960-11-01 Azoplate Corp Diazo compounds and printing plates manufactured therefrom
GB1059623A (en) * 1962-09-06 1967-02-22 Sumner Williams Inc Light-sensitive plates for use in the production of positive printing plates
DE1447963B2 (de) * 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US3482977A (en) * 1966-02-11 1969-12-09 Sylvania Electric Prod Method of forming adherent masks on oxide coated semiconductor bodies
US3652273A (en) * 1967-09-11 1972-03-28 Ibm Process using polyvinyl butral topcoat on photoresist layer
US3615937A (en) * 1968-06-17 1971-10-26 Ibm Plasticizer additive to photoresist for the reduction of pin holes
US3573975A (en) * 1968-07-10 1971-04-06 Ibm Photochemical fabrication process
US3586554A (en) * 1969-01-15 1971-06-22 Ibm Process for increasing photoresist adhesion to a semiconductor by treating the semiconductor with a disilylamide
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3707373A (en) * 1969-03-17 1972-12-26 Eastman Kodak Co Lithographic plate developers
US3705055A (en) * 1970-09-18 1972-12-05 Western Electric Co Method of descumming photoresist patterns
JPS5031486B2 (de) * 1971-12-28 1975-10-11
JPS5031485B2 (de) * 1971-12-28 1975-10-11
US3860426A (en) * 1972-12-22 1975-01-14 Eastman Kodak Co Subbed lithographic printing plate

Also Published As

Publication number Publication date
ES439238A1 (es) 1977-02-16
FR2277682A1 (fr) 1976-02-06
IE41395B1 (en) 1979-12-19
IE41395L (en) 1976-01-08
LU72927A1 (de) 1976-02-04
CS212748B2 (en) 1982-03-26
SU569272A3 (ru) 1977-08-15
GB1513368A (en) 1978-06-07
NL187283C (nl) 1991-08-01
DE2530422A1 (de) 1976-01-29
ATA523675A (de) 1977-08-15
SE7507761L (sv) 1976-01-09
BE831075A (fr) 1975-11-03
CH600394A5 (de) 1978-06-15
AU8272775A (en) 1977-03-10
JPS5134001A (de) 1976-03-23
CA1061160A (en) 1979-08-28
DE2530422C2 (de) 1982-08-19
JPS612518B2 (de) 1986-01-25
FR2277682B1 (de) 1982-04-16
DK144956B (da) 1982-07-12
NO752440L (de) 1976-01-09
KE2908A (en) 1979-01-19
NL7508115A (nl) 1976-01-12
HK74778A (en) 1978-12-29
NO151765C (no) 1985-05-29
DK306475A (da) 1976-01-09
FI59680B (fi) 1981-05-29
FI59680C (fi) 1981-09-10
DD120088A5 (de) 1976-05-20
ZA754248B (en) 1976-06-30
FI751976A (de) 1976-01-09
PL109957B1 (en) 1980-06-30
IT1039749B (it) 1979-12-10
US4294910A (en) 1981-10-13
DK144956C (da) 1982-11-29
NO151765B (no) 1985-02-18
SE415612B (sv) 1980-10-13
BR7504303A (pt) 1976-07-06

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Legal Events

Date Code Title Description
EIH Change in the person of patent owner
ELA Expired due to lapse of time