JPWO2020046994A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2020046994A5
JPWO2020046994A5 JP2021510328A JP2021510328A JPWO2020046994A5 JP WO2020046994 A5 JPWO2020046994 A5 JP WO2020046994A5 JP 2021510328 A JP2021510328 A JP 2021510328A JP 2021510328 A JP2021510328 A JP 2021510328A JP WO2020046994 A5 JPWO2020046994 A5 JP WO2020046994A5
Authority
JP
Japan
Prior art keywords
contact device
conduit
ultrapure water
ozone
delivery system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021510328A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022502235A (ja
JP7422135B2 (ja
Publication date
Application filed filed Critical
Priority claimed from PCT/US2019/048411 external-priority patent/WO2020046994A1/en
Publication of JP2022502235A publication Critical patent/JP2022502235A/ja
Publication of JPWO2020046994A5 publication Critical patent/JPWO2020046994A5/ja
Application granted granted Critical
Publication of JP7422135B2 publication Critical patent/JP7422135B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021510328A 2018-08-29 2019-08-27 オゾン水デリバリシステム及び使用方法 Active JP7422135B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862724368P 2018-08-29 2018-08-29
US62/724,368 2018-08-29
PCT/US2019/048411 WO2020046994A1 (en) 2018-08-29 2019-08-27 Ozonated water delivery system and method of use

Publications (3)

Publication Number Publication Date
JP2022502235A JP2022502235A (ja) 2022-01-11
JPWO2020046994A5 true JPWO2020046994A5 (zh) 2022-06-02
JP7422135B2 JP7422135B2 (ja) 2024-01-25

Family

ID=69639551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021510328A Active JP7422135B2 (ja) 2018-08-29 2019-08-27 オゾン水デリバリシステム及び使用方法

Country Status (9)

Country Link
US (1) US11518696B2 (zh)
EP (1) EP3814284A4 (zh)
JP (1) JP7422135B2 (zh)
KR (2) KR20210038980A (zh)
CN (1) CN112601720A (zh)
IL (1) IL281134A (zh)
SG (1) SG11202100619PA (zh)
TW (1) TW202023962A (zh)
WO (1) WO2020046994A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024020126A1 (en) * 2022-07-20 2024-01-25 Evoqua Water Technologies Llc Mobile ultrapure water system

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5261966A (en) 1991-01-28 1993-11-16 Kabushiki Kaisha Toshiba Method of cleaning semiconductor wafers using mixer containing a bundle of gas permeable hollow yarns
EP0598424A3 (en) 1992-11-16 1996-05-15 Novellus Systems Inc Apparatus for removing dissolved gases from a liquid.
JP3174856B2 (ja) 1993-05-07 2001-06-11 日本エア・リキード株式会社 混合ガス供給装置
US6001223A (en) 1995-07-07 1999-12-14 Air Liquide America Corporation On-site ammonia purification for semiconductor manufacture
US6293849B1 (en) 1997-10-31 2001-09-25 Ebara Corporation Polishing solution supply system
US7980753B2 (en) 1998-04-16 2011-07-19 Air Liquide Electronics U.S. Lp Systems and methods for managing fluids in a processing environment using a liquid ring pump and reclamation system
US20070119816A1 (en) 1998-04-16 2007-05-31 Urquhart Karl J Systems and methods for reclaiming process fluids in a processing environment
JP2000037695A (ja) * 1998-07-24 2000-02-08 Kurita Water Ind Ltd オゾン水供給装置
US6247838B1 (en) 1998-11-24 2001-06-19 The Boc Group, Inc. Method for producing a liquid mixture having a predetermined concentration of a specified component
JP2000262874A (ja) * 1999-03-15 2000-09-26 Mitsubishi Electric Corp オゾン水の製造方法および製造装置
JP3748731B2 (ja) 1999-03-26 2006-02-22 株式会社荏原製作所 砥液供給装置
EP1237824B1 (en) 1999-10-19 2007-06-20 Phifer Smith Corporation A method and apparatus for treating a substrate with an ozone-solvent solution
JP2001129376A (ja) 1999-11-08 2001-05-15 Ishikawajima Harima Heavy Ind Co Ltd オゾン水製造方法及び製造装置
DE60123254T2 (de) 2000-07-31 2007-09-06 Kinetics Chempure Systems, Inc., Tempe Verfahren und vorrichtung zum mischen von prozessmaterialien
US6805791B2 (en) 2000-09-01 2004-10-19 Applied Science And Technology, Inc. Ozonated water flow and concentration control apparatus
US6884359B2 (en) * 2000-09-27 2005-04-26 Dainippon Ink And Chemicals, Inc. Apparatus and method for controlling resistivity of ultra pure water
US6766818B2 (en) 2001-04-06 2004-07-27 Akrion, Llc Chemical concentration control device
CN1602538A (zh) 2001-11-13 2005-03-30 Fsi国际公司 用于浸渍处理的高级处理控制
US6732017B2 (en) 2002-02-15 2004-05-04 Lam Research Corp. System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system
JP2003334433A (ja) 2002-05-16 2003-11-25 Kurita Water Ind Ltd 連続溶解装置、連続溶解方法及び気体溶解水供給装置
KR100519843B1 (ko) 2002-05-29 2005-10-06 도요탄소 가부시키가이샤 불소가스 발생장치
WO2004009224A1 (en) 2002-07-19 2004-01-29 Kinetic Systems, Inc. Method and apparatus for blending process materials
US7543596B2 (en) 2002-07-19 2009-06-09 Entegris, Inc. Liquid flow controller and precision dispense apparatus and system
CN1682235A (zh) 2002-07-19 2005-10-12 米克罗利斯公司 流体流量测量和比例流体流量控制装置
JP3527735B1 (ja) 2002-11-20 2004-05-17 東洋炭素株式会社 フッ素ガス発生装置
CN1914710A (zh) 2003-12-30 2007-02-14 艾奎昂有限责任公司 在基片处理过程中选择性蚀刻氮化硅的系统和方法
US7107128B2 (en) 2004-02-13 2006-09-12 Entegris, Inc. System for controlling fluid flow
WO2006010109A2 (en) * 2004-07-08 2006-01-26 Akrion Technologies, Inc. Method and apparatus for creating ozonated process solutions having high ozone concentration
US20060080041A1 (en) 2004-07-08 2006-04-13 Anderson Gary R Chemical mixing apparatus, system and method
JP3777451B2 (ja) * 2004-08-18 2006-05-24 株式会社プレテック オゾン水生成方法及びオゾン水製造装置
KR101241922B1 (ko) 2005-06-22 2013-03-11 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 통합 가스 배합 장치 및 방법
TWI402423B (zh) 2006-02-28 2013-07-21 Entegris Inc 用於一幫浦操作之系統及方法
US7743783B2 (en) 2006-04-04 2010-06-29 Air Liquide Electronics U.S. Lp Method and apparatus for recycling process fluids
JP4830731B2 (ja) 2006-09-06 2011-12-07 栗田工業株式会社 ガス溶解水供給装置
US8448925B2 (en) 2006-10-17 2013-05-28 Mks Instruments, Inc. Devices, systems, and methods for carbonation of deionized water
JP5466817B2 (ja) 2007-09-03 2014-04-09 シャープ株式会社 オゾン水製造装置
JP5020784B2 (ja) 2007-11-08 2012-09-05 野村マイクロ・サイエンス株式会社 オゾン水の製造装置及び製造方法
JP5412135B2 (ja) 2009-02-23 2014-02-12 野村マイクロ・サイエンス株式会社 オゾン水供給装置
US8747762B2 (en) 2009-12-03 2014-06-10 Applied Materials, Inc. Methods and apparatus for treating exhaust gas in a processing system
JP5779321B2 (ja) 2010-06-18 2015-09-16 シャープ株式会社 高濃度オゾン水の製造方法及び高濃度オゾン水の製造装置
US9056262B2 (en) 2012-11-08 2015-06-16 Mks Instruments, Inc. Pressure-less ozonated Di-water (DIO3) recirculation reclaim system
WO2018089658A1 (en) 2016-11-11 2018-05-17 Mks Instruments, Inc. Systems and method for generating a conductive liquid comprising deionized water with ammonia gas dissolved therein

Similar Documents

Publication Publication Date Title
JP4920751B2 (ja) 脱イオン水を炭酸化する装置、システム及び方法
JP5548106B2 (ja) 半導体プロセスツール用の圧力下流体を混合する方法及び装置
KR101664217B1 (ko) 탈이온수의 탄산화를 위한 장치, 시스템 및 방법
CN103426795A (zh) 基板处理用的药液生成方法、生成单元及基板处理系统
TW201821153A (zh) 產生包含具有氨氣溶於其中的去離子水之導電液體之系統及方法
US20060163753A1 (en) Controlled atmosphere gas infusion
Boributh et al. Analytical solutions for membrane wetting calculations based on log-normal and normal distribution functions for CO2 absorption by a hollow fiber membrane contactor
WO1994007795A1 (en) Water generating method
US11518696B2 (en) Ozonated water delivery system and method of use
JPWO2020046994A5 (zh)
JP4069334B2 (ja) オゾン溶解装置
Kasim et al. The Study of Carbon Dioxide Removal in Membrane Module by Single and Mixture of Alkanolamine Aqueous Solutions
Mshewa Carbon dioxide desorption/absorption with aqueous mixtures of methyldiethanolamine and diethanolamine at 40 to 120 degrees C
Wu et al. ICOPE-15-C147 Simultaneous removal of SO_2 and NO_x using ammonia-based aqueous solution in a submerged circulative impinging stream reactor
JPS5827059A (ja) 大気中の二酸化イオウガスの濃度測定装置
JP2007091570A (ja) 空気より作り出した濃度の高い窒素ガスに残存する酸素ガスを減少させる方法および装置