JPWO2021131967A5 - - Google Patents

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Publication number
JPWO2021131967A5
JPWO2021131967A5 JP2021567342A JP2021567342A JPWO2021131967A5 JP WO2021131967 A5 JPWO2021131967 A5 JP WO2021131967A5 JP 2021567342 A JP2021567342 A JP 2021567342A JP 2021567342 A JP2021567342 A JP 2021567342A JP WO2021131967 A5 JPWO2021131967 A5 JP WO2021131967A5
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JP
Japan
Prior art keywords
aln
voids
void
less
polycrystalline layer
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JP2021567342A
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English (en)
Japanese (ja)
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JPWO2021131967A1 (https=
JP7700051B2 (ja
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Priority claimed from PCT/JP2020/046972 external-priority patent/WO2021131967A1/ja
Publication of JPWO2021131967A1 publication Critical patent/JPWO2021131967A1/ja
Publication of JPWO2021131967A5 publication Critical patent/JPWO2021131967A5/ja
Application granted granted Critical
Publication of JP7700051B2 publication Critical patent/JP7700051B2/ja
Active legal-status Critical Current
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JP2021567342A 2019-12-23 2020-12-16 ＡｌＮ積層板 Active JP7700051B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019231910 2019-12-23
JP2019231910 2019-12-23
PCT/JP2020/046972 WO2021131967A1 (ja) 2019-12-23 2020-12-16 ＡｌＮ積層板

Publications (3)

Publication Number Publication Date
JPWO2021131967A1 JPWO2021131967A1 (https=) 2021-07-01
JPWO2021131967A5 true JPWO2021131967A5 (https=) 2022-08-19
JP7700051B2 JP7700051B2 (ja) 2025-06-30

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ID=76575915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021567342A Active JP7700051B2 (ja) 2019-12-23 2020-12-16 ＡｌＮ積層板

Country Status (2)

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JP (1) JP7700051B2 (https=)
WO (1) WO2021131967A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5324110B2 (ja) * 2008-01-16 2013-10-23 国立大学法人東京農工大学 積層体およびその製造方法
JP2010010613A (ja) * 2008-06-30 2010-01-14 Tokuyama Corp 積層体、自立基板製造用基板、自立基板およびこれらの製造方法
JP4565042B1 (ja) * 2009-04-22 2010-10-20 株式会社トクヤマ Ｉｉｉ族窒化物結晶基板の製造方法
JP4707755B2 (ja) * 2009-07-16 2011-06-22 株式会社トクヤマ 窒化アルミニウム単結晶層を有する積層体の製造方法、該製法で製造される積層体、該積層体を用いた窒化アルミニウム単結晶基板の製造方法、および、窒化アルミニウム単結晶基板
JP6503819B2 (ja) * 2015-03-23 2019-04-24 Tdk株式会社 アルミナ基板

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