JPWO2021235299A1 - - Google Patents

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Publication number
JPWO2021235299A1
JPWO2021235299A1 JP2022524413A JP2022524413A JPWO2021235299A1 JP WO2021235299 A1 JPWO2021235299 A1 JP WO2021235299A1 JP 2022524413 A JP2022524413 A JP 2022524413A JP 2022524413 A JP2022524413 A JP 2022524413A JP WO2021235299 A1 JPWO2021235299 A1 JP WO2021235299A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022524413A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021235299A1 publication Critical patent/JPWO2021235299A1/ja
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66—Polyesters containing oxygen in the form of ether groups
    • C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2022524413A 2020-05-19 2021-05-12 Pending JPWO2021235299A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020087317 2020-05-19
PCT/JP2021/018120 WO2021235299A1 (ja) 2020-05-19 2021-05-12 重合性不飽和基含有アルカリ可溶性樹脂及びその製造方法、並びに感光性樹脂組成物及びその硬化物

Publications (1)

Publication Number Publication Date
JPWO2021235299A1 true JPWO2021235299A1 (zh) 2021-11-25

Family

ID=78707869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022524413A Pending JPWO2021235299A1 (zh) 2020-05-19 2021-05-12

Country Status (5)

Country Link
JP (1) JPWO2021235299A1 (zh)
KR (1) KR20230007429A (zh)
CN (1) CN115551915A (zh)
TW (1) TW202202544A (zh)
WO (1) WO2021235299A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023248488A1 (ja) * 2022-06-23 2023-12-28 Dic株式会社 （メタ）アクリレート樹脂の製造方法
JP7380949B1 (ja) * 2022-06-23 2023-11-15 Dic株式会社 （メタ）アクリレート樹脂の製造方法

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6289719A (ja) * 1985-10-15 1987-04-24 Sanyo Kokusaku Pulp Co Ltd 新規ビニルエステル樹脂およびその製造法
JPH05214048A (ja) * 1992-01-31 1993-08-24 Nippon Oil Co Ltd 光硬化性樹脂組成物およびソルダーレジスト用光硬化性樹脂組成物
JPH101596A (ja) * 1996-06-19 1998-01-06 Dainippon Ink & Chem Inc 多層プリント配線板用層間電気絶縁材料
JP2002220425A (ja) * 2001-01-25 2002-08-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP2002226560A (ja) * 2001-01-31 2002-08-14 Showa Highpolymer Co Ltd 硬化性樹脂および硬化性樹脂組成物
JP2004295084A (ja) * 2003-03-12 2004-10-21 Mitsubishi Chemicals Corp 感光性組成物、感光性着色組成物、カラーフィルタ、及び液晶表示装置
JP2006350153A (ja) * 2005-06-20 2006-12-28 Mitsubishi Chemicals Corp 感光性組成物、感光性着色成物、カラーフィルタ、及び液晶表示装置
JP2007016113A (ja) * 2005-07-07 2007-01-25 Nippon Kayaku Co Ltd エポキシ樹脂、感光性樹脂及び感光性樹脂組成物
JP2009102456A (ja) * 2007-10-19 2009-05-14 Jfe Chemical Corp ジシクロペンタジエン類変性フェノール樹脂の製造方法および未反応フェノール類の再利用方法
US20160139507A1 (en) * 2014-11-17 2016-05-19 Samsung Sdi Co., Ltd. Photosensitive Resin Composition, Photosensitive Resin Film Using the Same and Color Filter
JP2020015823A (ja) * 2018-07-26 2020-01-30 日鉄ケミカル＆マテリアル株式会社 エポキシ樹脂組成物、プリプレグ、積層板およびプリント配線板
WO2020129724A1 (ja) * 2018-12-19 2020-06-25 日鉄ケミカル＆マテリアル株式会社 フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物およびその硬化物
JP2021054970A (ja) * 2019-09-30 2021-04-08 日鉄ケミカル＆マテリアル株式会社 重合性不飽和基含有アルカリ可溶性樹脂、その製造方法、感光性樹脂組成物、及びその硬化膜。

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61213213A (ja) 1985-03-19 1986-09-22 Fuji Photo Film Co Ltd 光重合性組成物
JPH0695211B2 (ja) 1987-12-09 1994-11-24 松下電器産業株式会社 カラーフィルタ
JP2764480B2 (ja) 1991-05-17 1998-06-11 日本化薬株式会社 カラーフィルター用光重合組成物
JPH04345608A (ja) 1991-05-23 1992-12-01 Nippon Kayaku Co Ltd カラーフィルター用材料及びその硬化物
JP2820553B2 (ja) 1991-05-23 1998-11-05 日本化薬株式会社 ソルダーレジストインキ組成物及びその硬化物
JP2878486B2 (ja) 1991-05-31 1999-04-05 日本化薬株式会社 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP2975173B2 (ja) 1991-06-06 1999-11-10 日本化薬株式会社 カラーフイルターの保護膜用材料及びその硬化物
CN101017324A (zh) * 2003-03-12 2007-08-15 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备
JP6822758B2 (ja) * 2014-09-30 2021-01-27 日鉄ケミカル＆マテリアル株式会社 タッチパネル用感光性樹脂組成物およびその硬化膜、ならびに当該硬化膜を有するタッチパネル
JP6275620B2 (ja) * 2014-10-17 2018-02-07 日本化薬株式会社 感光性樹脂組成物及びその硬化物
JP7120234B2 (ja) * 2017-06-29 2022-08-17 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
JP7029267B2 (ja) * 2017-10-06 2022-03-03 日鉄ケミカル＆マテリアル株式会社 感光性樹脂組成物及び樹脂膜付き基板の製造方法

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6289719A (ja) * 1985-10-15 1987-04-24 Sanyo Kokusaku Pulp Co Ltd 新規ビニルエステル樹脂およびその製造法
JPH05214048A (ja) * 1992-01-31 1993-08-24 Nippon Oil Co Ltd 光硬化性樹脂組成物およびソルダーレジスト用光硬化性樹脂組成物
JPH101596A (ja) * 1996-06-19 1998-01-06 Dainippon Ink & Chem Inc 多層プリント配線板用層間電気絶縁材料
JP2002220425A (ja) * 2001-01-25 2002-08-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP2002226560A (ja) * 2001-01-31 2002-08-14 Showa Highpolymer Co Ltd 硬化性樹脂および硬化性樹脂組成物
JP2004295084A (ja) * 2003-03-12 2004-10-21 Mitsubishi Chemicals Corp 感光性組成物、感光性着色組成物、カラーフィルタ、及び液晶表示装置
JP2006350153A (ja) * 2005-06-20 2006-12-28 Mitsubishi Chemicals Corp 感光性組成物、感光性着色成物、カラーフィルタ、及び液晶表示装置
JP2007016113A (ja) * 2005-07-07 2007-01-25 Nippon Kayaku Co Ltd エポキシ樹脂、感光性樹脂及び感光性樹脂組成物
JP2009102456A (ja) * 2007-10-19 2009-05-14 Jfe Chemical Corp ジシクロペンタジエン類変性フェノール樹脂の製造方法および未反応フェノール類の再利用方法
US20160139507A1 (en) * 2014-11-17 2016-05-19 Samsung Sdi Co., Ltd. Photosensitive Resin Composition, Photosensitive Resin Film Using the Same and Color Filter
JP2020015823A (ja) * 2018-07-26 2020-01-30 日鉄ケミカル＆マテリアル株式会社 エポキシ樹脂組成物、プリプレグ、積層板およびプリント配線板
WO2020129724A1 (ja) * 2018-12-19 2020-06-25 日鉄ケミカル＆マテリアル株式会社 フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物およびその硬化物
JP2021054970A (ja) * 2019-09-30 2021-04-08 日鉄ケミカル＆マテリアル株式会社 重合性不飽和基含有アルカリ可溶性樹脂、その製造方法、感光性樹脂組成物、及びその硬化膜。

Also Published As

Publication number Publication date
KR20230007429A (ko) 2023-01-12
TW202202544A (zh) 2022-01-16
CN115551915A (zh) 2022-12-30
WO2021235299A1 (ja) 2021-11-25

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