JPWO2024084640A1 - - Google Patents
Info
- Publication number
- JPWO2024084640A1 JPWO2024084640A1 JP2023518267A JP2023518267A JPWO2024084640A1 JP WO2024084640 A1 JPWO2024084640 A1 JP WO2024084640A1 JP 2023518267 A JP2023518267 A JP 2023518267A JP 2023518267 A JP2023518267 A JP 2023518267A JP WO2024084640 A1 JPWO2024084640 A1 JP WO2024084640A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32348—Dielectric barrier discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/40—Surface treatments
- H05H2245/42—Coating or etching of large items
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/039029 WO2024084640A1 (ja) | 2022-10-20 | 2022-10-20 | 活性ガス生成装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2024084640A1 true JPWO2024084640A1 (https=) | 2024-04-25 |
| JP7481786B1 JP7481786B1 (ja) | 2024-05-13 |
| JPWO2024084640A5 JPWO2024084640A5 (https=) | 2024-09-11 |
Family
ID=90737198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023518267A Active JP7481786B1 (ja) | 2022-10-20 | 2022-10-20 | 活性ガス生成装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US12513811B2 (https=) |
| EP (1) | EP4418826A4 (https=) |
| JP (1) | JP7481786B1 (https=) |
| KR (1) | KR20240072264A (https=) |
| CN (1) | CN118285158A (https=) |
| TW (1) | TWI884469B (https=) |
| WO (1) | WO2024084640A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4340548B1 (en) * | 2022-05-18 | 2025-10-15 | TMEIC Corporation | Active-gas-generating apparatus |
| WO2024084640A1 (ja) * | 2022-10-20 | 2024-04-25 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8034213B2 (en) * | 2006-03-30 | 2011-10-11 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
| WO2008114958A1 (en) * | 2007-03-16 | 2008-09-25 | Sosul Co., Ltd. | Apparatus for plasma processing and method for plasma processing |
| JP6591735B2 (ja) * | 2014-08-05 | 2019-10-16 | 株式会社Ｆｕｊｉ | プラズマ発生装置 |
| JP2016086099A (ja) * | 2014-10-27 | 2016-05-19 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| WO2019049230A1 (ja) * | 2017-09-06 | 2019-03-14 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
| WO2019138456A1 (ja) | 2018-01-10 | 2019-07-18 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
| US11532458B2 (en) * | 2018-05-30 | 2022-12-20 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Active gas generation apparatus |
| JP7246154B2 (ja) * | 2018-10-02 | 2023-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置及び静電吸着方法 |
| CN113170567B (zh) * | 2019-11-12 | 2023-11-28 | 东芝三菱电机产业系统株式会社 | 活性气体生成装置 |
| US11839014B2 (en) * | 2019-11-27 | 2023-12-05 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Active gas generating apparatus |
| US12295089B2 (en) * | 2020-02-27 | 2025-05-06 | Tmeic Corporation | Active gas generation apparatus |
| JP7351245B2 (ja) * | 2020-03-13 | 2023-09-27 | ウシオ電機株式会社 | 誘電体バリア式プラズマ発生装置、及び、誘電体バリア式プラズマ発生装置のプラズマ放電開始方法 |
| US12394604B2 (en) * | 2020-09-11 | 2025-08-19 | Applied Materials, Inc. | Plasma source with floating electrodes |
| CN114916255B (zh) * | 2020-12-07 | 2025-09-23 | 株式会社Tmeic | 活性气体生成装置 |
| CN114982382B (zh) * | 2020-12-24 | 2025-09-19 | 株式会社Tmeic | 活性气体生成装置 |
| US20230167553A1 (en) * | 2021-11-30 | 2023-06-01 | Panasonic Intellectual Property Management Co., Ltd. | Plasma processing apparatus and method for using plasma processing apparatus |
| KR102858462B1 (ko) * | 2021-12-08 | 2025-09-12 | 가부시키가이샤 티마이크 | 활성 가스 생성 장치 |
| JP7748898B2 (ja) * | 2022-03-18 | 2025-10-03 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
| EP4340548B1 (en) * | 2022-05-18 | 2025-10-15 | TMEIC Corporation | Active-gas-generating apparatus |
| JP7836736B2 (ja) * | 2022-08-25 | 2026-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| WO2024084640A1 (ja) * | 2022-10-20 | 2024-04-25 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
-
2022
- 2022-10-20 WO PCT/JP2022/039029 patent/WO2024084640A1/ja not_active Ceased
- 2022-10-20 KR KR1020247014928A patent/KR20240072264A/ko active Pending
- 2022-10-20 JP JP2023518267A patent/JP7481786B1/ja active Active
- 2022-10-20 EP EP22962748.4A patent/EP4418826A4/en active Pending
- 2022-10-20 US US18/711,758 patent/US12513811B2/en active Active
- 2022-10-20 CN CN202280072997.4A patent/CN118285158A/zh active Pending
-
2023
- 2023-06-16 TW TW112122745A patent/TWI884469B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP4418826A4 (en) | 2025-09-17 |
| TWI884469B (zh) | 2025-05-21 |
| CN118285158A (zh) | 2024-07-02 |
| TW202417673A (zh) | 2024-05-01 |
| EP4418826A1 (en) | 2024-08-21 |
| US12513811B2 (en) | 2025-12-30 |
| US20250016904A1 (en) | 2025-01-09 |
| JP7481786B1 (ja) | 2024-05-13 |
| KR20240072264A (ko) | 2024-05-23 |
| WO2024084640A1 (ja) | 2024-04-25 |
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