JPWO2023285408A5 - - Google Patents
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- Publication number
- JPWO2023285408A5 JPWO2023285408A5 JP2023576428A JP2023576428A JPWO2023285408A5 JP WO2023285408 A5 JPWO2023285408 A5 JP WO2023285408A5 JP 2023576428 A JP2023576428 A JP 2023576428A JP 2023576428 A JP2023576428 A JP 2023576428A JP WO2023285408 A5 JPWO2023285408 A5 JP WO2023285408A5
- Authority
- JP
- Japan
- Prior art keywords
- aqueous solution
- producing
- manufacturing
- resist pattern
- electronic devices
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021117253 | 2021-07-15 | ||
| JP2021117253 | 2021-07-15 | ||
| PCT/EP2022/069365 WO2023285408A2 (en) | 2021-07-15 | 2022-07-12 | Electronic device manufacturing aqueous solution, method for manufacturing resist pattern and method for manufacturing device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024526547A JP2024526547A (ja) | 2024-07-19 |
| JPWO2023285408A5 true JPWO2023285408A5 (https=) | 2025-07-02 |
| JP2024526547A5 JP2024526547A5 (https=) | 2025-07-02 |
Family
ID=82786609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023576428A Pending JP2024526547A (ja) | 2021-07-15 | 2022-07-12 | 電子機器製造水溶液、レジストパターンの製造方法およびデバイスの製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20240294855A1 (https=) |
| EP (1) | EP4370977A2 (https=) |
| JP (1) | JP2024526547A (https=) |
| KR (1) | KR20240035567A (https=) |
| CN (1) | CN117693718A (https=) |
| IL (1) | IL309082A (https=) |
| TW (1) | TW202319530A (https=) |
| WO (1) | WO2023285408A2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026032911A1 (en) * | 2024-08-07 | 2026-02-12 | Merck Patent Gmbh | Electronic device manufacturing aqueous solution, method for producing resist pattern, and method for manufacturing device |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3817012A1 (de) | 1988-05-19 | 1989-11-30 | Basf Ag | Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern |
| EP0366590B2 (en) | 1988-10-28 | 2001-03-21 | International Business Machines Corporation | Highly sensitive positive photoresist compositions |
| KR100858594B1 (ko) * | 2004-04-23 | 2008-09-17 | 토쿄오오카코교 가부시기가이샤 | 레지스트 패턴 형성방법 및 복합 린스액 |
| JP4657899B2 (ja) * | 2005-11-30 | 2011-03-23 | 富士通株式会社 | レジストパターン厚肉化材料、レジストパターンの形成方法、半導体装置及びその製造方法 |
| US20090133716A1 (en) * | 2007-10-29 | 2009-05-28 | Wai Mun Lee | Methods of post chemical mechanical polishing and wafer cleaning using amidoxime compositions |
| JP5336306B2 (ja) | 2008-10-20 | 2013-11-06 | 信越化学工業株式会社 | レジスト下層膜形成方法、これを用いたパターン形成方法、及びレジスト下層膜材料 |
| US8361237B2 (en) * | 2008-12-17 | 2013-01-29 | Air Products And Chemicals, Inc. | Wet clean compositions for CoWP and porous dielectrics |
| JP5513181B2 (ja) * | 2010-03-12 | 2014-06-04 | 富士フイルム株式会社 | 洗浄組成物及び半導体装置の製造方法 |
| JP6240404B2 (ja) | 2013-05-09 | 2017-11-29 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | リソグラフィー用リンス液およびそれを用いたパターン形成方法 |
| US10451974B2 (en) | 2016-06-20 | 2019-10-22 | Az Electronic Materials (Luxembourg) S.A.R.L. | Rinse composition, a method for forming resist patterns and a method for making semiconductor devices |
| EP3545361A1 (en) | 2016-11-25 | 2019-10-02 | Ridgefield Acquisition | A lithography composition, a method for forming resist patterns and a method for making semiconductor devices |
| JP7057653B2 (ja) * | 2017-12-08 | 2022-04-20 | 花王株式会社 | 樹脂マスク剥離用洗浄剤組成物 |
| KR102828756B1 (ko) * | 2018-07-13 | 2025-07-03 | 후지필름 가부시키가이샤 | 약액, 키트, 패턴 형성 방법, 약액의 제조 방법 및 약액 수용체 |
| EP3929103A4 (en) * | 2019-02-21 | 2022-04-20 | FUJIFILM Corporation | CHEMICAL LIQUID, RESIST PATTERN FORMING METHOD, METHOD OF MAKING A SEMICONDUCTOR CHIP, CHEMICAL LIQUID RECEPTOR, METHOD OF MAKING A CHEMICAL LIQUID |
| DE102020124247A1 (de) * | 2019-10-31 | 2021-05-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Fotolackentwickler und verfahren zum entwickeln von fotolack |
| JP2021165771A (ja) * | 2020-04-06 | 2021-10-14 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 電子機器製造水溶液、レジストパターンの製造方法およびデバイスの製造方法 |
-
2022
- 2022-07-12 WO PCT/EP2022/069365 patent/WO2023285408A2/en not_active Ceased
- 2022-07-12 US US18/578,342 patent/US20240294855A1/en active Pending
- 2022-07-12 CN CN202280049410.8A patent/CN117693718A/zh active Pending
- 2022-07-12 EP EP22750806.6A patent/EP4370977A2/en active Pending
- 2022-07-12 KR KR1020247005356A patent/KR20240035567A/ko active Pending
- 2022-07-12 IL IL309082A patent/IL309082A/en unknown
- 2022-07-12 JP JP2023576428A patent/JP2024526547A/ja active Pending
- 2022-07-13 TW TW111126273A patent/TW202319530A/zh unknown
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