KR20240121749A - 란탄 화합물의 제거 방법 및 란탄 화합물 제거용 처리액 - Google Patents

란탄 화합물의 제거 방법 및 란탄 화합물 제거용 처리액 Download PDF

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Publication number
KR20240121749A
KR20240121749A KR1020247019613A KR20247019613A KR20240121749A KR 20240121749 A KR20240121749 A KR 20240121749A KR 1020247019613 A KR1020247019613 A KR 1020247019613A KR 20247019613 A KR20247019613 A KR 20247019613A KR 20240121749 A KR20240121749 A KR 20240121749A
Authority
KR
South Korea
Prior art keywords
lanthanum
lanthanum compound
treatment solution
removal
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247019613A
Other languages
English (en)
Korean (ko)
Inventor
카즈마 마츠이
Original Assignee
가부시끼가이샤 레조낙
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 레조낙 filed Critical 가부시끼가이샤 레조낙
Publication of KR20240121749A publication Critical patent/KR20240121749A/ko
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • H01L21/31111—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/69—Etching of wafers, substrates or parts of devices using masks for semiconductor materials
    • H10P50/691—Etching of wafers, substrates or parts of devices using masks for semiconductor materials for Group V materials or Group III-V materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Removal Of Specific Substances (AREA)
  • General Chemical & Material Sciences (AREA)
  • Weting (AREA)
KR1020247019613A 2021-12-17 2022-10-12 란탄 화합물의 제거 방법 및 란탄 화합물 제거용 처리액 Pending KR20240121749A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021205279 2021-12-17
JPJP-P-2021-205279 2021-12-17
PCT/JP2022/038107 WO2023112453A1 (ja) 2021-12-17 2022-10-12 ランタン化合物の除去方法及びランタン化合物除去用処理液

Publications (1)

Publication Number Publication Date
KR20240121749A true KR20240121749A (ko) 2024-08-09

Family

ID=86774382

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247019613A Pending KR20240121749A (ko) 2021-12-17 2022-10-12 란탄 화합물의 제거 방법 및 란탄 화합물 제거용 처리액

Country Status (4)

Country Link
JP (1) JPWO2023112453A1 (https=)
KR (1) KR20240121749A (https=)
TW (1) TWI904389B (https=)
WO (1) WO2023112453A1 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4189651B2 (ja) * 2003-03-26 2008-12-03 三菱瓦斯化学株式会社 高誘電率薄膜エッチング剤組成物
JP5592083B2 (ja) * 2009-06-12 2014-09-17 アイメック 基板処理方法およびそれを用いた半導体装置の製造方法
US20190103282A1 (en) * 2017-09-29 2019-04-04 Versum Materials Us, Llc Etching Solution for Simultaneously Removing Silicon and Silicon-Germanium Alloy From a Silicon-Germanium/Silicon Stack During Manufacture of a Semiconductor Device
JPWO2021005980A1 (https=) * 2019-07-05 2021-01-14

Also Published As

Publication number Publication date
JPWO2023112453A1 (https=) 2023-06-22
TW202334376A (zh) 2023-09-01
WO2023112453A1 (ja) 2023-06-22
TWI904389B (zh) 2025-11-11

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