JPWO2019171198A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2019171198A5
JPWO2019171198A5 JP2020504471A JP2020504471A JPWO2019171198A5 JP WO2019171198 A5 JPWO2019171198 A5 JP WO2019171198A5 JP 2020504471 A JP2020504471 A JP 2020504471A JP 2020504471 A JP2020504471 A JP 2020504471A JP WO2019171198 A5 JPWO2019171198 A5 JP WO2019171198A5
Authority
JP
Japan
Prior art keywords
oxide
region
transistor
transistors
dummy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020504471A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2019171198A1 (ja
JP7209692B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/IB2019/051406 external-priority patent/WO2019171198A1/ja
Publication of JPWO2019171198A1 publication Critical patent/JPWO2019171198A1/ja
Publication of JPWO2019171198A5 publication Critical patent/JPWO2019171198A5/ja
Application granted granted Critical
Publication of JP7209692B2 publication Critical patent/JP7209692B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020504471A 2018-03-06 2019-02-21 半導体装置 Active JP7209692B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2018039854 2018-03-06
JP2018039854 2018-03-06
JP2018075977 2018-04-11
JP2018075977 2018-04-11
JP2018149313 2018-08-08
JP2018149313 2018-08-08
PCT/IB2019/051406 WO2019171198A1 (ja) 2018-03-06 2019-02-21 半導体装置

Publications (3)

Publication Number Publication Date
JPWO2019171198A1 JPWO2019171198A1 (ja) 2021-02-12
JPWO2019171198A5 true JPWO2019171198A5 (https=) 2022-01-31
JP7209692B2 JP7209692B2 (ja) 2023-01-20

Family

ID=67847019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020504471A Active JP7209692B2 (ja) 2018-03-06 2019-02-21 半導体装置

Country Status (5)

Country Link
US (1) US12300752B2 (https=)
JP (1) JP7209692B2 (https=)
KR (1) KR20200127004A (https=)
CN (1) CN111788697B (https=)
WO (1) WO2019171198A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7679305B2 (ja) 2019-11-08 2025-05-19 株式会社半導体エネルギー研究所 半導体装置
CN111834413A (zh) * 2020-04-17 2020-10-27 昆山国显光电有限公司 显示面板以及显示装置
CN112289796B (zh) * 2020-10-28 2021-09-28 长江存储科技有限责任公司 三维存储器的制造方法及三维存储器
KR102895845B1 (ko) * 2020-12-02 2025-12-04 삼성디스플레이 주식회사 표시 장치의 검사 방법
JP7393471B2 (ja) * 2021-06-03 2023-12-06 シャープ株式会社 光電変換装置およびｘ線撮像装置
CN114339313B (zh) * 2021-12-28 2024-09-13 维沃移动通信有限公司 插帧方法、装置及电子设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7566633B2 (en) 2005-02-25 2009-07-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
JP5046529B2 (ja) * 2005-02-25 2012-10-10 株式会社半導体エネルギー研究所 半導体装置
JP2008004796A (ja) * 2006-06-23 2008-01-10 Matsushita Electric Ind Co Ltd 半導体装置および回路素子レイアウト方法
KR101291384B1 (ko) * 2008-11-21 2013-07-30 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
JP2011205049A (ja) * 2010-03-26 2011-10-13 Toshiba Corp 半導体集積回路
KR20120004774A (ko) 2010-07-07 2012-01-13 주식회사 하이닉스반도체 더미 패턴을 포함하는 반도체 장치 및 레이아웃
US8643008B2 (en) 2011-07-22 2014-02-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP6016455B2 (ja) 2012-05-23 2016-10-26 株式会社半導体エネルギー研究所 半導体装置
JP6607681B2 (ja) 2014-03-07 2019-11-20 株式会社半導体エネルギー研究所 半導体装置
US9336348B2 (en) 2014-09-12 2016-05-10 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming layout design
KR20160093749A (ko) * 2015-01-29 2016-08-09 삼성디스플레이 주식회사 표시 기판, 이의 제조 방법 및 이를 포함하는 표시 장치
CN113314545B (zh) 2015-04-20 2024-10-29 株式会社半导体能源研究所 半导体装置及电子设备

Similar Documents

Publication Publication Date Title
JPWO2019171198A5 (https=)
JP2006041354A5 (https=)
JP2022002321A5 (https=)
JP2017005282A5 (https=)
JP2012114422A5 (ja) 半導体装置
JP2020194966A5 (https=)
JP2017098020A5 (https=)
JP2021005732A5 (ja) 半導体装置
JP2015181159A5 (https=)
JP2006005288A5 (https=)
CN104835851B (zh) 一种薄膜晶体管、阵列基板及显示装置
JP2011119675A5 (https=)
JP2009033145A5 (https=)
JP2012186468A5 (ja) 半導体装置
JP2011192982A5 (ja) 半導体メモリ装置及び半導体メモリ装置の駆動方法
JP2006512774A5 (https=)
JPWO2021070366A5 (https=)
JP2002110825A5 (https=)
JP2012015498A5 (https=)
JP2014212309A5 (https=)
JP2018200377A5 (https=)
JPWO2020008296A5 (ja) 半導体装置
JP2007501524A5 (https=)
JP2018022713A5 (ja) 半導体装置
JP2005123243A5 (https=)