JPWO2022034853A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2022034853A5
JPWO2022034853A5 JP2022542831A JP2022542831A JPWO2022034853A5 JP WO2022034853 A5 JPWO2022034853 A5 JP WO2022034853A5 JP 2022542831 A JP2022542831 A JP 2022542831A JP 2022542831 A JP2022542831 A JP 2022542831A JP WO2022034853 A5 JPWO2022034853 A5 JP WO2022034853A5
Authority
JP
Japan
Prior art keywords
conductive film
less
atom
group
film according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022542831A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022034853A1 (https=
JP7480848B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2021/029151 external-priority patent/WO2022034853A1/ja
Publication of JPWO2022034853A1 publication Critical patent/JPWO2022034853A1/ja
Publication of JPWO2022034853A5 publication Critical patent/JPWO2022034853A5/ja
Application granted granted Critical
Publication of JP7480848B2 publication Critical patent/JP7480848B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2022542831A 2020-08-13 2021-08-05 導電性膜、粒子状物質、スラリーおよび導電性膜の製造方法 Active JP7480848B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020136819 2020-08-13
JP2020136819 2020-08-13
PCT/JP2021/029151 WO2022034853A1 (ja) 2020-08-13 2021-08-05 導電性膜、粒子状物質、スラリーおよび導電性膜の製造方法

Publications (3)

Publication Number Publication Date
JPWO2022034853A1 JPWO2022034853A1 (https=) 2022-02-17
JPWO2022034853A5 true JPWO2022034853A5 (https=) 2023-04-19
JP7480848B2 JP7480848B2 (ja) 2024-05-10

Family

ID=80247888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022542831A Active JP7480848B2 (ja) 2020-08-13 2021-08-05 導電性膜、粒子状物質、スラリーおよび導電性膜の製造方法

Country Status (4)

Country Link
US (1) US20230217635A1 (https=)
JP (1) JP7480848B2 (https=)
CN (1) CN116134978B (https=)
WO (1) WO2022034853A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023223780A1 (ja) * 2022-05-16 2023-11-23 株式会社村田製作所 導電性２次元粒子およびその製造方法、導電性膜、導電性ペースト、ならびに導電性複合材料
WO2023233783A1 (ja) * 2022-06-01 2023-12-07 株式会社村田製作所 電極および電極の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5145938B2 (ja) * 2005-09-16 2013-02-20 大日本印刷株式会社 帯電防止防眩フィルム
JP5387034B2 (ja) * 2009-02-20 2014-01-15 大日本印刷株式会社 導電性基板
WO2016049109A2 (en) * 2014-09-25 2016-03-31 Drexel University Physical forms of mxene materials exhibiting novel electrical and optical characteristics
JP6460383B2 (ja) * 2014-12-11 2019-01-30 Dic株式会社 導電性積層体及びその製造方法
JP2017191928A (ja) * 2016-04-11 2017-10-19 株式会社リコー 電気機械変換電子部品、液体吐出ヘッド、液体吐出ユニット及び液体を吐出する装置
KR102200472B1 (ko) * 2016-04-22 2021-01-08 한국과학기술연구원 Emi 차폐용 2차원 금속 탄화물, 질화물 및 탄질화물 필름 및 복합체
CN107058851B (zh) * 2016-12-29 2020-03-06 上海大学 一种二维片层材料增强的金属基复合材料
US20180338396A1 (en) * 2017-05-16 2018-11-22 Murata Manufacturing Co., Ltd. Electronic component having electromagnetic shielding and method for producing the same
US11312631B2 (en) * 2017-09-28 2022-04-26 Murata Manufacturing Co., Ltd. Aligned film and method for producing the same
US11202398B2 (en) * 2017-09-28 2021-12-14 Murata Manufacturing Co., Ltd. Electromagnetic shielding material and method for producing the same
WO2019079062A1 (en) * 2017-10-16 2019-04-25 Drexel University MXENE LAYERS AS SUBSTRATES FOR THE GROWTH OF HIGHLY ORIENTED THIN FILMS OF PÉROVSKITE
WO2019135533A1 (ko) * 2018-01-05 2019-07-11 한국과학기술연구원 전자파 차폐 필름의 제조 방법
KR101966582B1 (ko) * 2018-02-02 2019-04-05 성균관대학교산학협력단 2차원 맥세인 박막의 제조방법
CN110972477A (zh) * 2018-12-28 2020-04-07 株式会社亚都玛科技 MXene粒子材料、MXene粒子材料的制造方法和二次电池
CN110698847A (zh) * 2019-10-21 2020-01-17 西北工业大学 水性聚氨酯-MXene电磁屏蔽仿生纳米复合材料膜及制备方法
CN111312434B (zh) * 2020-02-27 2021-05-04 北京化工大学 基于金属纳米线的多层结构透明电磁屏蔽膜及其制备方法与应用

Similar Documents

Publication Publication Date Title
Malekpour et al. Thermal conductivity of graphene laminate
JPWO2022034853A5 (https=)
TWI589524B (zh) 乾式硏磨微粒材料的方法
Lee et al. Site and morphology controlled ZnO deposition on Pd catalyst prepared from Pd/PMMA thin film using UV lithography
JP2019143241A5 (https=)
JP2015130214A5 (https=)
KR101828867B1 (ko) 단결정 다이아몬드 연마입자의 제조방법
Islam et al. Growth mechanisms of monolayer hexagonal boron nitride (h-BN) on metal surfaces: theoretical perspectives
WO2014013920A1 (ja) 磁気記録膜形成用スパッタリングターゲット及びその製造方法
Fu et al. Energetics of hexagonal boron nitride nanostructures: edge dependence and truncation effects
Hammad et al. Structural and morphological properties of sputtered silver oxide thin films: The effect of thin film thickness
CN111206283B (zh) 一种二硒化铬二维材料的制备和应用
JP2023064743A5 (https=)
JPWO2022034852A5 (https=)
WO2015133474A1 (ja) 伝導性フィラー、伝導性フィラーの製造方法及び伝導性ペースト
JPS6374118A (ja) 磁気記録媒体
JPWO2023149103A5 (https=)
JPWO2023048081A5 (https=)
JP2024535287A5 (https=)
Savaloni et al. Fabrication, characterization and some applications of graded chiral zigzag shaped nano-sculptured silver thin films
Xiang et al. Distribution of oxygen-containing functional groups on defective graphene: properties engineering and Li adsorption
CN104637873A (zh) 一种显示基板制备方法
Ahmadi et al. Skin-resolved local bond contraction, core electron entrapment, and valence charge polarization of Ag and Cu nanoclusters
JPWO2022259775A5 (https=)
JP5240228B2 (ja) スパッタリングターゲット、及び、垂直磁気記録媒体の製造方法