JPWO2021251081A1 - - Google Patents

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Publication number
JPWO2021251081A1
JPWO2021251081A1 JP2022530087A JP2022530087A JPWO2021251081A1 JP WO2021251081 A1 JPWO2021251081 A1 JP WO2021251081A1 JP 2022530087 A JP2022530087 A JP 2022530087A JP 2022530087 A JP2022530087 A JP 2022530087A JP WO2021251081 A1 JPWO2021251081 A1 JP WO2021251081A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022530087A
Other languages
Japanese (ja)
Other versions
JPWO2021251081A5 (https=
JP7731879B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Publication of JPWO2021251081A1 publication Critical patent/JPWO2021251081A1/ja
Publication of JPWO2021251081A5 publication Critical patent/JPWO2021251081A5/ja
Application granted granted Critical
Publication of JP7731879B2 publication Critical patent/JP7731879B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/45Differential amplifiers
    • H03F3/45071Differential amplifiers with semiconductor devices only
    • H03F3/45076Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier
    • H03F3/45475Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier using IC blocks as the active amplifying circuit
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/645Combinations of only lateral BJTs
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/45Differential amplifiers
    • H03F3/45071Differential amplifiers with semiconductor devices only
    • H03F3/45076Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier
    • H03F3/4508Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier using bipolar transistors as the active amplifying circuit
    • H03F3/45085Long tailed pairs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67Complementary BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/427Power or ground buses
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2203/00Indexing scheme relating to amplifiers with only discharge tubes or only semiconductor devices as amplifying elements covered by H03F3/00
    • H03F2203/45Indexing scheme relating to differential amplifiers
    • H03F2203/45528Indexing scheme relating to differential amplifiers the FBC comprising one or more passive resistors and being coupled between the LC and the IC
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2203/00Indexing scheme relating to amplifiers with only discharge tubes or only semiconductor devices as amplifying elements covered by H03F3/00
    • H03F2203/45Indexing scheme relating to differential amplifiers
    • H03F2203/45612Indexing scheme relating to differential amplifiers the IC comprising one or more input source followers as input stages in the IC
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/40Vertical BJTs
    • H10D10/421Vertical BJTs having both emitter-base and base-collector junctions ending at the same surface of the body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/60Lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/63Combinations of vertical and lateral BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19Preparing inhomogeneous wafers
    • H10P90/1904Preparing vertically inhomogeneous wafers
    • H10P90/1906Preparing SOI wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10Isolation regions comprising dielectric materials
    • H10W10/181Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5449Dispositions of bond wires not being orthogonal to a side surface of the chip, e.g. fan-out arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/944Dispositions of multiple bond pads
    • H10W72/9445Top-view layouts, e.g. mirror arrays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2022530087A 2020-06-08 2021-05-19 半導体装置、電子機器 Active JP7731879B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020099164 2020-06-08
JP2020099164 2020-06-08
PCT/JP2021/018899 WO2021251081A1 (ja) 2020-06-08 2021-05-19 半導体装置、電子機器

Publications (3)

Publication Number Publication Date
JPWO2021251081A1 true JPWO2021251081A1 (https=) 2021-12-16
JPWO2021251081A5 JPWO2021251081A5 (https=) 2023-02-20
JP7731879B2 JP7731879B2 (ja) 2025-09-01

Family

ID=78847227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022530087A Active JP7731879B2 (ja) 2020-06-08 2021-05-19 半導体装置、電子機器

Country Status (5)

Country Link
US (1) US20230223403A1 (https=)
JP (1) JP7731879B2 (https=)
CN (1) CN115702500A (https=)
DE (1) DE112021002303B4 (https=)
WO (1) WO2021251081A1 (https=)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08115985A (ja) * 1994-10-17 1996-05-07 Nec Corp 低雑音の半導体集積回路
JP2000114461A (ja) * 1998-09-29 2000-04-21 Sanyo Electric Co Ltd 半導体集積回路装置
JP2002246553A (ja) * 2001-02-16 2002-08-30 Matsushita Electric Ind Co Ltd 半導体集積回路のノイズ低減装置
JP2005039320A (ja) * 2003-07-15 2005-02-10 Renesas Technology Corp 半導体素子及び高周波電力増幅装置
JP2006193019A (ja) * 2005-01-12 2006-07-27 Mitsubishi Electric Corp 保持解放機構
JP2008071818A (ja) * 2006-09-12 2008-03-27 Nec Electronics Corp 半導体装置
JP2008112857A (ja) * 2006-10-30 2008-05-15 Nec Electronics Corp 半導体集積回路装置
JP2008193019A (ja) * 2007-02-08 2008-08-21 Matsushita Electric Ind Co Ltd 半導体集積回路装置
JP2012009841A (ja) * 2010-05-21 2012-01-12 Semiconductor Energy Lab Co Ltd 半導体素子、及び半導体装置
WO2019039245A1 (ja) * 2017-08-22 2019-02-28 ローム株式会社 オペアンプ
JP2020004936A (ja) * 2018-07-02 2020-01-09 株式会社デンソー 半導体装置およびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5724934B2 (ja) 2011-07-05 2015-05-27 株式会社デンソー 半導体装置
US10608168B2 (en) * 2017-10-04 2020-03-31 Allegro Microsystems, Llc Isolated hall effect element with improved electro-magnetic isolation
JP7308595B2 (ja) * 2018-07-02 2023-07-14 Tianma Japan株式会社 イメージセンサ

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08115985A (ja) * 1994-10-17 1996-05-07 Nec Corp 低雑音の半導体集積回路
JP2000114461A (ja) * 1998-09-29 2000-04-21 Sanyo Electric Co Ltd 半導体集積回路装置
JP2002246553A (ja) * 2001-02-16 2002-08-30 Matsushita Electric Ind Co Ltd 半導体集積回路のノイズ低減装置
JP2005039320A (ja) * 2003-07-15 2005-02-10 Renesas Technology Corp 半導体素子及び高周波電力増幅装置
JP2006193019A (ja) * 2005-01-12 2006-07-27 Mitsubishi Electric Corp 保持解放機構
JP2008071818A (ja) * 2006-09-12 2008-03-27 Nec Electronics Corp 半導体装置
JP2008112857A (ja) * 2006-10-30 2008-05-15 Nec Electronics Corp 半導体集積回路装置
JP2008193019A (ja) * 2007-02-08 2008-08-21 Matsushita Electric Ind Co Ltd 半導体集積回路装置
JP2012009841A (ja) * 2010-05-21 2012-01-12 Semiconductor Energy Lab Co Ltd 半導体素子、及び半導体装置
WO2019039245A1 (ja) * 2017-08-22 2019-02-28 ローム株式会社 オペアンプ
JP2020004936A (ja) * 2018-07-02 2020-01-09 株式会社デンソー 半導体装置およびその製造方法

Also Published As

Publication number Publication date
DE112021002303T5 (de) 2023-03-16
WO2021251081A1 (ja) 2021-12-16
CN115702500A (zh) 2023-02-14
US20230223403A1 (en) 2023-07-13
DE112021002303B4 (de) 2023-09-21
JP7731879B2 (ja) 2025-09-01

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