JPWO2022039212A1 - - Google Patents

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Publication number
JPWO2022039212A1
JPWO2022039212A1 JP2022543982A JP2022543982A JPWO2022039212A1 JP WO2022039212 A1 JPWO2022039212 A1 JP WO2022039212A1 JP 2022543982 A JP2022543982 A JP 2022543982A JP 2022543982 A JP2022543982 A JP 2022543982A JP WO2022039212 A1 JPWO2022039212 A1 JP WO2022039212A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2022543982A
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Japanese (ja)
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JP7747640B2 (ja
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Publication of JPWO2022039212A1 publication Critical patent/JPWO2022039212A1/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C08F212/30—Sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/38—Esters containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2022543982A 2020-08-20 2021-08-19 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法 Active JP7747640B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020139195 2020-08-20
JP2020139195 2020-08-20
PCT/JP2021/030330 WO2022039212A1 (ja) 2020-08-20 2021-08-19 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法

Publications (2)

Publication Number Publication Date
JPWO2022039212A1 true JPWO2022039212A1 (https=) 2022-02-24
JP7747640B2 JP7747640B2 (ja) 2025-10-01

Family

ID=80323488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022543982A Active JP7747640B2 (ja) 2020-08-20 2021-08-19 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法

Country Status (4)

Country Link
JP (1) JP7747640B2 (https=)
KR (1) KR20230052959A (https=)
TW (1) TWI898021B (https=)
WO (1) WO2022039212A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022196258A1 (https=) * 2021-03-15 2022-09-22
JP2022164586A (ja) * 2021-04-15 2022-10-27 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2022173111A (ja) * 2021-05-06 2022-11-17 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7813190B2 (ja) * 2021-06-18 2026-02-12 住友化学株式会社 酸発生剤、レジスト組成物及びレジストパターンの製造方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011037836A (ja) * 2009-07-14 2011-02-24 Sumitomo Chemical Co Ltd 塩、酸発生剤、重合体及びフォトレジスト組成物
JP2011191734A (ja) * 2009-12-25 2011-09-29 Tokyo Ohka Kogyo Co Ltd フォトリソグラフィ用現像液及びレジストパターン形成方法
JP2015168712A (ja) * 2014-03-05 2015-09-28 住友化学株式会社 樹脂組成物及びレジスト組成物
JP2016047920A (ja) * 2014-08-25 2016-04-07 住友化学株式会社 塩、樹脂、レジスト組成物及びレジストパターンの製造方法
JP2016108508A (ja) * 2014-12-10 2016-06-20 信越化学工業株式会社 ポリマー、レジスト材料、及びパターン形成方法
JP2016141796A (ja) * 2015-02-05 2016-08-08 信越化学工業株式会社 ポリマー、レジスト材料及びパターン形成方法
WO2017057537A1 (ja) * 2015-10-01 2017-04-06 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物及びそれを用いたデバイスの製造方法
JP2017207532A (ja) * 2016-05-16 2017-11-24 東洋合成工業株式会社 レジスト組成物及びそれを用いたデバイスの製造方法
JP2018043976A (ja) * 2016-09-07 2018-03-22 住友化学株式会社 塩、酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
WO2020170555A1 (ja) * 2019-02-22 2020-08-27 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3297272B2 (ja) 1995-07-14 2002-07-02 富士通株式会社 レジスト組成物及びレジストパターンの形成方法
JP4955732B2 (ja) 2009-05-29 2012-06-20 信越化学工業株式会社 ネガ型レジスト組成物及びこれを用いたパターン形成方法
JP5401221B2 (ja) 2009-09-04 2014-01-29 富士フイルム株式会社 感活性光線性または感放射線性組成物およびそれを用いたパターン形成方法
US20110159447A1 (en) * 2009-12-25 2011-06-30 Tokyo Ohka Kogyo Co., Ltd. Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
JP6274144B2 (ja) * 2015-04-07 2018-02-07 信越化学工業株式会社 ネガ型レジスト組成物及びパターン形成方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011037836A (ja) * 2009-07-14 2011-02-24 Sumitomo Chemical Co Ltd 塩、酸発生剤、重合体及びフォトレジスト組成物
JP2011191734A (ja) * 2009-12-25 2011-09-29 Tokyo Ohka Kogyo Co Ltd フォトリソグラフィ用現像液及びレジストパターン形成方法
JP2015168712A (ja) * 2014-03-05 2015-09-28 住友化学株式会社 樹脂組成物及びレジスト組成物
JP2016047920A (ja) * 2014-08-25 2016-04-07 住友化学株式会社 塩、樹脂、レジスト組成物及びレジストパターンの製造方法
JP2016108508A (ja) * 2014-12-10 2016-06-20 信越化学工業株式会社 ポリマー、レジスト材料、及びパターン形成方法
JP2016141796A (ja) * 2015-02-05 2016-08-08 信越化学工業株式会社 ポリマー、レジスト材料及びパターン形成方法
WO2017057537A1 (ja) * 2015-10-01 2017-04-06 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物及びそれを用いたデバイスの製造方法
JP2017207532A (ja) * 2016-05-16 2017-11-24 東洋合成工業株式会社 レジスト組成物及びそれを用いたデバイスの製造方法
JP2018043976A (ja) * 2016-09-07 2018-03-22 住友化学株式会社 塩、酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
WO2020170555A1 (ja) * 2019-02-22 2020-08-27 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法

Also Published As

Publication number Publication date
JP7747640B2 (ja) 2025-10-01
KR20230052959A (ko) 2023-04-20
WO2022039212A1 (ja) 2022-02-24
TWI898021B (zh) 2025-09-21
TW202219088A (zh) 2022-05-16

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