JPWO2024195725A5 - - Google Patents

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Publication number
JPWO2024195725A5
JPWO2024195725A5 JP2025508395A JP2025508395A JPWO2024195725A5 JP WO2024195725 A5 JPWO2024195725 A5 JP WO2024195725A5 JP 2025508395 A JP2025508395 A JP 2025508395A JP 2025508395 A JP2025508395 A JP 2025508395A JP WO2024195725 A5 JPWO2024195725 A5 JP WO2024195725A5
Authority
JP
Japan
Prior art keywords
substrate
semiconductor
semiconductor device
semiconductor layers
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025508395A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024195725A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2024/010258 external-priority patent/WO2024195725A1/ja
Publication of JPWO2024195725A1 publication Critical patent/JPWO2024195725A1/ja
Publication of JPWO2024195725A5 publication Critical patent/JPWO2024195725A5/ja
Pending legal-status Critical Current

Links

JP2025508395A 2023-03-17 2024-03-15 Pending JPWO2024195725A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023042942 2023-03-17
PCT/JP2024/010258 WO2024195725A1 (ja) 2023-03-17 2024-03-15 半導体装置

Publications (2)

Publication Number Publication Date
JPWO2024195725A1 JPWO2024195725A1 (https=) 2024-09-26
JPWO2024195725A5 true JPWO2024195725A5 (https=) 2026-02-13

Family

ID=92841693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025508395A Pending JPWO2024195725A1 (https=) 2023-03-17 2024-03-15

Country Status (6)

Country Link
EP (1) EP4682958A1 (https=)
JP (1) JPWO2024195725A1 (https=)
KR (1) KR20250163920A (https=)
CN (1) CN120660462A (https=)
TW (1) TW202504081A (https=)
WO (1) WO2024195725A1 (https=)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001036054A (ja) * 1999-07-19 2001-02-09 Mitsubishi Electric Corp Soi基板の製造方法
JPWO2017038403A1 (ja) * 2015-09-01 2018-08-16 ソニー株式会社 積層体
TWI905469B (zh) 2017-10-30 2025-11-21 日商索尼半導體解決方案公司 固體攝像裝置及電子機器
JP2022077181A (ja) * 2020-11-11 2022-05-23 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置及び電子機器
JP2022089275A (ja) * 2020-12-04 2022-06-16 ソニーセミコンダクタソリューションズ株式会社 撮像装置、電子機器、製造方法
JP7556505B2 (ja) * 2020-12-25 2024-09-26 国立大学法人東京工業大学 半導体装置及びその製造方法
CN117652029A (zh) * 2021-07-27 2024-03-05 索尼半导体解决方案公司 固体摄像元件、摄像装置和电子设备
JP7798514B2 (ja) 2021-09-15 2026-01-14 高砂熱学工業株式会社 データセンターの空調システム

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