KR20240018343A - 할로겐산소산의 제조 방법 및 그 제조 장치 - Google Patents

할로겐산소산의 제조 방법 및 그 제조 장치 Download PDF

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Publication number
KR20240018343A
KR20240018343A KR1020227039831A KR20227039831A KR20240018343A KR 20240018343 A KR20240018343 A KR 20240018343A KR 1020227039831 A KR1020227039831 A KR 1020227039831A KR 20227039831 A KR20227039831 A KR 20227039831A KR 20240018343 A KR20240018343 A KR 20240018343A
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KR
South Korea
Prior art keywords
reaction tube
liquid
reaction
halogen
solution
Prior art date
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Pending
Application number
KR1020227039831A
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English (en)
Korean (ko)
Inventor
아키히로 사이토
나오토 모치즈키
Original Assignee
가부시끼가이샤 도꾸야마
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Application filed by 가부시끼가이샤 도꾸야마 filed Critical 가부시끼가이샤 도꾸야마
Publication of KR20240018343A publication Critical patent/KR20240018343A/ko
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/2415—Tubular reactors
    • B01J19/243—Tubular reactors spirally, concentrically or zigzag wound
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B11/00—Oxides or oxyacids of halogens; Salts thereof
    • C01B11/04—Hypochlorous acid
    • C01B11/06—Hypochlorites
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/68—Preparation of compounds containing amino groups bound to a carbon skeleton from amines, by reactions not involving amino groups, e.g. reduction of unsaturated amines, aromatisation, or substitution of the carbon skeleton
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00002—Chemical plants
    • B01J2219/00027—Process aspects
    • B01J2219/00033—Continuous processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00164—Controlling or regulating processes controlling the flow
    • B01J2219/00166—Controlling or regulating processes controlling the flow controlling the residence time inside the reactor vessel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00761—Details of the reactor
    • B01J2219/00763—Baffles
    • B01J2219/00765—Baffles attached to the reactor wall
    • B01J2219/0077—Baffles attached to the reactor wall inclined
    • B01J2219/00772—Baffles attached to the reactor wall inclined in a helix
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
    • B01J2219/0295—Synthetic organic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/18—Details relating to the spatial orientation of the reactor
    • B01J2219/182—Details relating to the spatial orientation of the reactor horizontal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020227039831A 2021-06-07 2022-06-07 할로겐산소산의 제조 방법 및 그 제조 장치 Pending KR20240018343A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-094936 2021-06-07
JP2021094936 2021-06-07
PCT/JP2022/022882 WO2022260025A1 (ja) 2021-06-07 2022-06-07 ハロゲン酸素酸の製造方法及びその製造装置

Publications (1)

Publication Number Publication Date
KR20240018343A true KR20240018343A (ko) 2024-02-13

Family

ID=84425002

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227039831A Pending KR20240018343A (ko) 2021-06-07 2022-06-07 할로겐산소산의 제조 방법 및 그 제조 장치

Country Status (6)

Country Link
US (1) US20240116849A1 (https=)
JP (1) JPWO2022260025A1 (https=)
KR (1) KR20240018343A (https=)
CN (1) CN115916741B (https=)
TW (1) TW202313454A (https=)
WO (1) WO2022260025A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53118278A (en) 1977-03-25 1978-10-16 Daiwa Kikai Seisakusho Reaction apparatus
JP2005021798A (ja) 2003-07-01 2005-01-27 Teeiku Wan Sogo Jimusho:Kk オゾン水製造方法、オゾン水製造装置
JP2010221180A (ja) 2009-03-25 2010-10-07 Nippon Makisen Kogyo Kk オゾン水生成装置及びオゾン水生成方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4744956A (en) * 1986-02-12 1988-05-17 Quantum Technologies, Inc. Continuous reaction of gases with liquids
US4869833A (en) * 1986-04-03 1989-09-26 Vertech Treatment Systems, Inc. Method and apparatus for controlled chemical reactions
US4721575A (en) * 1986-04-03 1988-01-26 Vertech Treatment Systems, Inc. Method and apparatus for controlled chemical reactions
JPH01274835A (ja) * 1988-04-28 1989-11-02 Quantum Technol Inc 気体と液体との連続反応方法および装置
BRPI0418529A (pt) * 2004-02-11 2007-05-15 Mallinckrodt Baker Inc composições de limpeza para microeletrÈnicos contendo ácidos de halogênio oxigenados, sais e derivados dos mesmos
JP2007105668A (ja) * 2005-10-14 2007-04-26 Mitsubishi Chemicals Corp 気液反応方法及びそのための装置
JP2012192383A (ja) * 2011-03-18 2012-10-11 Mitsubishi Rayon Co Ltd 化合物の製造方法
JP6760915B2 (ja) * 2017-12-05 2020-09-23 大陽日酸株式会社 フロー式反応装置
US11572533B2 (en) * 2018-05-23 2023-02-07 Tokuyama Corporation Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer
KR102769981B1 (ko) * 2019-11-22 2025-02-18 가부시끼가이샤 도꾸야마 차아염소산 제 4 급 알킬암모늄 용액, 그 제조 방법 및 반도체 웨이퍼의 처리 방법
JP7797124B2 (ja) * 2020-06-25 2026-01-13 株式会社トクヤマ ハロゲン酸素酸溶液の製造方法及び製造装置
CN112410805A (zh) * 2020-12-14 2021-02-26 浙江大学 管状推流式次氯酸钠发生器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53118278A (en) 1977-03-25 1978-10-16 Daiwa Kikai Seisakusho Reaction apparatus
JP2005021798A (ja) 2003-07-01 2005-01-27 Teeiku Wan Sogo Jimusho:Kk オゾン水製造方法、オゾン水製造装置
JP2010221180A (ja) 2009-03-25 2010-10-07 Nippon Makisen Kogyo Kk オゾン水生成装置及びオゾン水生成方法

Also Published As

Publication number Publication date
US20240116849A1 (en) 2024-04-11
WO2022260025A1 (ja) 2022-12-15
CN115916741A (zh) 2023-04-04
JPWO2022260025A1 (https=) 2022-12-15
TW202313454A (zh) 2023-04-01
CN115916741B (zh) 2025-08-08

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Date Code Title Description
PA0105 International application

Patent event date: 20221114

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application