JPWO2024075596A5 - - Google Patents
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- JPWO2024075596A5 JPWO2024075596A5 JP2024555743A JP2024555743A JPWO2024075596A5 JP WO2024075596 A5 JPWO2024075596 A5 JP WO2024075596A5 JP 2024555743 A JP2024555743 A JP 2024555743A JP 2024555743 A JP2024555743 A JP 2024555743A JP WO2024075596 A5 JPWO2024075596 A5 JP WO2024075596A5
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- JP
- Japan
- Prior art keywords
- period
- high frequency
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003252 repetitive effect Effects 0.000 claims 23
- 239000000758 substrate Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 4
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024227718A JP2025041838A (ja) | 2022-10-07 | 2024-12-24 | プラズマ処理装置、電源システム、及び周波数制御方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022162643 | 2022-10-07 | ||
| JP2022162643 | 2022-10-07 | ||
| JP2022178137 | 2022-11-07 | ||
| JP2022178137 | 2022-11-07 | ||
| PCT/JP2023/034969 WO2024075596A1 (ja) | 2022-10-07 | 2023-09-26 | プラズマ処理装置、電源システム、及び周波数制御方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024227718A Division JP2025041838A (ja) | 2022-10-07 | 2024-12-24 | プラズマ処理装置、電源システム、及び周波数制御方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2024075596A1 JPWO2024075596A1 (https=) | 2024-04-11 |
| JPWO2024075596A5 true JPWO2024075596A5 (https=) | 2024-12-17 |
| JP7612949B2 JP7612949B2 (ja) | 2025-01-14 |
Family
ID=90608317
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024555743A Active JP7612949B2 (ja) | 2022-10-07 | 2023-09-26 | プラズマ処理装置、電源システム、及び周波数制御方法 |
| JP2024227718A Pending JP2025041838A (ja) | 2022-10-07 | 2024-12-24 | プラズマ処理装置、電源システム、及び周波数制御方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024227718A Pending JP2025041838A (ja) | 2022-10-07 | 2024-12-24 | プラズマ処理装置、電源システム、及び周波数制御方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250132129A1 (https=) |
| JP (2) | JP7612949B2 (https=) |
| KR (2) | KR20260006694A (https=) |
| CN (1) | CN119923954A (https=) |
| WO (1) | WO2024075596A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026053764A1 (ja) * | 2024-09-05 | 2026-03-12 | 東京エレクトロン株式会社 | プラズマ処理装置、電源システム、及びプラズマ処理方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5319150B2 (ja) | 2008-03-31 | 2013-10-16 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法及びコンピュータ読み取り可能な記憶媒体 |
| US12230475B2 (en) * | 2018-08-14 | 2025-02-18 | Tokyo Electron Limited | Systems and methods of control for plasma processing |
| US11315757B2 (en) * | 2019-08-13 | 2022-04-26 | Mks Instruments, Inc. | Method and apparatus to enhance sheath formation, evolution and pulse to pulse stability in RF powered plasma applications |
-
2023
- 2023-09-26 KR KR1020257042468A patent/KR20260006694A/ko active Pending
- 2023-09-26 KR KR1020247042040A patent/KR102905047B1/ko active Active
- 2023-09-26 CN CN202380049744.XA patent/CN119923954A/zh active Pending
- 2023-09-26 WO PCT/JP2023/034969 patent/WO2024075596A1/ja not_active Ceased
- 2023-09-26 JP JP2024555743A patent/JP7612949B2/ja active Active
-
2024
- 2024-12-24 JP JP2024227718A patent/JP2025041838A/ja active Pending
- 2024-12-24 US US19/000,700 patent/US20250132129A1/en active Pending
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