JPWO2022260025A5 - - Google Patents

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Publication number
JPWO2022260025A5
JPWO2022260025A5 JP2023527864A JP2023527864A JPWO2022260025A5 JP WO2022260025 A5 JPWO2022260025 A5 JP WO2022260025A5 JP 2023527864 A JP2023527864 A JP 2023527864A JP 2023527864 A JP2023527864 A JP 2023527864A JP WO2022260025 A5 JPWO2022260025 A5 JP WO2022260025A5
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JP
Japan
Prior art keywords
reaction tube
halogen
producing
alkaline solution
oxyacid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023527864A
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English (en)
Japanese (ja)
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JPWO2022260025A1 (https=
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Publication date
Application filed filed Critical
Priority claimed from PCT/JP2022/022882 external-priority patent/WO2022260025A1/ja
Publication of JPWO2022260025A1 publication Critical patent/JPWO2022260025A1/ja
Publication of JPWO2022260025A5 publication Critical patent/JPWO2022260025A5/ja
Pending legal-status Critical Current

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JP2023527864A 2021-06-07 2022-06-07 Pending JPWO2022260025A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021094936 2021-06-07
PCT/JP2022/022882 WO2022260025A1 (ja) 2021-06-07 2022-06-07 ハロゲン酸素酸の製造方法及びその製造装置

Publications (2)

Publication Number Publication Date
JPWO2022260025A1 JPWO2022260025A1 (https=) 2022-12-15
JPWO2022260025A5 true JPWO2022260025A5 (https=) 2025-05-22

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ID=84425002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023527864A Pending JPWO2022260025A1 (https=) 2021-06-07 2022-06-07

Country Status (6)

Country Link
US (1) US20240116849A1 (https=)
JP (1) JPWO2022260025A1 (https=)
KR (1) KR20240018343A (https=)
CN (1) CN115916741B (https=)
TW (1) TW202313454A (https=)
WO (1) WO2022260025A1 (https=)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53118278A (en) 1977-03-25 1978-10-16 Daiwa Kikai Seisakusho Reaction apparatus
US4744956A (en) * 1986-02-12 1988-05-17 Quantum Technologies, Inc. Continuous reaction of gases with liquids
US4869833A (en) * 1986-04-03 1989-09-26 Vertech Treatment Systems, Inc. Method and apparatus for controlled chemical reactions
US4721575A (en) * 1986-04-03 1988-01-26 Vertech Treatment Systems, Inc. Method and apparatus for controlled chemical reactions
JPH01274835A (ja) * 1988-04-28 1989-11-02 Quantum Technol Inc 気体と液体との連続反応方法および装置
JP2005021798A (ja) 2003-07-01 2005-01-27 Teeiku Wan Sogo Jimusho:Kk オゾン水製造方法、オゾン水製造装置
BRPI0418529A (pt) * 2004-02-11 2007-05-15 Mallinckrodt Baker Inc composições de limpeza para microeletrÈnicos contendo ácidos de halogênio oxigenados, sais e derivados dos mesmos
JP2007105668A (ja) * 2005-10-14 2007-04-26 Mitsubishi Chemicals Corp 気液反応方法及びそのための装置
JP4360501B1 (ja) 2009-03-25 2009-11-11 日本▲まき▼線工業株式会社 オゾン水生成装置及びオゾン水生成方法
JP2012192383A (ja) * 2011-03-18 2012-10-11 Mitsubishi Rayon Co Ltd 化合物の製造方法
JP6760915B2 (ja) * 2017-12-05 2020-09-23 大陽日酸株式会社 フロー式反応装置
US11572533B2 (en) * 2018-05-23 2023-02-07 Tokuyama Corporation Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer
KR102769981B1 (ko) * 2019-11-22 2025-02-18 가부시끼가이샤 도꾸야마 차아염소산 제 4 급 알킬암모늄 용액, 그 제조 방법 및 반도체 웨이퍼의 처리 방법
JP7797124B2 (ja) * 2020-06-25 2026-01-13 株式会社トクヤマ ハロゲン酸素酸溶液の製造方法及び製造装置
CN112410805A (zh) * 2020-12-14 2021-02-26 浙江大学 管状推流式次氯酸钠发生器

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