JPWO2024262029A5 - - Google Patents

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Publication number
JPWO2024262029A5
JPWO2024262029A5 JP2023577256A JP2023577256A JPWO2024262029A5 JP WO2024262029 A5 JPWO2024262029 A5 JP WO2024262029A5 JP 2023577256 A JP2023577256 A JP 2023577256A JP 2023577256 A JP2023577256 A JP 2023577256A JP WO2024262029 A5 JPWO2024262029 A5 JP WO2024262029A5
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JP
Japan
Prior art keywords
rotation
substrate
rotating
auxiliary
shaft
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Application number
JP2023577256A
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English (en)
Japanese (ja)
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JPWO2024262029A1 (https=
JP7643757B1 (ja
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Priority claimed from PCT/JP2023/023385 external-priority patent/WO2024262029A1/ja
Publication of JPWO2024262029A1 publication Critical patent/JPWO2024262029A1/ja
Application granted granted Critical
Publication of JP7643757B1 publication Critical patent/JP7643757B1/ja
Publication of JPWO2024262029A5 publication Critical patent/JPWO2024262029A5/ja
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JP2023577256A 2023-06-23 2023-06-23 基板回転装置、加工システム、及び加工方法 Active JP7643757B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/023385 WO2024262029A1 (ja) 2023-06-23 2023-06-23 基板回転装置、加工システム、及び加工方法

Publications (3)

Publication Number Publication Date
JPWO2024262029A1 JPWO2024262029A1 (https=) 2024-12-26
JP7643757B1 JP7643757B1 (ja) 2025-03-11
JPWO2024262029A5 true JPWO2024262029A5 (https=) 2025-05-27

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ID=93935239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023577256A Active JP7643757B1 (ja) 2023-06-23 2023-06-23 基板回転装置、加工システム、及び加工方法

Country Status (6)

Country Link
US (1) US12404586B2 (https=)
JP (1) JP7643757B1 (https=)
KR (1) KR102834405B1 (https=)
DE (1) DE112023000735T5 (https=)
TW (1) TW202501679A (https=)
WO (1) WO2024262029A1 (https=)

Family Cites Families (26)

* Cited by examiner, † Cited by third party
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US3128205A (en) 1961-09-11 1964-04-07 Optical Coating Laboratory Inc Apparatus for vacuum coating
CH599982A5 (https=) * 1975-09-02 1978-06-15 Balzers Patent Beteilig Ag
JPS58132755A (ja) 1982-02-03 1983-08-08 Toshiba Corp アモルフアス・シリコン感光体製造方法及びその製造装置
US4501766A (en) 1982-02-03 1985-02-26 Tokyo Shibaura Denki Kabushiki Kaisha Film depositing apparatus and a film depositing method
US5002011A (en) 1987-04-14 1991-03-26 Kabushiki Kaisha Toshiba Vapor deposition apparatus
DE4025659A1 (de) 1990-08-14 1992-02-20 Leybold Ag Umlaufraedergetriebe mit einem raedersatz, insbesondere fuer vorrichtungen zum beschichten von substraten
JPH0688227A (ja) * 1992-09-08 1994-03-29 Fujitsu Ltd 成膜装置
JP3412849B2 (ja) 1992-12-25 2003-06-03 キヤノン株式会社 薄膜蒸着装置
US6588243B1 (en) * 1997-06-06 2003-07-08 Richard G. Hyatt, Jr. Electronic cam assembly
US6457864B1 (en) 1998-05-14 2002-10-01 Massachusetts Institute Of Technology Omni-directional high precision friction drive positioning stage
US6563686B2 (en) * 2001-03-19 2003-05-13 Applied Materials, Inc. Pedestal assembly with enhanced thermal conductivity
JP4234652B2 (ja) * 2004-08-26 2009-03-04 日本ピストンリング株式会社 皮膜形成用ワーク保持装置
JP2006192835A (ja) 2005-01-17 2006-07-27 Tohoku Ricoh Co Ltd 孔版印刷装置
JP4835826B2 (ja) 2005-04-25 2011-12-14 株式会社昭和真空 液晶配向膜用真空蒸着装置およびその成膜方法
JP2008121103A (ja) * 2006-10-16 2008-05-29 Able:Kk 真空蒸着装置
KR20100073305A (ko) * 2008-12-23 2010-07-01 주식회사 동부하이텍 백 메탈 공정챔버
KR101188863B1 (ko) 2009-12-23 2012-10-08 주식회사 코리아 인스트루먼트 챔버용 기판 이송장치 및 그 챔버 시스템
KR20120065841A (ko) * 2010-12-13 2012-06-21 삼성전자주식회사 기판 지지 유닛과, 이를 이용한 박막 증착 장치
KR101292399B1 (ko) * 2011-12-19 2013-08-01 주식회사 케이씨텍 공전 및 자전 가능한 서셉터 모듈을 구비하는 원자층 증착장치
JP6147168B2 (ja) * 2013-11-18 2017-06-14 株式会社神戸製鋼所 成膜装置
JP6481363B2 (ja) * 2014-12-25 2019-03-13 東京エレクトロン株式会社 成膜装置、成膜方法及び記憶媒体
KR102743683B1 (ko) * 2018-05-04 2024-12-18 지앙수 페이보레드 나노테크놀로지 컴퍼니., 리미티드 전기 디바이스에 대한 나노-코팅 보호 방법
CN108396302B (zh) * 2018-05-29 2024-07-09 大连威钛克纳米科技有限公司 基片承载轴连续摆动式转架
KR102132323B1 (ko) * 2018-07-13 2020-07-09 주식회사 넵시스 공전, 자전, 틸트를 통한 다중기판 진공증착 장치
JP6635492B1 (ja) * 2019-10-15 2020-01-29 サンテック株式会社 基板回転装置
CN117995642A (zh) * 2022-11-07 2024-05-07 北京北方华创微电子装备有限公司 半导体设备及其磁控管组件

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