JPWO2024084640A5 - - Google Patents
Download PDFInfo
- Publication number
- JPWO2024084640A5 JPWO2024084640A5 JP2023518267A JP2023518267A JPWO2024084640A5 JP WO2024084640 A5 JPWO2024084640 A5 JP WO2024084640A5 JP 2023518267 A JP2023518267 A JP 2023518267A JP 2023518267 A JP2023518267 A JP 2023518267A JP WO2024084640 A5 JPWO2024084640 A5 JP WO2024084640A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- dielectric film
- space
- refrigerant
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/039029 WO2024084640A1 (ja) | 2022-10-20 | 2022-10-20 | 活性ガス生成装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2024084640A1 JPWO2024084640A1 (https=) | 2024-04-25 |
| JP7481786B1 JP7481786B1 (ja) | 2024-05-13 |
| JPWO2024084640A5 true JPWO2024084640A5 (https=) | 2024-09-11 |
Family
ID=90737198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023518267A Active JP7481786B1 (ja) | 2022-10-20 | 2022-10-20 | 活性ガス生成装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US12513811B2 (https=) |
| EP (1) | EP4418826A4 (https=) |
| JP (1) | JP7481786B1 (https=) |
| KR (1) | KR20240072264A (https=) |
| CN (1) | CN118285158A (https=) |
| TW (1) | TWI884469B (https=) |
| WO (1) | WO2024084640A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4340548B1 (en) * | 2022-05-18 | 2025-10-15 | TMEIC Corporation | Active-gas-generating apparatus |
| WO2024084640A1 (ja) * | 2022-10-20 | 2024-04-25 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8034213B2 (en) * | 2006-03-30 | 2011-10-11 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
| WO2008114958A1 (en) * | 2007-03-16 | 2008-09-25 | Sosul Co., Ltd. | Apparatus for plasma processing and method for plasma processing |
| JP6591735B2 (ja) * | 2014-08-05 | 2019-10-16 | 株式会社Fuji | プラズマ発生装置 |
| JP2016086099A (ja) * | 2014-10-27 | 2016-05-19 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| WO2019049230A1 (ja) * | 2017-09-06 | 2019-03-14 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
| WO2019138456A1 (ja) | 2018-01-10 | 2019-07-18 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
| US11532458B2 (en) * | 2018-05-30 | 2022-12-20 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Active gas generation apparatus |
| JP7246154B2 (ja) * | 2018-10-02 | 2023-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置及び静電吸着方法 |
| CN113170567B (zh) * | 2019-11-12 | 2023-11-28 | 东芝三菱电机产业系统株式会社 | 活性气体生成装置 |
| US11839014B2 (en) * | 2019-11-27 | 2023-12-05 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Active gas generating apparatus |
| US12295089B2 (en) * | 2020-02-27 | 2025-05-06 | Tmeic Corporation | Active gas generation apparatus |
| JP7351245B2 (ja) * | 2020-03-13 | 2023-09-27 | ウシオ電機株式会社 | 誘電体バリア式プラズマ発生装置、及び、誘電体バリア式プラズマ発生装置のプラズマ放電開始方法 |
| US12394604B2 (en) * | 2020-09-11 | 2025-08-19 | Applied Materials, Inc. | Plasma source with floating electrodes |
| CN114916255B (zh) * | 2020-12-07 | 2025-09-23 | 株式会社Tmeic | 活性气体生成装置 |
| CN114982382B (zh) * | 2020-12-24 | 2025-09-19 | 株式会社Tmeic | 活性气体生成装置 |
| US20230167553A1 (en) * | 2021-11-30 | 2023-06-01 | Panasonic Intellectual Property Management Co., Ltd. | Plasma processing apparatus and method for using plasma processing apparatus |
| KR102858462B1 (ko) * | 2021-12-08 | 2025-09-12 | 가부시키가이샤 티마이크 | 활성 가스 생성 장치 |
| JP7748898B2 (ja) * | 2022-03-18 | 2025-10-03 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
| EP4340548B1 (en) * | 2022-05-18 | 2025-10-15 | TMEIC Corporation | Active-gas-generating apparatus |
| JP7836736B2 (ja) * | 2022-08-25 | 2026-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| WO2024084640A1 (ja) * | 2022-10-20 | 2024-04-25 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
-
2022
- 2022-10-20 WO PCT/JP2022/039029 patent/WO2024084640A1/ja not_active Ceased
- 2022-10-20 KR KR1020247014928A patent/KR20240072264A/ko active Pending
- 2022-10-20 JP JP2023518267A patent/JP7481786B1/ja active Active
- 2022-10-20 EP EP22962748.4A patent/EP4418826A4/en active Pending
- 2022-10-20 US US18/711,758 patent/US12513811B2/en active Active
- 2022-10-20 CN CN202280072997.4A patent/CN118285158A/zh active Pending
-
2023
- 2023-06-16 TW TW112122745A patent/TWI884469B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPWO2024084640A5 (https=) | ||
| JP6844937B2 (ja) | 活性ガス生成装置 | |
| EP2824467B1 (en) | Probe apparatus | |
| JPWO2023223454A5 (https=) | ||
| TWI788034B (zh) | 活性氣體產生裝置 | |
| US6251234B1 (en) | Electroplating machine | |
| CN114982382B (zh) | 活性气体生成装置 | |
| US7567598B2 (en) | Semiconductor laser equipment | |
| CN107658244A (zh) | 基板处理装置和喷嘴 | |
| KR890007798A (ko) | 도전성분사액을 사용할때 정전분사 장치의 고전압으로부터 분사액원의 절연장치 | |
| JP7481786B1 (ja) | 活性ガス生成装置 | |
| KR20090125471A (ko) | 상압 플라즈마 발생장치 및 이를 구비한 상압 플라즈마표면처리장치 | |
| KR102043811B1 (ko) | 웨이퍼의 도금 및/또는 연마 장치 및 방법 | |
| KR101862697B1 (ko) | 금속 공기 전지 | |
| CN109477236B (zh) | 用于衬底上的垂直电流金属沉积的装置 | |
| KR100888652B1 (ko) | 배기 가능한 플라즈마 발생 장치 및 이를 구비하는 상압플라즈마 장치 | |
| CN113438792B (zh) | 一种智能可控等离子火焰装置 | |
| JP2017166072A (ja) | ウェハのメッキおよび/または研磨のための装置および方法 | |
| CN116670324B (zh) | 活性气体生成装置 | |
| JP6911243B2 (ja) | メッキ装置 | |
| CN211636468U (zh) | 液相脉冲放电等离子体处理反应装置 | |
| KR102245633B1 (ko) | 대기압 플라즈마 반응장치 | |
| KR20240058249A (ko) | 기판 처리 장치 | |
| CN112025050A (zh) | 一种窄间隙焊枪 | |
| JPS63318216A (ja) | ワイヤ放電加工装置 |