JPWO2022024772A5 - - Google Patents
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- Publication number
- JPWO2022024772A5 JPWO2022024772A5 JP2022540163A JP2022540163A JPWO2022024772A5 JP WO2022024772 A5 JPWO2022024772 A5 JP WO2022024772A5 JP 2022540163 A JP2022540163 A JP 2022540163A JP 2022540163 A JP2022540163 A JP 2022540163A JP WO2022024772 A5 JPWO2022024772 A5 JP WO2022024772A5
- Authority
- JP
- Japan
- Prior art keywords
- metal
- region
- atomic
- content
- metals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229910052751 metal Inorganic materials 0.000 claims description 85
- 239000002184 metal Substances 0.000 claims description 85
- 150000002739 metals Chemical class 0.000 claims description 19
- 239000011888 foil Substances 0.000 claims description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 239000003990 capacitor Substances 0.000 claims 18
- 239000002905 metal composite material Substances 0.000 claims 9
- 239000012535 impurity Substances 0.000 claims 5
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020130968 | 2020-07-31 | ||
| PCT/JP2021/026540 WO2022024772A1 (ja) | 2020-07-31 | 2021-07-15 | 電解コンデンサ用電極箔および電解コンデンサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2022024772A1 JPWO2022024772A1 (https=) | 2022-02-03 |
| JPWO2022024772A5 true JPWO2022024772A5 (https=) | 2023-04-12 |
Family
ID=80036377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022540163A Pending JPWO2022024772A1 (https=) | 2020-07-31 | 2021-07-15 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US12494327B2 (https=) |
| JP (1) | JPWO2022024772A1 (https=) |
| CN (1) | CN116134567B (https=) |
| WO (1) | WO2022024772A1 (https=) |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003224036A (ja) * | 2002-01-31 | 2003-08-08 | Japan Carlit Co Ltd:The | 電解コンデンサ用アルミニウム陽極箔及びその製造方法 |
| JP4297721B2 (ja) * | 2003-04-16 | 2009-07-15 | 昭和電工株式会社 | 電解コンデンサ電極用アルミニウム材の製造方法 |
| US20050252449A1 (en) | 2004-05-12 | 2005-11-17 | Nguyen Son T | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
| WO2006014753A1 (en) * | 2004-07-23 | 2006-02-09 | Sundew Technologies, Llp | Capacitors with high energy storage density and low esr |
| JP2006310493A (ja) * | 2005-04-27 | 2006-11-09 | Nippon Steel Corp | コンデンサ用電極箔 |
| US7491246B2 (en) | 2006-03-31 | 2009-02-17 | Medtronic, Inc. | Capacitor electrodes produced with atomic layer deposition for use in implantable medical devices |
| JP2008198984A (ja) | 2007-01-19 | 2008-08-28 | Sanyo Electric Co Ltd | ニオブ固体電解コンデンサ及びその製造方法 |
| US20080174939A1 (en) | 2007-01-19 | 2008-07-24 | Sanyo Electric Co., Ltd. | Niobiuim solid electrolytic capacitor and fabrication method thereof |
| JP4973229B2 (ja) * | 2007-02-19 | 2012-07-11 | 富士通株式会社 | 電解コンデンサおよびその製造方法 |
| JP2008288561A (ja) * | 2007-04-20 | 2008-11-27 | Sanyo Electric Co Ltd | ニオブ固体電解コンデンサ及びその製造方法 |
| US10312077B2 (en) | 2015-10-08 | 2019-06-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for forming aluminum-containing dielectric layer |
| WO2017154461A1 (ja) * | 2016-03-10 | 2017-09-14 | パナソニックＩｐマネジメント株式会社 | 電極箔の製造方法および電解コンデンサの製造方法 |
| JP6735510B2 (ja) * | 2016-03-25 | 2020-08-05 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| WO2018180029A1 (ja) * | 2017-03-30 | 2018-10-04 | パナソニックＩｐマネジメント株式会社 | 電極および電解コンデンサ並びにそれらの製造方法 |
-
2021
- 2021-07-15 JP JP2022540163A patent/JPWO2022024772A1/ja active Pending
- 2021-07-15 CN CN202180060465.4A patent/CN116134567B/zh active Active
- 2021-07-15 WO PCT/JP2021/026540 patent/WO2022024772A1/ja not_active Ceased
- 2021-07-15 US US18/003,692 patent/US12494327B2/en active Active
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