CN115916741B - 卤素含氧酸的制造方法及其制造装置 - Google Patents

卤素含氧酸的制造方法及其制造装置

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Publication number
CN115916741B
CN115916741B CN202280004499.6A CN202280004499A CN115916741B CN 115916741 B CN115916741 B CN 115916741B CN 202280004499 A CN202280004499 A CN 202280004499A CN 115916741 B CN115916741 B CN 115916741B
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CN
China
Prior art keywords
reaction tube
halogen
reaction
solution
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202280004499.6A
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English (en)
Chinese (zh)
Other versions
CN115916741A (zh
Inventor
斋藤聪洋
望月直人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of CN115916741A publication Critical patent/CN115916741A/zh
Application granted granted Critical
Publication of CN115916741B publication Critical patent/CN115916741B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/2415—Tubular reactors
    • B01J19/243—Tubular reactors spirally, concentrically or zigzag wound
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B11/00—Oxides or oxyacids of halogens; Salts thereof
    • C01B11/04—Hypochlorous acid
    • C01B11/06—Hypochlorites
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/68—Preparation of compounds containing amino groups bound to a carbon skeleton from amines, by reactions not involving amino groups, e.g. reduction of unsaturated amines, aromatisation, or substitution of the carbon skeleton
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00002—Chemical plants
    • B01J2219/00027—Process aspects
    • B01J2219/00033—Continuous processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00164—Controlling or regulating processes controlling the flow
    • B01J2219/00166—Controlling or regulating processes controlling the flow controlling the residence time inside the reactor vessel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00761—Details of the reactor
    • B01J2219/00763—Baffles
    • B01J2219/00765—Baffles attached to the reactor wall
    • B01J2219/0077—Baffles attached to the reactor wall inclined
    • B01J2219/00772—Baffles attached to the reactor wall inclined in a helix
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
    • B01J2219/0295—Synthetic organic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/18—Details relating to the spatial orientation of the reactor
    • B01J2219/182—Details relating to the spatial orientation of the reactor horizontal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN202280004499.6A 2021-06-07 2022-06-07 卤素含氧酸的制造方法及其制造装置 Active CN115916741B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021094936 2021-06-07
JP2021-094936 2021-06-07
PCT/JP2022/022882 WO2022260025A1 (ja) 2021-06-07 2022-06-07 ハロゲン酸素酸の製造方法及びその製造装置

Publications (2)

Publication Number Publication Date
CN115916741A CN115916741A (zh) 2023-04-04
CN115916741B true CN115916741B (zh) 2025-08-08

Family

ID=84425002

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280004499.6A Active CN115916741B (zh) 2021-06-07 2022-06-07 卤素含氧酸的制造方法及其制造装置

Country Status (6)

Country Link
US (1) US20240116849A1 (https=)
JP (1) JPWO2022260025A1 (https=)
KR (1) KR20240018343A (https=)
CN (1) CN115916741B (https=)
TW (1) TW202313454A (https=)
WO (1) WO2022260025A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4721575A (en) * 1986-04-03 1988-01-26 Vertech Treatment Systems, Inc. Method and apparatus for controlled chemical reactions
US4744956A (en) * 1986-02-12 1988-05-17 Quantum Technologies, Inc. Continuous reaction of gases with liquids
CN1954267A (zh) * 2004-02-11 2007-04-25 马林克罗特贝克公司 含有卤素含氧酸、其盐及其衍生物的微电子清洗组合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53118278A (en) 1977-03-25 1978-10-16 Daiwa Kikai Seisakusho Reaction apparatus
US4869833A (en) * 1986-04-03 1989-09-26 Vertech Treatment Systems, Inc. Method and apparatus for controlled chemical reactions
JPH01274835A (ja) * 1988-04-28 1989-11-02 Quantum Technol Inc 気体と液体との連続反応方法および装置
JP2005021798A (ja) 2003-07-01 2005-01-27 Teeiku Wan Sogo Jimusho:Kk オゾン水製造方法、オゾン水製造装置
JP2007105668A (ja) * 2005-10-14 2007-04-26 Mitsubishi Chemicals Corp 気液反応方法及びそのための装置
JP4360501B1 (ja) 2009-03-25 2009-11-11 日本▲まき▼線工業株式会社 オゾン水生成装置及びオゾン水生成方法
JP2012192383A (ja) * 2011-03-18 2012-10-11 Mitsubishi Rayon Co Ltd 化合物の製造方法
JP6760915B2 (ja) * 2017-12-05 2020-09-23 大陽日酸株式会社 フロー式反応装置
US11572533B2 (en) * 2018-05-23 2023-02-07 Tokuyama Corporation Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer
KR102769981B1 (ko) * 2019-11-22 2025-02-18 가부시끼가이샤 도꾸야마 차아염소산 제 4 급 알킬암모늄 용액, 그 제조 방법 및 반도체 웨이퍼의 처리 방법
JP7797124B2 (ja) * 2020-06-25 2026-01-13 株式会社トクヤマ ハロゲン酸素酸溶液の製造方法及び製造装置
CN112410805A (zh) * 2020-12-14 2021-02-26 浙江大学 管状推流式次氯酸钠发生器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4744956A (en) * 1986-02-12 1988-05-17 Quantum Technologies, Inc. Continuous reaction of gases with liquids
US4721575A (en) * 1986-04-03 1988-01-26 Vertech Treatment Systems, Inc. Method and apparatus for controlled chemical reactions
CN1954267A (zh) * 2004-02-11 2007-04-25 马林克罗特贝克公司 含有卤素含氧酸、其盐及其衍生物的微电子清洗组合物

Also Published As

Publication number Publication date
KR20240018343A (ko) 2024-02-13
US20240116849A1 (en) 2024-04-11
WO2022260025A1 (ja) 2022-12-15
CN115916741A (zh) 2023-04-04
JPWO2022260025A1 (https=) 2022-12-15
TW202313454A (zh) 2023-04-01

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