JPWO2020078677A5 - - Google Patents
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- Publication number
- JPWO2020078677A5 JPWO2020078677A5 JP2021521195A JP2021521195A JPWO2020078677A5 JP WO2020078677 A5 JPWO2020078677 A5 JP WO2020078677A5 JP 2021521195 A JP2021521195 A JP 2021521195A JP 2021521195 A JP2021521195 A JP 2021521195A JP WO2020078677 A5 JPWO2020078677 A5 JP WO2020078677A5
- Authority
- JP
- Japan
- Prior art keywords
- overlay
- angle
- contour
- determining
- target structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 27
- 238000001228 spectrum Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 8
- 238000005259 measurement Methods 0.000 claims description 7
- 230000001419 dependent effect Effects 0.000 claims 4
- 230000003595 spectral effect Effects 0.000 claims 4
- 238000004590 computer program Methods 0.000 claims 2
- 238000007689 inspection Methods 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000000059 patterning Methods 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP18201147.8 | 2018-10-18 | ||
| EP18201147.8A EP3640735A1 (en) | 2018-10-18 | 2018-10-18 | Methods and apparatus for inspection of a structure and associated apparatuses |
| PCT/EP2019/075819 WO2020078677A1 (en) | 2018-10-18 | 2019-09-25 | Methods and apparatus for inspection of a structure and associated apparatuses |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2022505239A JP2022505239A (ja) | 2022-01-14 |
| JP2022505239A5 JP2022505239A5 (https=) | 2022-06-22 |
| JPWO2020078677A5 true JPWO2020078677A5 (https=) | 2022-06-22 |
| JP7162738B2 JP7162738B2 (ja) | 2022-10-28 |
Family
ID=63914825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021521195A Active JP7162738B2 (ja) | 2018-10-18 | 2019-09-25 | 構造物及び関連装置の検査方法及び装置 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11175592B2 (https=) |
| EP (1) | EP3640735A1 (https=) |
| JP (1) | JP7162738B2 (https=) |
| KR (1) | KR102604928B1 (https=) |
| CN (1) | CN112867970B (https=) |
| IL (1) | IL282180B2 (https=) |
| TW (2) | TWI774219B (https=) |
| WO (1) | WO2020078677A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102877760B1 (ko) * | 2020-03-02 | 2025-10-27 | 에이에스엠엘 네델란즈 비.브이. | 국부 균일성 메트릭을 추론하는 방법 |
| US11454894B2 (en) * | 2020-09-14 | 2022-09-27 | Kla Corporation | Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof |
| EP4016186A1 (en) * | 2020-12-18 | 2022-06-22 | ASML Netherlands B.V. | Metrology method for measuring an etched trench and associated metrology apparatus |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7111256B2 (en) * | 2002-06-05 | 2006-09-19 | Kla-Tencor Technologies Corporation | Use of overlay diagnostics for enhanced automatic process control |
| JP5159027B2 (ja) * | 2004-06-04 | 2013-03-06 | キヤノン株式会社 | 照明光学系及び露光装置 |
| US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| JP4922112B2 (ja) * | 2006-09-13 | 2012-04-25 | エーエスエムエル マスクツールズ ビー．ブイ． | パターン分解フィーチャのためのモデルベースｏｐｃを行うための方法および装置 |
| US8148682B2 (en) * | 2009-12-29 | 2012-04-03 | Hitachi, Ltd. | Method and apparatus for pattern position and overlay measurement |
| US9958791B2 (en) * | 2013-10-30 | 2018-05-01 | Asml Netherlands B.V. | Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method |
| EP2876498B1 (en) | 2013-11-22 | 2017-05-24 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
| US10210606B2 (en) * | 2014-10-14 | 2019-02-19 | Kla-Tencor Corporation | Signal response metrology for image based and scatterometry overlay measurements |
| WO2016096365A1 (en) | 2014-12-17 | 2016-06-23 | Asml Netherlands B.V. | Method and apparatus for using patterning device topography induced phase |
| KR20170120153A (ko) * | 2015-03-13 | 2017-10-30 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 방법 및 리소그래피 장치 |
| CN107430352B (zh) * | 2015-03-25 | 2020-01-21 | Asml荷兰有限公司 | 量测方法、量测设备和器件制造方法 |
| NL2017300A (en) * | 2015-08-27 | 2017-03-01 | Asml Netherlands Bv | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method |
| NL2017452A (en) * | 2015-10-02 | 2017-04-11 | Asml Netherlands Bv | Metrology method and apparatus, computer program and lithographic system |
| US10615084B2 (en) | 2016-03-01 | 2020-04-07 | Asml Netherlands B.V. | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values |
| EP3214713B1 (en) | 2016-03-03 | 2022-05-04 | General Electric Technology GmbH | Improvements in or relating to electrical power systems |
| EP3435162A1 (en) * | 2017-07-28 | 2019-01-30 | ASML Netherlands B.V. | Metrology method and apparatus and computer program |
-
2018
- 2018-10-18 EP EP18201147.8A patent/EP3640735A1/en not_active Withdrawn
-
2019
- 2019-09-25 WO PCT/EP2019/075819 patent/WO2020078677A1/en not_active Ceased
- 2019-09-25 JP JP2021521195A patent/JP7162738B2/ja active Active
- 2019-09-25 IL IL282180A patent/IL282180B2/en unknown
- 2019-09-25 CN CN201980068958.5A patent/CN112867970B/zh active Active
- 2019-09-25 KR KR1020217011455A patent/KR102604928B1/ko active Active
- 2019-10-15 TW TW110103196A patent/TWI774219B/zh active
- 2019-10-15 TW TW108137012A patent/TWI721601B/zh active
- 2019-10-17 US US16/656,094 patent/US11175592B2/en active Active
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