JPWO2023112453A5 - - Google Patents
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- Publication number
- JPWO2023112453A5 JPWO2023112453A5 JP2023567562A JP2023567562A JPWO2023112453A5 JP WO2023112453 A5 JPWO2023112453 A5 JP WO2023112453A5 JP 2023567562 A JP2023567562 A JP 2023567562A JP 2023567562 A JP2023567562 A JP 2023567562A JP WO2023112453 A5 JPWO2023112453 A5 JP WO2023112453A5
- Authority
- JP
- Japan
- Prior art keywords
- lanthanum
- lanthanum compounds
- removal
- less
- hydroxycarboxylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002604 lanthanum compounds Chemical class 0.000 claims 23
- 238000000034 method Methods 0.000 claims 7
- 239000000243 solution Substances 0.000 claims 7
- 150000003839 salts Chemical class 0.000 claims 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims 3
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims 2
- 150000003863 ammonium salts Chemical class 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 2
- -1 fluoride ions Chemical class 0.000 claims 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims 1
- 235000015165 citric acid Nutrition 0.000 claims 1
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 1
- 239000004310 lactic acid Substances 0.000 claims 1
- 235000014655 lactic acid Nutrition 0.000 claims 1
- 239000001630 malic acid Substances 0.000 claims 1
- 235000011090 malic acid Nutrition 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 1
- 229920005591 polysilicon Polymers 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 239000011975 tartaric acid Substances 0.000 claims 1
- 235000002906 tartaric acid Nutrition 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021205279 | 2021-12-17 | ||
| PCT/JP2022/038107 WO2023112453A1 (ja) | 2021-12-17 | 2022-10-12 | ランタン化合物の除去方法及びランタン化合物除去用処理液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023112453A1 JPWO2023112453A1 (https=) | 2023-06-22 |
| JPWO2023112453A5 true JPWO2023112453A5 (https=) | 2024-08-28 |
Family
ID=86774382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023567562A Pending JPWO2023112453A1 (https=) | 2021-12-17 | 2022-10-12 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2023112453A1 (https=) |
| KR (1) | KR20240121749A (https=) |
| TW (1) | TWI904389B (https=) |
| WO (1) | WO2023112453A1 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4189651B2 (ja) * | 2003-03-26 | 2008-12-03 | 三菱瓦斯化学株式会社 | 高誘電率薄膜エッチング剤組成物 |
| JP5592083B2 (ja) * | 2009-06-12 | 2014-09-17 | アイメック | 基板処理方法およびそれを用いた半導体装置の製造方法 |
| US20190103282A1 (en) * | 2017-09-29 | 2019-04-04 | Versum Materials Us, Llc | Etching Solution for Simultaneously Removing Silicon and Silicon-Germanium Alloy From a Silicon-Germanium/Silicon Stack During Manufacture of a Semiconductor Device |
| JPWO2021005980A1 (https=) * | 2019-07-05 | 2021-01-14 |
-
2022
- 2022-10-12 JP JP2023567562A patent/JPWO2023112453A1/ja active Pending
- 2022-10-12 KR KR1020247019613A patent/KR20240121749A/ko active Pending
- 2022-10-12 WO PCT/JP2022/038107 patent/WO2023112453A1/ja not_active Ceased
- 2022-10-25 TW TW111140398A patent/TWI904389B/zh active
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