JPWO2020119863A5 - - Google Patents
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- JPWO2020119863A5 JPWO2020119863A5 JP2021533580A JP2021533580A JPWO2020119863A5 JP WO2020119863 A5 JPWO2020119863 A5 JP WO2020119863A5 JP 2021533580 A JP2021533580 A JP 2021533580A JP 2021533580 A JP2021533580 A JP 2021533580A JP WO2020119863 A5 JPWO2020119863 A5 JP WO2020119863A5
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- Prior art keywords
- processing
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- 238000000034 method Methods 0.000 claims 4
- 238000001514 detection method Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000000608 laser ablation Methods 0.000 claims 1
- 238000003698 laser cutting Methods 0.000 claims 1
- 239000011344 liquid material Substances 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018132001.9 | 2018-12-12 | ||
| DE102018132001.9A DE102018132001A1 (de) | 2018-12-12 | 2018-12-12 | Vorrichtung zum Belichten von plattenförmigen Werkstücken mit hohem Durchsatz |
| PCT/DE2019/101076 WO2020119863A1 (de) | 2018-12-12 | 2019-12-11 | Vorrichtung zum belichten von plattenförmigen werkstücken mit hohem durchsatz |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022512416A JP2022512416A (ja) | 2022-02-03 |
| JPWO2020119863A5 true JPWO2020119863A5 (enExample) | 2023-11-08 |
| JP7438219B2 JP7438219B2 (ja) | 2024-02-26 |
Family
ID=69143365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021533580A Active JP7438219B2 (ja) | 2018-12-12 | 2019-12-11 | 高い処理量で板状ワークピースを露光する装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11656556B2 (enExample) |
| EP (1) | EP3894961A1 (enExample) |
| JP (1) | JP7438219B2 (enExample) |
| KR (1) | KR102678965B1 (enExample) |
| CN (1) | CN113287066B (enExample) |
| DE (1) | DE102018132001A1 (enExample) |
| WO (1) | WO2020119863A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020124006B3 (de) | 2020-09-15 | 2022-01-05 | Laser Imaging Systems Gmbh | Belichtungssteuerung bei photolithographischen direktbelichtungsverfahren zur leiterplatten- oder schaltkreisherstellung |
| DE102020127981B3 (de) | 2020-10-23 | 2021-12-16 | Laser Imaging Systems Gmbh | Wendevorrichtung zum Handhaben empfindlicher Substrate bei der Belichtung von zweidimensionalen Strukturen auf beiden Substratoberflächen |
| CN113579575A (zh) * | 2021-07-26 | 2021-11-02 | 湖北欧阳华俊专用汽车有限公司 | 一种瓦楞板焊接机 |
| DE102021127226B3 (de) | 2021-10-20 | 2022-12-22 | Jenaer Antriebstechnik Gmbh | Vorrichtung mit einem beweglichen Tischsystem sowie Verfahren zu dessen Kalibrierung und Betrieb |
| DE102021128222B4 (de) * | 2021-10-29 | 2023-10-19 | Carl Zeiss Smt Gmbh | Verfahren zur Vermessung eines Substrates für die Halbleiterlithografie |
| CN114348607B (zh) * | 2022-01-21 | 2024-02-06 | 江苏拓海微纳精密技术有限公司 | 定位贴标设备 |
| DE102022109021A1 (de) | 2022-04-13 | 2023-10-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren und Vorrichtung zum Ausbilden einer Struktur an einem Werkstück |
| CN115055320B (zh) * | 2022-08-19 | 2022-11-22 | 佛山协智领航科技有限公司 | 一种用于家具制造的表面喷漆设备 |
| CN116177163A (zh) * | 2022-12-29 | 2023-05-30 | 中联重科股份有限公司 | 箱型工件变位系统和工程机械生产线 |
| CN117485862A (zh) * | 2023-11-21 | 2024-02-02 | 深圳市镭煜科技有限公司 | 一种连续翻转下料装置 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2832673B2 (ja) * | 1993-10-29 | 1998-12-09 | 株式会社オーク製作所 | 露光装置およびワークの露光方法 |
| EP0722123B1 (en) | 1995-01-12 | 1999-04-14 | Orc Manufacturing Co., Ltd. | Apparatus and method for exposing of workpiece |
| AU5067898A (en) | 1996-11-28 | 1998-06-22 | Nikon Corporation | Aligner and method for exposure |
| US6037967A (en) * | 1996-12-18 | 2000-03-14 | Etec Systems, Inc. | Short wavelength pulsed laser scanner |
| DE69735016T2 (de) * | 1996-12-24 | 2006-08-17 | Asml Netherlands B.V. | Lithographisches Gerät mit zwei Objekthaltern |
| JPH10209039A (ja) * | 1997-01-27 | 1998-08-07 | Nikon Corp | 投影露光方法及び投影露光装置 |
| US7157038B2 (en) * | 2000-09-20 | 2007-01-02 | Electro Scientific Industries, Inc. | Ultraviolet laser ablative patterning of microstructures in semiconductors |
| JP2002099095A (ja) | 2000-09-25 | 2002-04-05 | Orc Mfg Co Ltd | 自動両面露光装置およびその方法 |
| JP2002341550A (ja) * | 2001-05-17 | 2002-11-27 | Dainippon Screen Mfg Co Ltd | レーザー露光装置 |
| CN100480620C (zh) | 2002-05-02 | 2009-04-22 | 奥博泰克有限公司 | 采用非均匀修正的图像制造印刷电路板的系统和方法 |
| JP2004046051A (ja) * | 2002-05-23 | 2004-02-12 | Sanee Giken Kk | 走査露光方法および走査露光装置 |
| JP4158514B2 (ja) * | 2002-12-24 | 2008-10-01 | ウシオ電機株式会社 | 両面投影露光装置 |
| JP2004233608A (ja) | 2003-01-30 | 2004-08-19 | Fuji Photo Film Co Ltd | 露光装置 |
| JP2005024957A (ja) | 2003-07-03 | 2005-01-27 | Fuji Photo Film Co Ltd | 画像形成装置 |
| DE602004020634D1 (de) * | 2003-08-07 | 2009-05-28 | Nippon Kogaku Kk | Belichtungsverfahren |
| US20050254032A1 (en) * | 2003-11-13 | 2005-11-17 | Fuji Photo Film Co., Ltd. | Exposure device |
| JP4606990B2 (ja) | 2005-10-07 | 2011-01-05 | 富士フイルム株式会社 | デジタル露光装置 |
| WO2008044612A1 (en) * | 2006-09-29 | 2008-04-17 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| JP4845757B2 (ja) * | 2007-02-02 | 2011-12-28 | 富士フイルム株式会社 | 描画装置及び方法 |
| US20080187871A1 (en) * | 2007-02-02 | 2008-08-07 | Fujifilm Corporation | Pattern forming apparatus and method |
| JP2008250072A (ja) * | 2007-03-30 | 2008-10-16 | Fujifilm Corp | 描画装置及び方法 |
| JP2009092723A (ja) | 2007-10-04 | 2009-04-30 | Adtec Engineeng Co Ltd | 両面露光装置 |
| JP2009157249A (ja) | 2007-12-27 | 2009-07-16 | Orc Mfg Co Ltd | 露光装置 |
| JP2010181519A (ja) | 2009-02-04 | 2010-08-19 | Adtec Engineeng Co Ltd | 露光装置 |
| JP5333063B2 (ja) * | 2009-08-28 | 2013-11-06 | ウシオ電機株式会社 | 両面露光装置 |
| JP5747463B2 (ja) * | 2010-08-20 | 2015-07-15 | セイコーエプソン株式会社 | 記録装置およびそのワーク除給材方法 |
| JP5550053B2 (ja) | 2011-03-25 | 2014-07-16 | ビアメカニクス株式会社 | 反転装置及びそれを用いた露光装置並びに露光方法 |
| FR2988183B1 (fr) * | 2012-03-13 | 2015-04-03 | Altix | Machine d'insolation de panneaux munie d'un retourneur de panneau |
| JP5813555B2 (ja) * | 2012-03-30 | 2015-11-17 | 株式会社アドテックエンジニアリング | 露光描画装置及び露光描画方法 |
| JP6465591B2 (ja) | 2014-08-27 | 2019-02-06 | 株式会社オーク製作所 | 描画装置 |
| US10857732B2 (en) * | 2015-02-05 | 2020-12-08 | Mycronic AB | Recurring process for laser induced forward transfer and high throughput and recycling of donor material by the reuse of a plurality of target substrate plates or forward transfer of a pattern of discrete donor dots |
| JP5773095B1 (ja) * | 2015-02-10 | 2015-09-02 | ウシオ電機株式会社 | 光照射装置および光照射方法 |
| JP2017067887A (ja) * | 2015-09-29 | 2017-04-06 | 株式会社オーク製作所 | 露光装置 |
| CN105182699B (zh) * | 2015-09-30 | 2017-06-30 | 合肥芯碁微电子装备有限公司 | 一种双台面激光直写曝光机及其控制方法 |
-
2018
- 2018-12-12 DE DE102018132001.9A patent/DE102018132001A1/de active Pending
-
2019
- 2019-12-11 JP JP2021533580A patent/JP7438219B2/ja active Active
- 2019-12-11 KR KR1020217020289A patent/KR102678965B1/ko active Active
- 2019-12-11 WO PCT/DE2019/101076 patent/WO2020119863A1/de not_active Ceased
- 2019-12-11 US US17/413,501 patent/US11656556B2/en active Active
- 2019-12-11 EP EP19832544.1A patent/EP3894961A1/de active Pending
- 2019-12-11 CN CN201980088518.6A patent/CN113287066B/zh active Active
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