JPWO2021230097A1 - - Google Patents

Info

Publication number
JPWO2021230097A1
JPWO2021230097A1 JP2022521835A JP2022521835A JPWO2021230097A1 JP WO2021230097 A1 JPWO2021230097 A1 JP WO2021230097A1 JP 2022521835 A JP2022521835 A JP 2022521835A JP 2022521835 A JP2022521835 A JP 2022521835A JP WO2021230097 A1 JPWO2021230097 A1 JP WO2021230097A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022521835A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021230097A1 publication Critical patent/JPWO2021230097A1/ja
Priority to JP2024191969A priority Critical patent/JP2025020271A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C08F290/144—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Epoxy Resins (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2022521835A 2020-05-12 2021-04-30 Pending JPWO2021230097A1 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024191969A JP2025020271A (ja) 2020-05-12 2024-10-31 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020083923 2020-05-12
PCT/JP2021/017135 WO2021230097A1 (ja) 2020-05-12 2021-04-30 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024191969A Division JP2025020271A (ja) 2020-05-12 2024-10-31 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Publications (1)

Publication Number Publication Date
JPWO2021230097A1 true JPWO2021230097A1 (enrdf_load_stackoverflow) 2021-11-18

Family

ID=78525743

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022521835A Pending JPWO2021230097A1 (enrdf_load_stackoverflow) 2020-05-12 2021-04-30
JP2024191969A Pending JP2025020271A (ja) 2020-05-12 2024-10-31 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024191969A Pending JP2025020271A (ja) 2020-05-12 2024-10-31 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Country Status (5)

Country Link
JP (2) JPWO2021230097A1 (enrdf_load_stackoverflow)
KR (1) KR20230008105A (enrdf_load_stackoverflow)
CN (1) CN115551914B (enrdf_load_stackoverflow)
TW (1) TWI889814B (enrdf_load_stackoverflow)
WO (1) WO2021230097A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250042120A (ko) * 2022-07-22 2025-03-26 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 다관능 비닐 수지, 그 제조 방법, 다관능 비닐 수지 조성물 및 그 경화물

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6289719A (ja) * 1985-10-15 1987-04-24 Sanyo Kokusaku Pulp Co Ltd 新規ビニルエステル樹脂およびその製造法
JPH05214048A (ja) * 1992-01-31 1993-08-24 Nippon Oil Co Ltd 光硬化性樹脂組成物およびソルダーレジスト用光硬化性樹脂組成物
JPH101596A (ja) * 1996-06-19 1998-01-06 Dainippon Ink & Chem Inc 多層プリント配線板用層間電気絶縁材料
JP2002220425A (ja) * 2001-01-25 2002-08-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP2002226560A (ja) * 2001-01-31 2002-08-14 Showa Highpolymer Co Ltd 硬化性樹脂および硬化性樹脂組成物
JP2004295084A (ja) * 2003-03-12 2004-10-21 Mitsubishi Chemicals Corp 感光性組成物、感光性着色組成物、カラーフィルタ、及び液晶表示装置
JP2006350153A (ja) * 2005-06-20 2006-12-28 Mitsubishi Chemicals Corp 感光性組成物、感光性着色成物、カラーフィルタ、及び液晶表示装置
JP2007016113A (ja) * 2005-07-07 2007-01-25 Nippon Kayaku Co Ltd エポキシ樹脂、感光性樹脂及び感光性樹脂組成物
JP2009102456A (ja) * 2007-10-19 2009-05-14 Jfe Chemical Corp ジシクロペンタジエン類変性フェノール樹脂の製造方法および未反応フェノール類の再利用方法
JP2020015823A (ja) * 2018-07-26 2020-01-30 日鉄ケミカル＆マテリアル株式会社 エポキシ樹脂組成物、プリプレグ、積層板およびプリント配線板
WO2020129724A1 (ja) * 2018-12-19 2020-06-25 日鉄ケミカル＆マテリアル株式会社 フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物およびその硬化物
JP2021046520A (ja) * 2019-09-20 2021-03-25 日鉄ケミカル＆マテリアル株式会社 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JP2764480B2 (ja) 1991-05-17 1998-06-11 日本化薬株式会社 カラーフィルター用光重合組成物
JP3813244B2 (ja) 1996-06-07 2006-08-23 新日鐵化学株式会社 アルカリ現像性不飽和樹脂組成物及びこれを用いた高感度ネガ型パターン形成材料
JP4812974B2 (ja) 2001-07-12 2011-11-09 新日鐵化学株式会社 硬化性樹脂、硬化性樹脂組成物及びその硬化物
CN101017324A (zh) * 2003-03-12 2007-08-15 三菱化学株式会社 光敏组合物、光敏着色组合物、滤色器和液晶显示设备
JP2005239817A (ja) * 2004-02-25 2005-09-08 Dainippon Ink & Chem Inc 酸ペンダント型エポキシアクリレート樹脂の製造方法および硬化性樹脂組成物
CN107540816B (zh) * 2016-06-23 2020-09-22 南亚塑胶工业股份有限公司 二环戊二烯-酚与2,6-二甲基苯酚的共聚物环氧树脂的制备与应用

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6289719A (ja) * 1985-10-15 1987-04-24 Sanyo Kokusaku Pulp Co Ltd 新規ビニルエステル樹脂およびその製造法
JPH05214048A (ja) * 1992-01-31 1993-08-24 Nippon Oil Co Ltd 光硬化性樹脂組成物およびソルダーレジスト用光硬化性樹脂組成物
JPH101596A (ja) * 1996-06-19 1998-01-06 Dainippon Ink & Chem Inc 多層プリント配線板用層間電気絶縁材料
JP2002220425A (ja) * 2001-01-25 2002-08-09 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP2002226560A (ja) * 2001-01-31 2002-08-14 Showa Highpolymer Co Ltd 硬化性樹脂および硬化性樹脂組成物
JP2004295084A (ja) * 2003-03-12 2004-10-21 Mitsubishi Chemicals Corp 感光性組成物、感光性着色組成物、カラーフィルタ、及び液晶表示装置
JP2006350153A (ja) * 2005-06-20 2006-12-28 Mitsubishi Chemicals Corp 感光性組成物、感光性着色成物、カラーフィルタ、及び液晶表示装置
JP2007016113A (ja) * 2005-07-07 2007-01-25 Nippon Kayaku Co Ltd エポキシ樹脂、感光性樹脂及び感光性樹脂組成物
JP2009102456A (ja) * 2007-10-19 2009-05-14 Jfe Chemical Corp ジシクロペンタジエン類変性フェノール樹脂の製造方法および未反応フェノール類の再利用方法
JP2020015823A (ja) * 2018-07-26 2020-01-30 日鉄ケミカル＆マテリアル株式会社 エポキシ樹脂組成物、プリプレグ、積層板およびプリント配線板
WO2020129724A1 (ja) * 2018-12-19 2020-06-25 日鉄ケミカル＆マテリアル株式会社 フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物およびその硬化物
JP2021046520A (ja) * 2019-09-20 2021-03-25 日鉄ケミカル＆マテリアル株式会社 エポキシアクリレート樹脂、アルカリ可溶性樹脂、それを含む樹脂組成物及びその硬化物

Also Published As

Publication number Publication date
KR20230008105A (ko) 2023-01-13
CN115551914A (zh) 2022-12-30
CN115551914B (zh) 2025-06-27
TW202146505A (zh) 2021-12-16
TWI889814B (zh) 2025-07-11
JP2025020271A (ja) 2025-02-12
WO2021230097A1 (ja) 2021-11-18

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