JPWO2023022041A5 - - Google Patents
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- Publication number
- JPWO2023022041A5 JPWO2023022041A5 JP2023542347A JP2023542347A JPWO2023022041A5 JP WO2023022041 A5 JPWO2023022041 A5 JP WO2023022041A5 JP 2023542347 A JP2023542347 A JP 2023542347A JP 2023542347 A JP2023542347 A JP 2023542347A JP WO2023022041 A5 JPWO2023022041 A5 JP WO2023022041A5
- Authority
- JP
- Japan
- Prior art keywords
- contact portion
- substrate
- hole
- protrusions
- substrate contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163235231P | 2021-08-20 | 2021-08-20 | |
| JP2021148145 | 2021-09-10 | ||
| PCT/JP2022/030261 WO2023022041A1 (ja) | 2021-08-20 | 2022-08-08 | 静電チャック、基板支持器及び基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023022041A1 JPWO2023022041A1 (https=) | 2023-02-23 |
| JPWO2023022041A5 true JPWO2023022041A5 (https=) | 2025-05-22 |
Family
ID=85240649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023542347A Pending JPWO2023022041A1 (https=) | 2021-08-20 | 2022-08-08 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240186917A1 (https=) |
| JP (1) | JPWO2023022041A1 (https=) |
| KR (1) | KR20240051154A (https=) |
| TW (1) | TW202316542A (https=) |
| WO (1) | WO2023022041A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025004883A1 (ja) * | 2023-06-29 | 2025-01-02 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| KR20250142237A (ko) * | 2024-03-21 | 2025-09-30 | 에이에스엠 아이피 홀딩 비.브이. | 서셉터, 반도체 처리 시스템, 및 관련 방법 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3639686B2 (ja) * | 1996-01-31 | 2005-04-20 | キヤノン株式会社 | 基板の保持装置とこれを用いた露光装置、及びデバイスの製造方法 |
| JP3983387B2 (ja) * | 1998-09-29 | 2007-09-26 | 日本碍子株式会社 | 静電チャック |
| US6320736B1 (en) * | 1999-05-17 | 2001-11-20 | Applied Materials, Inc. | Chuck having pressurized zones of heat transfer gas |
| KR100511854B1 (ko) * | 2002-06-18 | 2005-09-02 | 아네르바 가부시키가이샤 | 정전 흡착 장치 |
| JP4061131B2 (ja) * | 2002-06-18 | 2008-03-12 | キヤノンアネルバ株式会社 | 静電吸着装置 |
| KR20040070008A (ko) * | 2003-01-29 | 2004-08-06 | 쿄세라 코포레이션 | 정전척 |
| JP4674792B2 (ja) * | 2003-12-05 | 2011-04-20 | 東京エレクトロン株式会社 | 静電チャック |
| JP4636807B2 (ja) * | 2004-03-18 | 2011-02-23 | キヤノン株式会社 | 基板保持装置およびそれを用いた露光装置 |
| JP4869610B2 (ja) * | 2005-03-17 | 2012-02-08 | 東京エレクトロン株式会社 | 基板保持部材及び基板処理装置 |
| KR102200053B1 (ko) * | 2013-02-13 | 2021-01-08 | 엔테그리스, 아이엔씨. | 중합체 양각을 갖는 진공 척 |
| JP2013153171A (ja) * | 2013-02-15 | 2013-08-08 | Panasonic Corp | プラズマ処理装置及びプラズマ処理方法 |
| KR20160015510A (ko) * | 2014-07-30 | 2016-02-15 | 삼성전자주식회사 | 정전척 어셈블리, 이를 구비하는 반도체 제조장치, 및 이를 이용한 플라즈마 처리방법 |
| JP6948822B2 (ja) | 2017-04-25 | 2021-10-13 | 東京エレクトロン株式会社 | 基板処理装置及び基板取り外し方法 |
-
2022
- 2022-08-08 WO PCT/JP2022/030261 patent/WO2023022041A1/ja not_active Ceased
- 2022-08-08 KR KR1020247007666A patent/KR20240051154A/ko active Pending
- 2022-08-08 JP JP2023542347A patent/JPWO2023022041A1/ja active Pending
- 2022-08-15 TW TW111130537A patent/TW202316542A/zh unknown
-
2024
- 2024-02-16 US US18/443,834 patent/US20240186917A1/en active Pending
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