KR20240072264A - 활성 가스 생성 장치 - Google Patents

활성 가스 생성 장치 Download PDF

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Publication number
KR20240072264A
KR20240072264A KR1020247014928A KR20247014928A KR20240072264A KR 20240072264 A KR20240072264 A KR 20240072264A KR 1020247014928 A KR1020247014928 A KR 1020247014928A KR 20247014928 A KR20247014928 A KR 20247014928A KR 20240072264 A KR20240072264 A KR 20240072264A
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KR
South Korea
Prior art keywords
dielectric film
electrode
refrigerant
space
dielectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247014928A
Other languages
English (en)
Korean (ko)
Inventor
렌 아리타
Original Assignee
가부시키가이샤 티마이크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 티마이크 filed Critical 가부시키가이샤 티마이크
Publication of KR20240072264A publication Critical patent/KR20240072264A/ko
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments
    • H05H2245/42—Coating or etching of large items

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
KR1020247014928A 2022-10-20 2022-10-20 활성 가스 생성 장치 Pending KR20240072264A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/039029 WO2024084640A1 (ja) 2022-10-20 2022-10-20 活性ガス生成装置

Publications (1)

Publication Number Publication Date
KR20240072264A true KR20240072264A (ko) 2024-05-23

Family

ID=90737198

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247014928A Pending KR20240072264A (ko) 2022-10-20 2022-10-20 활성 가스 생성 장치

Country Status (7)

Country Link
US (1) US12513811B2 (https=)
EP (1) EP4418826A4 (https=)
JP (1) JP7481786B1 (https=)
KR (1) KR20240072264A (https=)
CN (1) CN118285158A (https=)
TW (1) TWI884469B (https=)
WO (1) WO2024084640A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus
WO2024084640A1 (ja) * 2022-10-20 2024-04-25 東芝三菱電機産業システム株式会社 活性ガス生成装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019138456A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8034213B2 (en) * 2006-03-30 2011-10-11 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
WO2008114958A1 (en) * 2007-03-16 2008-09-25 Sosul Co., Ltd. Apparatus for plasma processing and method for plasma processing
JP6591735B2 (ja) * 2014-08-05 2019-10-16 株式会社Ｆｕｊｉ プラズマ発生装置
JP2016086099A (ja) * 2014-10-27 2016-05-19 東京エレクトロン株式会社 プラズマ処理装置
WO2019049230A1 (ja) * 2017-09-06 2019-03-14 東芝三菱電機産業システム株式会社 活性ガス生成装置
US11532458B2 (en) * 2018-05-30 2022-12-20 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
JP7246154B2 (ja) * 2018-10-02 2023-03-27 東京エレクトロン株式会社 プラズマ処理装置及び静電吸着方法
CN113170567B (zh) * 2019-11-12 2023-11-28 东芝三菱电机产业系统株式会社 活性气体生成装置
US11839014B2 (en) * 2019-11-27 2023-12-05 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generating apparatus
US12295089B2 (en) * 2020-02-27 2025-05-06 Tmeic Corporation Active gas generation apparatus
JP7351245B2 (ja) * 2020-03-13 2023-09-27 ウシオ電機株式会社 誘電体バリア式プラズマ発生装置、及び、誘電体バリア式プラズマ発生装置のプラズマ放電開始方法
US12394604B2 (en) * 2020-09-11 2025-08-19 Applied Materials, Inc. Plasma source with floating electrodes
CN114916255B (zh) * 2020-12-07 2025-09-23 株式会社Tmeic 活性气体生成装置
CN114982382B (zh) * 2020-12-24 2025-09-19 株式会社Tmeic 活性气体生成装置
US20230167553A1 (en) * 2021-11-30 2023-06-01 Panasonic Intellectual Property Management Co., Ltd. Plasma processing apparatus and method for using plasma processing apparatus
KR102858462B1 (ko) * 2021-12-08 2025-09-12 가부시키가이샤 티마이크 활성 가스 생성 장치
JP7748898B2 (ja) * 2022-03-18 2025-10-03 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
EP4340548B1 (en) * 2022-05-18 2025-10-15 TMEIC Corporation Active-gas-generating apparatus
JP7836736B2 (ja) * 2022-08-25 2026-03-27 東京エレクトロン株式会社 プラズマ処理装置
WO2024084640A1 (ja) * 2022-10-20 2024-04-25 東芝三菱電機産業システム株式会社 活性ガス生成装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019138456A1 (ja) 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置

Also Published As

Publication number Publication date
EP4418826A4 (en) 2025-09-17
TWI884469B (zh) 2025-05-21
CN118285158A (zh) 2024-07-02
TW202417673A (zh) 2024-05-01
EP4418826A1 (en) 2024-08-21
US12513811B2 (en) 2025-12-30
US20250016904A1 (en) 2025-01-09
JP7481786B1 (ja) 2024-05-13
WO2024084640A1 (ja) 2024-04-25
JPWO2024084640A1 (https=) 2024-04-25

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