JPWO2023068152A1 - - Google Patents

Info

Publication number
JPWO2023068152A1
JPWO2023068152A1 JP2023554605A JP2023554605A JPWO2023068152A1 JP WO2023068152 A1 JPWO2023068152 A1 JP WO2023068152A1 JP 2023554605 A JP2023554605 A JP 2023554605A JP 2023554605 A JP2023554605 A JP 2023554605A JP WO2023068152 A1 JPWO2023068152 A1 JP WO2023068152A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023554605A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023068152A1 publication Critical patent/JPWO2023068152A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/149—Coating
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/145—Preparation of hydroorganosols, organosols or dispersions in an organic medium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Compounds (AREA)
JP2023554605A 2021-10-18 2022-10-13 Pending JPWO2023068152A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021170419 2021-10-18
PCT/JP2022/038168 WO2023068152A1 (ja) 2021-10-18 2022-10-13 表面処理シリカ粒子分散ゾル及びその製造方法

Publications (1)

Publication Number Publication Date
JPWO2023068152A1 true JPWO2023068152A1 (ja) 2023-04-27

Family

ID=86059130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023554605A Pending JPWO2023068152A1 (ja) 2021-10-18 2022-10-13

Country Status (5)

Country Link
JP (1) JPWO2023068152A1 (ja)
KR (1) KR20240033263A (ja)
CN (1) CN117957194A (ja)
TW (1) TWI833391B (ja)
WO (1) WO2023068152A1 (ja)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2803134B2 (ja) 1988-03-16 1998-09-24 日産化学工業株式会社 細長い形状のシリカゾル及びその製造法
CN1185164C (zh) * 1998-09-10 2005-01-19 日产化学工业株式会社 念珠状硅溶胶、其制法及喷墨记录介质
JP4544952B2 (ja) * 2004-03-31 2010-09-15 大日本印刷株式会社 反射防止積層体
JP2007327018A (ja) * 2005-06-24 2007-12-20 Jsr Corp 硬化性樹脂組成物及び反射防止膜
WO2007018069A1 (ja) * 2005-08-10 2007-02-15 Catalysts & Chemicals Industries Co., Ltd. 異形シリカゾルおよびその製造方法
EP2325140A1 (en) * 2008-08-22 2011-05-25 The University of Tokyo Silica nanoparticle structure and process for production of same
JP5927743B2 (ja) * 2012-06-06 2016-06-01 三菱マテリアル株式会社 低屈折率膜形成用組成物の製造方法及び低屈折率膜の形成方法
JP6454954B2 (ja) * 2013-07-17 2019-01-23 東レ株式会社 組成物、これを用いた反射防止層およびその形成方法、ならびにそれを有するガラスおよび太陽電池モジュール
KR102450033B1 (ko) * 2017-04-06 2022-09-30 가부시기가이샤 닛뽕쇼꾸바이 실리카 입자
JP6927786B2 (ja) 2017-07-20 2021-09-01 東芝テック株式会社 情報処理装置及びプログラム
TWI777011B (zh) * 2017-12-27 2022-09-11 日商日揮觸媒化成股份有限公司 研磨材料用鏈狀粒子分散液的製造方法
CN114269555A (zh) * 2019-09-06 2022-04-01 富士胶片株式会社 组合物、膜、结构体、滤色器、固体摄像元件及图像显示装置

Also Published As

Publication number Publication date
WO2023068152A1 (ja) 2023-04-27
TWI833391B (zh) 2024-02-21
TW202323191A (zh) 2023-06-16
KR20240033263A (ko) 2024-03-12
CN117957194A (zh) 2024-04-30

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240213