JPWO2024084640A5 - - Google Patents

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Publication number
JPWO2024084640A5
JPWO2024084640A5 JP2023518267A JP2023518267A JPWO2024084640A5 JP WO2024084640 A5 JPWO2024084640 A5 JP WO2024084640A5 JP 2023518267 A JP2023518267 A JP 2023518267A JP 2023518267 A JP2023518267 A JP 2023518267A JP WO2024084640 A5 JPWO2024084640 A5 JP WO2024084640A5
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JP
Japan
Prior art keywords
electrode
dielectric film
space
refrigerant
dielectric
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JP2023518267A
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English (en)
Japanese (ja)
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JP7481786B1 (ja
JPWO2024084640A1 (https=
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Priority claimed from PCT/JP2022/039029 external-priority patent/WO2024084640A1/ja
Publication of JPWO2024084640A1 publication Critical patent/JPWO2024084640A1/ja
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Publication of JP7481786B1 publication Critical patent/JP7481786B1/ja
Publication of JPWO2024084640A5 publication Critical patent/JPWO2024084640A5/ja
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JP2023518267A 2022-10-20 2022-10-20 活性ガス生成装置 Active JP7481786B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/039029 WO2024084640A1 (ja) 2022-10-20 2022-10-20 活性ガス生成装置

Publications (3)

Publication Number Publication Date
JPWO2024084640A1 JPWO2024084640A1 (https=) 2024-04-25
JP7481786B1 JP7481786B1 (ja) 2024-05-13
JPWO2024084640A5 true JPWO2024084640A5 (https=) 2024-09-11

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ID=90737198

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JP2023518267A Active JP7481786B1 (ja) 2022-10-20 2022-10-20 活性ガス生成装置

Country Status (7)

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US (1) US12513811B2 (https=)
EP (1) EP4418826A4 (https=)
JP (1) JP7481786B1 (https=)
KR (1) KR20240072264A (https=)
CN (1) CN118285158A (https=)
TW (1) TWI884469B (https=)
WO (1) WO2024084640A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus
WO2024084640A1 (ja) * 2022-10-20 2024-04-25 東芝三菱電機産業システム株式会社 活性ガス生成装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8034213B2 (en) * 2006-03-30 2011-10-11 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
WO2008114958A1 (en) * 2007-03-16 2008-09-25 Sosul Co., Ltd. Apparatus for plasma processing and method for plasma processing
JP6591735B2 (ja) * 2014-08-05 2019-10-16 株式会社Fuji プラズマ発生装置
JP2016086099A (ja) * 2014-10-27 2016-05-19 東京エレクトロン株式会社 プラズマ処理装置
WO2019049230A1 (ja) * 2017-09-06 2019-03-14 東芝三菱電機産業システム株式会社 活性ガス生成装置
WO2019138456A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置
US11532458B2 (en) * 2018-05-30 2022-12-20 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
JP7246154B2 (ja) * 2018-10-02 2023-03-27 東京エレクトロン株式会社 プラズマ処理装置及び静電吸着方法
CN113170567B (zh) * 2019-11-12 2023-11-28 东芝三菱电机产业系统株式会社 活性气体生成装置
US11839014B2 (en) * 2019-11-27 2023-12-05 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generating apparatus
US12295089B2 (en) * 2020-02-27 2025-05-06 Tmeic Corporation Active gas generation apparatus
JP7351245B2 (ja) * 2020-03-13 2023-09-27 ウシオ電機株式会社 誘電体バリア式プラズマ発生装置、及び、誘電体バリア式プラズマ発生装置のプラズマ放電開始方法
US12394604B2 (en) * 2020-09-11 2025-08-19 Applied Materials, Inc. Plasma source with floating electrodes
CN114916255B (zh) * 2020-12-07 2025-09-23 株式会社Tmeic 活性气体生成装置
CN114982382B (zh) * 2020-12-24 2025-09-19 株式会社Tmeic 活性气体生成装置
US20230167553A1 (en) * 2021-11-30 2023-06-01 Panasonic Intellectual Property Management Co., Ltd. Plasma processing apparatus and method for using plasma processing apparatus
KR102858462B1 (ko) * 2021-12-08 2025-09-12 가부시키가이샤 티마이크 활성 가스 생성 장치
JP7748898B2 (ja) * 2022-03-18 2025-10-03 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus
JP7836736B2 (ja) * 2022-08-25 2026-03-27 東京エレクトロン株式会社 プラズマ処理装置
WO2024084640A1 (ja) * 2022-10-20 2024-04-25 東芝三菱電機産業システム株式会社 活性ガス生成装置

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