JP7481786B1 - 活性ガス生成装置 - Google Patents

活性ガス生成装置 Download PDF

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Publication number
JP7481786B1
JP7481786B1 JP2023518267A JP2023518267A JP7481786B1 JP 7481786 B1 JP7481786 B1 JP 7481786B1 JP 2023518267 A JP2023518267 A JP 2023518267A JP 2023518267 A JP2023518267 A JP 2023518267A JP 7481786 B1 JP7481786 B1 JP 7481786B1
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Japan
Prior art keywords
dielectric film
electrode
space
dielectric
active gas
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JP2023518267A
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English (en)
Japanese (ja)
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JPWO2024084640A5 (https=
JPWO2024084640A1 (https=
Inventor
廉 有田
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TMEIC Corp
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TMEIC Corp
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Publication of JPWO2024084640A1 publication Critical patent/JPWO2024084640A1/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments
    • H05H2245/42—Coating or etching of large items

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
JP2023518267A 2022-10-20 2022-10-20 活性ガス生成装置 Active JP7481786B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/039029 WO2024084640A1 (ja) 2022-10-20 2022-10-20 活性ガス生成装置

Publications (3)

Publication Number Publication Date
JPWO2024084640A1 JPWO2024084640A1 (https=) 2024-04-25
JP7481786B1 true JP7481786B1 (ja) 2024-05-13
JPWO2024084640A5 JPWO2024084640A5 (https=) 2024-09-11

Family

ID=90737198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023518267A Active JP7481786B1 (ja) 2022-10-20 2022-10-20 活性ガス生成装置

Country Status (7)

Country Link
US (1) US12513811B2 (https=)
EP (1) EP4418826A4 (https=)
JP (1) JP7481786B1 (https=)
KR (1) KR20240072264A (https=)
CN (1) CN118285158A (https=)
TW (1) TWI884469B (https=)
WO (1) WO2024084640A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus
WO2024084640A1 (ja) * 2022-10-20 2024-04-25 東芝三菱電機産業システム株式会社 活性ガス生成装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019049230A1 (ja) * 2017-09-06 2019-03-14 東芝三菱電機産業システム株式会社 活性ガス生成装置
WO2019138456A1 (ja) * 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8034213B2 (en) * 2006-03-30 2011-10-11 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
WO2008114958A1 (en) * 2007-03-16 2008-09-25 Sosul Co., Ltd. Apparatus for plasma processing and method for plasma processing
JP6591735B2 (ja) * 2014-08-05 2019-10-16 株式会社Ｆｕｊｉ プラズマ発生装置
JP2016086099A (ja) * 2014-10-27 2016-05-19 東京エレクトロン株式会社 プラズマ処理装置
US11532458B2 (en) * 2018-05-30 2022-12-20 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
JP7246154B2 (ja) * 2018-10-02 2023-03-27 東京エレクトロン株式会社 プラズマ処理装置及び静電吸着方法
CN113170567B (zh) * 2019-11-12 2023-11-28 东芝三菱电机产业系统株式会社 活性气体生成装置
US11839014B2 (en) * 2019-11-27 2023-12-05 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generating apparatus
US12295089B2 (en) * 2020-02-27 2025-05-06 Tmeic Corporation Active gas generation apparatus
JP7351245B2 (ja) * 2020-03-13 2023-09-27 ウシオ電機株式会社 誘電体バリア式プラズマ発生装置、及び、誘電体バリア式プラズマ発生装置のプラズマ放電開始方法
US12394604B2 (en) * 2020-09-11 2025-08-19 Applied Materials, Inc. Plasma source with floating electrodes
CN114916255B (zh) * 2020-12-07 2025-09-23 株式会社Tmeic 活性气体生成装置
CN114982382B (zh) * 2020-12-24 2025-09-19 株式会社Tmeic 活性气体生成装置
US20230167553A1 (en) * 2021-11-30 2023-06-01 Panasonic Intellectual Property Management Co., Ltd. Plasma processing apparatus and method for using plasma processing apparatus
KR102858462B1 (ko) * 2021-12-08 2025-09-12 가부시키가이샤 티마이크 활성 가스 생성 장치
JP7748898B2 (ja) * 2022-03-18 2025-10-03 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus
JP7836736B2 (ja) * 2022-08-25 2026-03-27 東京エレクトロン株式会社 プラズマ処理装置
WO2024084640A1 (ja) * 2022-10-20 2024-04-25 東芝三菱電機産業システム株式会社 活性ガス生成装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019049230A1 (ja) * 2017-09-06 2019-03-14 東芝三菱電機産業システム株式会社 活性ガス生成装置
WO2019138456A1 (ja) * 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置

Also Published As

Publication number Publication date
EP4418826A4 (en) 2025-09-17
TWI884469B (zh) 2025-05-21
CN118285158A (zh) 2024-07-02
TW202417673A (zh) 2024-05-01
EP4418826A1 (en) 2024-08-21
US12513811B2 (en) 2025-12-30
US20250016904A1 (en) 2025-01-09
KR20240072264A (ko) 2024-05-23
WO2024084640A1 (ja) 2024-04-25
JPWO2024084640A1 (https=) 2024-04-25

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