JPWO2020046994A5 - - Google Patents
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- Publication number
- JPWO2020046994A5 JPWO2020046994A5 JP2021510328A JP2021510328A JPWO2020046994A5 JP WO2020046994 A5 JPWO2020046994 A5 JP WO2020046994A5 JP 2021510328 A JP2021510328 A JP 2021510328A JP 2021510328 A JP2021510328 A JP 2021510328A JP WO2020046994 A5 JPWO2020046994 A5 JP WO2020046994A5
- Authority
- JP
- Japan
- Prior art keywords
- contact device
- conduit
- ultrapure water
- ozone
- delivery system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 91
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 80
- 239000007789 gas Substances 0.000 claims description 78
- 239000012498 ultrapure water Substances 0.000 claims description 74
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 68
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical group O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 55
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 27
- 239000001569 carbon dioxide Substances 0.000 claims description 27
- 239000012528 membrane Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 239000000243 solution Substances 0.000 claims 17
- 239000007864 aqueous solution Substances 0.000 claims 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims 2
- AZLYZRGJCVQKKK-UHFFFAOYSA-N dioxohydrazine Chemical compound O=NN=O AZLYZRGJCVQKKK-UHFFFAOYSA-N 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims 2
- 238000005086 pumping Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 4
- -1 hydroxide ions Chemical class 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862724368P | 2018-08-29 | 2018-08-29 | |
US62/724,368 | 2018-08-29 | ||
PCT/US2019/048411 WO2020046994A1 (en) | 2018-08-29 | 2019-08-27 | Ozonated water delivery system and method of use |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2022502235A JP2022502235A (ja) | 2022-01-11 |
JPWO2020046994A5 true JPWO2020046994A5 (zh) | 2022-06-02 |
JP7422135B2 JP7422135B2 (ja) | 2024-01-25 |
Family
ID=69639551
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021510328A Active JP7422135B2 (ja) | 2018-08-29 | 2019-08-27 | オゾン水デリバリシステム及び使用方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US11518696B2 (zh) |
EP (1) | EP3814284A4 (zh) |
JP (1) | JP7422135B2 (zh) |
KR (2) | KR20210038980A (zh) |
CN (1) | CN112601720A (zh) |
IL (1) | IL281134A (zh) |
SG (1) | SG11202100619PA (zh) |
TW (1) | TW202023962A (zh) |
WO (1) | WO2020046994A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024020126A1 (en) * | 2022-07-20 | 2024-01-25 | Evoqua Water Technologies Llc | Mobile ultrapure water system |
Family Cites Families (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5261966A (en) | 1991-01-28 | 1993-11-16 | Kabushiki Kaisha Toshiba | Method of cleaning semiconductor wafers using mixer containing a bundle of gas permeable hollow yarns |
EP0598424A3 (en) | 1992-11-16 | 1996-05-15 | Novellus Systems Inc | Apparatus for removing dissolved gases from a liquid. |
JP3174856B2 (ja) | 1993-05-07 | 2001-06-11 | 日本エア・リキード株式会社 | 混合ガス供給装置 |
US6001223A (en) | 1995-07-07 | 1999-12-14 | Air Liquide America Corporation | On-site ammonia purification for semiconductor manufacture |
US6293849B1 (en) | 1997-10-31 | 2001-09-25 | Ebara Corporation | Polishing solution supply system |
US7980753B2 (en) | 1998-04-16 | 2011-07-19 | Air Liquide Electronics U.S. Lp | Systems and methods for managing fluids in a processing environment using a liquid ring pump and reclamation system |
US20070119816A1 (en) | 1998-04-16 | 2007-05-31 | Urquhart Karl J | Systems and methods for reclaiming process fluids in a processing environment |
JP2000037695A (ja) * | 1998-07-24 | 2000-02-08 | Kurita Water Ind Ltd | オゾン水供給装置 |
US6247838B1 (en) | 1998-11-24 | 2001-06-19 | The Boc Group, Inc. | Method for producing a liquid mixture having a predetermined concentration of a specified component |
JP2000262874A (ja) * | 1999-03-15 | 2000-09-26 | Mitsubishi Electric Corp | オゾン水の製造方法および製造装置 |
JP3748731B2 (ja) | 1999-03-26 | 2006-02-22 | 株式会社荏原製作所 | 砥液供給装置 |
EP1237824B1 (en) | 1999-10-19 | 2007-06-20 | Phifer Smith Corporation | A method and apparatus for treating a substrate with an ozone-solvent solution |
JP2001129376A (ja) | 1999-11-08 | 2001-05-15 | Ishikawajima Harima Heavy Ind Co Ltd | オゾン水製造方法及び製造装置 |
DE60123254T2 (de) | 2000-07-31 | 2007-09-06 | Kinetics Chempure Systems, Inc., Tempe | Verfahren und vorrichtung zum mischen von prozessmaterialien |
US6805791B2 (en) | 2000-09-01 | 2004-10-19 | Applied Science And Technology, Inc. | Ozonated water flow and concentration control apparatus |
US6884359B2 (en) * | 2000-09-27 | 2005-04-26 | Dainippon Ink And Chemicals, Inc. | Apparatus and method for controlling resistivity of ultra pure water |
US6766818B2 (en) | 2001-04-06 | 2004-07-27 | Akrion, Llc | Chemical concentration control device |
CN1602538A (zh) | 2001-11-13 | 2005-03-30 | Fsi国际公司 | 用于浸渍处理的高级处理控制 |
US6732017B2 (en) | 2002-02-15 | 2004-05-04 | Lam Research Corp. | System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system |
JP2003334433A (ja) | 2002-05-16 | 2003-11-25 | Kurita Water Ind Ltd | 連続溶解装置、連続溶解方法及び気体溶解水供給装置 |
KR100519843B1 (ko) | 2002-05-29 | 2005-10-06 | 도요탄소 가부시키가이샤 | 불소가스 발생장치 |
WO2004009224A1 (en) | 2002-07-19 | 2004-01-29 | Kinetic Systems, Inc. | Method and apparatus for blending process materials |
US7543596B2 (en) | 2002-07-19 | 2009-06-09 | Entegris, Inc. | Liquid flow controller and precision dispense apparatus and system |
CN1682235A (zh) | 2002-07-19 | 2005-10-12 | 米克罗利斯公司 | 流体流量测量和比例流体流量控制装置 |
JP3527735B1 (ja) | 2002-11-20 | 2004-05-17 | 東洋炭素株式会社 | フッ素ガス発生装置 |
CN1914710A (zh) | 2003-12-30 | 2007-02-14 | 艾奎昂有限责任公司 | 在基片处理过程中选择性蚀刻氮化硅的系统和方法 |
US7107128B2 (en) | 2004-02-13 | 2006-09-12 | Entegris, Inc. | System for controlling fluid flow |
WO2006010109A2 (en) * | 2004-07-08 | 2006-01-26 | Akrion Technologies, Inc. | Method and apparatus for creating ozonated process solutions having high ozone concentration |
US20060080041A1 (en) | 2004-07-08 | 2006-04-13 | Anderson Gary R | Chemical mixing apparatus, system and method |
JP3777451B2 (ja) * | 2004-08-18 | 2006-05-24 | 株式会社プレテック | オゾン水生成方法及びオゾン水製造装置 |
KR101241922B1 (ko) | 2005-06-22 | 2013-03-11 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | 통합 가스 배합 장치 및 방법 |
TWI402423B (zh) | 2006-02-28 | 2013-07-21 | Entegris Inc | 用於一幫浦操作之系統及方法 |
US7743783B2 (en) | 2006-04-04 | 2010-06-29 | Air Liquide Electronics U.S. Lp | Method and apparatus for recycling process fluids |
JP4830731B2 (ja) | 2006-09-06 | 2011-12-07 | 栗田工業株式会社 | ガス溶解水供給装置 |
US8448925B2 (en) | 2006-10-17 | 2013-05-28 | Mks Instruments, Inc. | Devices, systems, and methods for carbonation of deionized water |
JP5466817B2 (ja) | 2007-09-03 | 2014-04-09 | シャープ株式会社 | オゾン水製造装置 |
JP5020784B2 (ja) | 2007-11-08 | 2012-09-05 | 野村マイクロ・サイエンス株式会社 | オゾン水の製造装置及び製造方法 |
JP5412135B2 (ja) | 2009-02-23 | 2014-02-12 | 野村マイクロ・サイエンス株式会社 | オゾン水供給装置 |
US8747762B2 (en) | 2009-12-03 | 2014-06-10 | Applied Materials, Inc. | Methods and apparatus for treating exhaust gas in a processing system |
JP5779321B2 (ja) | 2010-06-18 | 2015-09-16 | シャープ株式会社 | 高濃度オゾン水の製造方法及び高濃度オゾン水の製造装置 |
US9056262B2 (en) | 2012-11-08 | 2015-06-16 | Mks Instruments, Inc. | Pressure-less ozonated Di-water (DIO3) recirculation reclaim system |
WO2018089658A1 (en) | 2016-11-11 | 2018-05-17 | Mks Instruments, Inc. | Systems and method for generating a conductive liquid comprising deionized water with ammonia gas dissolved therein |
-
2019
- 2019-08-27 CN CN201980054540.9A patent/CN112601720A/zh active Pending
- 2019-08-27 KR KR1020217008472A patent/KR20210038980A/ko active Application Filing
- 2019-08-27 JP JP2021510328A patent/JP7422135B2/ja active Active
- 2019-08-27 WO PCT/US2019/048411 patent/WO2020046994A1/en active Application Filing
- 2019-08-27 EP EP19856235.7A patent/EP3814284A4/en active Pending
- 2019-08-27 KR KR1020237040837A patent/KR102692467B1/ko active IP Right Grant
- 2019-08-27 SG SG11202100619PA patent/SG11202100619PA/en unknown
- 2019-08-27 US US16/553,033 patent/US11518696B2/en active Active
- 2019-08-29 TW TW108130968A patent/TW202023962A/zh unknown
-
2021
- 2021-02-26 IL IL281134A patent/IL281134A/en unknown
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