JPWO2022030127A1 - - Google Patents
Info
- Publication number
- JPWO2022030127A1 JPWO2022030127A1 JP2022541148A JP2022541148A JPWO2022030127A1 JP WO2022030127 A1 JPWO2022030127 A1 JP WO2022030127A1 JP 2022541148 A JP2022541148 A JP 2022541148A JP 2022541148 A JP2022541148 A JP 2022541148A JP WO2022030127 A1 JPWO2022030127 A1 JP WO2022030127A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0233—Mounting configuration of laser chips
- H01S5/0234—Up-side down mountings, e.g. Flip-chip, epi-side down mountings or junction down mountings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
- H01S5/02355—Fixing laser chips on mounts
- H01S5/0237—Fixing laser chips on mounts by soldering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/0207—Substrates having a special shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3216—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities quantum well or superlattice cladding layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Led Device Packages (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020132661 | 2020-08-04 | ||
| PCT/JP2021/023768 WO2022030127A1 (ja) | 2020-08-04 | 2021-06-23 | 半導体発光装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022030127A1 true JPWO2022030127A1 (https=) | 2022-02-10 |
Family
ID=80117972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022541148A Pending JPWO2022030127A1 (https=) | 2020-08-04 | 2021-06-23 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20230155346A1 (https=) |
| JP (1) | JPWO2022030127A1 (https=) |
| DE (1) | DE112021004159T5 (https=) |
| WO (1) | WO2022030127A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023143314A (ja) * | 2022-03-25 | 2023-10-06 | ヌヴォトンテクノロジージャパン株式会社 | 半導体発光装置、基台、半田付き基台、及び、半導体発光装置の製造方法 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11220204A (ja) * | 1998-01-30 | 1999-08-10 | Mitsubishi Electric Corp | アレイ型半導体レーザ装置およびその製造方法 |
| JP2003037323A (ja) * | 2001-07-25 | 2003-02-07 | Sony Corp | 半導体レーザ・アレイ装置用サブマウント、半導体レーザ・アレイ装置、及びその作製方法 |
| JP2003318475A (ja) * | 2002-04-24 | 2003-11-07 | Kyocera Corp | 光半導体素子のマウント構造 |
| US20070286252A1 (en) * | 2006-06-08 | 2007-12-13 | Samsung Electronics Co., Ltd. | Submount of a multi-beam laser diode module |
| US20090104727A1 (en) * | 2007-09-20 | 2009-04-23 | Bookham Technology Plc | High power semiconductor laser diodes |
| JP2011233717A (ja) * | 2010-04-27 | 2011-11-17 | Sharp Corp | 半導体レーザ装置 |
| JP2015135911A (ja) * | 2014-01-17 | 2015-07-27 | 日本オクラロ株式会社 | 半導体光素子及び光モジュール |
| JP2015173218A (ja) * | 2014-03-12 | 2015-10-01 | 三菱電機株式会社 | 半導体レーザ光源 |
| WO2018203466A1 (ja) * | 2017-05-01 | 2018-11-08 | パナソニックIpマネジメント株式会社 | 窒化物系発光装置 |
| JP2019129217A (ja) * | 2018-01-24 | 2019-08-01 | パナソニック株式会社 | 半導体レーザ素子及び半導体レーザ装置 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5627851A (en) * | 1995-02-10 | 1997-05-06 | Ricoh Company, Ltd. | Semiconductor light emitting device |
| JP2000133877A (ja) * | 1998-10-27 | 2000-05-12 | Furukawa Electric Co Ltd:The | 半導体レーザ素子 |
| JP2003198057A (ja) * | 2001-12-27 | 2003-07-11 | Sony Corp | 半導体レーザ素子及びその製造方法 |
| JP2004087866A (ja) * | 2002-08-28 | 2004-03-18 | Hitachi Ltd | 半導体光素子、その実装体および光モジュール |
| JP2005223070A (ja) * | 2004-02-04 | 2005-08-18 | Toshiba Corp | 半導体発光素子及び半導体発光装置 |
| JP2006303299A (ja) * | 2005-04-22 | 2006-11-02 | Sharp Corp | 半導体レーザ |
| JP2009283512A (ja) * | 2008-05-19 | 2009-12-03 | Panasonic Corp | 窒化物半導体レーザ |
| JP4966283B2 (ja) * | 2008-10-14 | 2012-07-04 | シャープ株式会社 | 半導体レーザ装置およびその製造方法 |
| JP2011222675A (ja) * | 2010-04-07 | 2011-11-04 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
| WO2016129618A1 (ja) * | 2015-02-12 | 2016-08-18 | 古河電気工業株式会社 | 半導体レーザ素子およびレーザ光照射装置 |
| DE102015106712A1 (de) * | 2015-04-30 | 2016-11-03 | Osram Opto Semiconductors Gmbh | Anordnung mit einem Substrat und einem Halbleiterlaser |
| JP6700019B2 (ja) * | 2015-10-20 | 2020-05-27 | スタンレー電気株式会社 | 半導体発光素子 |
| EP3836318B1 (en) * | 2018-08-09 | 2025-10-08 | Nuvoton Technology Corporation Japan | Semiconductor light emission device and method for manufacturing semiconductor light emission device |
| WO2020174949A1 (ja) * | 2019-02-26 | 2020-09-03 | パナソニックセミコンダクターソリューションズ株式会社 | 半導体レーザ装置及び半導体レーザ素子 |
| JP7356287B2 (ja) * | 2019-08-06 | 2023-10-04 | ソニーセミコンダクタソリューションズ株式会社 | 半導体レーザ駆動装置、および、電子機器 |
| US20220263288A1 (en) * | 2019-08-26 | 2022-08-18 | Panasonic Corporation | Semiconductor laser device |
| WO2021111536A1 (ja) * | 2019-12-04 | 2021-06-10 | 三菱電機株式会社 | 半導体レーザ素子およびその製造方法、半導体レーザ装置 |
| CN115989620B (zh) * | 2020-09-04 | 2025-02-25 | 三菱电机株式会社 | 半导体激光器以及半导体激光装置 |
| WO2023153476A1 (ja) * | 2022-02-10 | 2023-08-17 | 京セラ株式会社 | 発光デバイスの製造方法および製造装置並びにレーザ素子基板 |
| CN116960725A (zh) * | 2022-04-14 | 2023-10-27 | 潍坊华光光电子有限公司 | 一种基于金锡焊料封装的热沉结构及共晶方法 |
-
2021
- 2021-06-23 JP JP2022541148A patent/JPWO2022030127A1/ja active Pending
- 2021-06-23 WO PCT/JP2021/023768 patent/WO2022030127A1/ja not_active Ceased
- 2021-06-23 DE DE112021004159.2T patent/DE112021004159T5/de not_active Withdrawn
-
2023
- 2023-01-19 US US18/098,825 patent/US20230155346A1/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11220204A (ja) * | 1998-01-30 | 1999-08-10 | Mitsubishi Electric Corp | アレイ型半導体レーザ装置およびその製造方法 |
| JP2003037323A (ja) * | 2001-07-25 | 2003-02-07 | Sony Corp | 半導体レーザ・アレイ装置用サブマウント、半導体レーザ・アレイ装置、及びその作製方法 |
| JP2003318475A (ja) * | 2002-04-24 | 2003-11-07 | Kyocera Corp | 光半導体素子のマウント構造 |
| US20070286252A1 (en) * | 2006-06-08 | 2007-12-13 | Samsung Electronics Co., Ltd. | Submount of a multi-beam laser diode module |
| US20090104727A1 (en) * | 2007-09-20 | 2009-04-23 | Bookham Technology Plc | High power semiconductor laser diodes |
| JP2011233717A (ja) * | 2010-04-27 | 2011-11-17 | Sharp Corp | 半導体レーザ装置 |
| JP2015135911A (ja) * | 2014-01-17 | 2015-07-27 | 日本オクラロ株式会社 | 半導体光素子及び光モジュール |
| JP2015173218A (ja) * | 2014-03-12 | 2015-10-01 | 三菱電機株式会社 | 半導体レーザ光源 |
| WO2018203466A1 (ja) * | 2017-05-01 | 2018-11-08 | パナソニックIpマネジメント株式会社 | 窒化物系発光装置 |
| JP2019129217A (ja) * | 2018-01-24 | 2019-08-01 | パナソニック株式会社 | 半導体レーザ素子及び半導体レーザ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20230155346A1 (en) | 2023-05-18 |
| DE112021004159T5 (de) | 2023-06-22 |
| WO2022030127A1 (ja) | 2022-02-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240408 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20250204 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20250624 |