JPWO2020086710A5 - - Google Patents

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Publication number
JPWO2020086710A5
JPWO2020086710A5 JP2021521401A JP2021521401A JPWO2020086710A5 JP WO2020086710 A5 JPWO2020086710 A5 JP WO2020086710A5 JP 2021521401 A JP2021521401 A JP 2021521401A JP 2021521401 A JP2021521401 A JP 2021521401A JP WO2020086710 A5 JPWO2020086710 A5 JP WO2020086710A5
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Japan
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chamber
opening
exhaust
substrate holder
container
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JP2021521401A
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English (en)
Japanese (ja)
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JP7279158B2 (ja
JP2022505397A (ja
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Priority claimed from US16/657,787 external-priority patent/US11508593B2/en
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JP2021521401A 2018-10-26 2019-10-23 側部収納ポッド、電子デバイス処理システムおよびその操作方法 Active JP7279158B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862751526P 2018-10-26 2018-10-26
US62/751,526 2018-10-26
US16/657,787 US11508593B2 (en) 2018-10-26 2019-10-18 Side storage pods, electronic device processing systems, and methods for operating the same
US16/657,787 2019-10-18
PCT/US2019/057651 WO2020086710A1 (en) 2018-10-26 2019-10-23 Side storage pods, electronic device processing systems, and methods for operating the same

Publications (3)

Publication Number Publication Date
JP2022505397A JP2022505397A (ja) 2022-01-14
JPWO2020086710A5 true JPWO2020086710A5 (ro) 2023-02-02
JP7279158B2 JP7279158B2 (ja) 2023-05-22

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ID=70327366

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JP2021521401A Active JP7279158B2 (ja) 2018-10-26 2019-10-23 側部収納ポッド、電子デバイス処理システムおよびその操作方法

Country Status (6)

Country Link
US (2) US11508593B2 (ro)
JP (1) JP7279158B2 (ro)
KR (1) KR102531097B1 (ro)
CN (1) CN112970098B (ro)
TW (1) TWI799658B (ro)
WO (1) WO2020086710A1 (ro)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11373891B2 (en) * 2018-10-26 2022-06-28 Applied Materials, Inc. Front-ducted equipment front end modules, side storage pods, and methods of operating the same
US11508593B2 (en) * 2018-10-26 2022-11-22 Applied Materials, Inc. Side storage pods, electronic device processing systems, and methods for operating the same
US11244844B2 (en) 2018-10-26 2022-02-08 Applied Materials, Inc. High flow velocity, gas-purged, side storage pod apparatus, assemblies, and methods
KR102202463B1 (ko) * 2019-03-13 2021-01-14 세메스 주식회사 기판 처리 장치 및 방법
US20220310412A1 (en) * 2021-03-23 2022-09-29 Rorze Technology Incorporated Gas circulation structure of equipment front end module (efem)
TWI823271B (zh) * 2022-02-24 2023-11-21 天虹科技股份有限公司 基板傳送方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2016356C1 (ru) * 1991-09-24 1994-07-15 Инженерный центр "Плазмодинамика" Способ защиты сверхчистых поверхностей и устройство для создания потока защитной среды
US6415736B1 (en) * 1999-06-30 2002-07-09 Lam Research Corporation Gas distribution apparatus for semiconductor processing
US6318945B1 (en) * 1999-07-28 2001-11-20 Brooks Automation, Inc. Substrate processing apparatus with vertically stacked load lock and substrate transport robot
JP4763922B2 (ja) * 2001-06-25 2011-08-31 株式会社神戸製鋼所 成膜装置及び成膜装置での汚染防止方法
JP2005079250A (ja) * 2003-08-29 2005-03-24 Hitachi Kokusai Electric Inc 基板処理装置
JP2006245365A (ja) * 2005-03-04 2006-09-14 Hitachi High-Technologies Corp 真空処理装置
JP2009087972A (ja) * 2007-09-27 2009-04-23 Tokyo Electron Ltd 基板収容機構及び半導体製造装置
JP2010087169A (ja) * 2008-09-30 2010-04-15 Tokyo Electron Ltd 気化器およびそれを用いた成膜装置
JP2011061155A (ja) * 2009-09-14 2011-03-24 Hitachi Kokusai Electric Inc 基板処理装置及び基板の搬送方法、並びに半導体装置の製造方法
KR101090350B1 (ko) * 2011-02-07 2011-12-07 우범제 퓸 제거장치 및 이를 이용한 반도체 제조장치
KR101215962B1 (ko) 2012-07-30 2012-12-27 이프로링크텍(주) Efem의 버퍼 스토리지 박스
TW201413780A (zh) * 2012-09-24 2014-04-01 Eugene Technology Co Ltd 煙氣移除設備及基板處理設備
US20140261803A1 (en) * 2013-03-15 2014-09-18 Lam Research Corporation High strip rate downstream chamber
KR101682473B1 (ko) * 2013-10-18 2016-12-05 삼성전자주식회사 사이드 스토리지 및 이를 구비하는 반도체 소자 제조 설비
TWI678751B (zh) * 2013-12-13 2019-12-01 日商昕芙旎雅股份有限公司 設備前端模組(efem)
KR102162366B1 (ko) * 2014-01-21 2020-10-06 우범제 퓸 제거 장치
US9881826B2 (en) * 2014-10-24 2018-01-30 Lam Research Corporation Buffer station with single exit-flow direction
US9711353B2 (en) * 2015-02-13 2017-07-18 Panasonic Corporation Method for manufacturing compound semiconductor epitaxial substrates including heating of carrier gas
KR101637498B1 (ko) 2015-03-24 2016-07-07 피코앤테라(주) 웨이퍼 수납용기
JP6431440B2 (ja) * 2015-05-27 2018-11-28 信越ポリマー株式会社 基板収納容器
JP6450653B2 (ja) * 2015-06-24 2019-01-09 東京エレクトロン株式会社 格納ユニット、搬送装置、及び、基板処理システム
EP4102549A1 (en) * 2016-08-30 2022-12-14 Brooks Automation (Germany) GmbH Reticle compartment and diffusor plate
KR20180045316A (ko) * 2016-10-25 2018-05-04 삼성전자주식회사 설비 전방 단부 모듈 및 이를 포함하는 반도체 제조 장치
US10159169B2 (en) * 2016-10-27 2018-12-18 Applied Materials, Inc. Flexible equipment front end module interfaces, environmentally-controlled equipment front end modules, and assembly methods
KR20180074276A (ko) 2016-12-23 2018-07-03 피코앤테라(주) 이에프이엠
CN117276150B (zh) * 2017-06-23 2024-06-04 应用材料公司 可索引侧储存仓设备、加热的侧储存仓设备、系统和方法
US10388547B2 (en) * 2017-06-23 2019-08-20 Applied Materials, Inc. Side storage pods, equipment front end modules, and methods for processing substrates
US11508593B2 (en) * 2018-10-26 2022-11-22 Applied Materials, Inc. Side storage pods, electronic device processing systems, and methods for operating the same
JP2020161544A (ja) * 2019-03-25 2020-10-01 住友金属鉱山株式会社 成膜装置および成膜方法

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