JPWO2021091708A5 - - Google Patents
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- Publication number
- JPWO2021091708A5 JPWO2021091708A5 JP2022525211A JP2022525211A JPWO2021091708A5 JP WO2021091708 A5 JPWO2021091708 A5 JP WO2021091708A5 JP 2022525211 A JP2022525211 A JP 2022525211A JP 2022525211 A JP2022525211 A JP 2022525211A JP WO2021091708 A5 JPWO2021091708 A5 JP WO2021091708A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- degrees celsius
- deflection
- heated
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/674,340 US11133213B2 (en) | 2019-11-05 | 2019-11-05 | Deflectable platen and associated method |
| US16/674,340 | 2019-11-05 | ||
| PCT/US2020/057234 WO2021091708A1 (en) | 2019-11-05 | 2020-10-24 | Deflectable platen and associated method |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2023500831A JP2023500831A (ja) | 2023-01-11 |
| JPWO2021091708A5 true JPWO2021091708A5 (https=) | 2023-11-01 |
| JP2023500831A5 JP2023500831A5 (https=) | 2023-11-01 |
| JP7801215B2 JP7801215B2 (ja) | 2026-01-16 |
Family
ID=75688808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022525211A Active JP7801215B2 (ja) | 2019-11-05 | 2020-10-24 | 可撓性プラテン及びそれに関連する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11133213B2 (https=) |
| JP (1) | JP7801215B2 (https=) |
| KR (1) | KR20220093176A (https=) |
| CN (1) | CN114631177B (https=) |
| TW (1) | TWI873213B (https=) |
| WO (1) | WO2021091708A1 (https=) |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06302550A (ja) * | 1993-04-13 | 1994-10-28 | Hitachi Ltd | 半導体製造装置 |
| JP3149398B2 (ja) * | 1998-06-16 | 2001-03-26 | 株式会社アドバンスト・ディスプレイ | 液晶パネル製造装置および方法 |
| JP2000031253A (ja) | 1998-07-10 | 2000-01-28 | Komatsu Ltd | 基板処理装置及び方法 |
| JP2000124299A (ja) * | 1998-10-16 | 2000-04-28 | Hitachi Ltd | 半導体装置の製造方法および半導体製造装置 |
| TW492135B (en) * | 2000-05-25 | 2002-06-21 | Tomoegawa Paper Co Ltd | Adhesive sheets for static electricity chuck device, and static electricity chuck device |
| US6623563B2 (en) | 2001-01-02 | 2003-09-23 | Applied Materials, Inc. | Susceptor with bi-metal effect |
| US6669783B2 (en) * | 2001-06-28 | 2003-12-30 | Lam Research Corporation | High temperature electrostatic chuck |
| JP2007067349A (ja) * | 2005-09-02 | 2007-03-15 | Nissan Motor Co Ltd | 圧接型半導体装置 |
| JP4524268B2 (ja) * | 2006-04-28 | 2010-08-11 | 信越化学工業株式会社 | 静電チャック機能付きセラミックヒーター及びその製造方法 |
| DE102006022264B4 (de) * | 2006-05-11 | 2008-04-03 | Uhlmann Pac-Systeme Gmbh & Co. Kg | Siegelwerkzeug zum Siegeln von Folien in einer Siegelstation |
| JP2011221006A (ja) * | 2010-03-23 | 2011-11-04 | Tokyo Electron Ltd | ウェハ型温度検知センサおよびその製造方法 |
| US9948214B2 (en) * | 2012-04-26 | 2018-04-17 | Applied Materials, Inc. | High temperature electrostatic chuck with real-time heat zone regulating capability |
| US9281252B1 (en) | 2014-10-24 | 2016-03-08 | Globalfoundries Inc. | Method comprising applying an external mechanical stress to a semiconductor structure and semiconductor processing tool |
| US10054856B2 (en) | 2015-02-12 | 2018-08-21 | Toshiba Memory Corporation | Exposure method, manufacturing method of device, and thin film sheet |
| JP6341457B1 (ja) * | 2017-03-29 | 2018-06-13 | Toto株式会社 | 静電チャック |
| JP2019057538A (ja) | 2017-09-19 | 2019-04-11 | 株式会社アルバック | 吸着装置、真空装置 |
-
2019
- 2019-11-05 US US16/674,340 patent/US11133213B2/en active Active
-
2020
- 2020-10-24 JP JP2022525211A patent/JP7801215B2/ja active Active
- 2020-10-24 CN CN202080076072.8A patent/CN114631177B/zh active Active
- 2020-10-24 KR KR1020227018492A patent/KR20220093176A/ko active Pending
- 2020-10-24 WO PCT/US2020/057234 patent/WO2021091708A1/en not_active Ceased
- 2020-10-29 TW TW109137685A patent/TWI873213B/zh active
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