JPWO2018139628A1 - コネクタ用端子材及び端子並びに電線端末部構造 - Google Patents
コネクタ用端子材及び端子並びに電線端末部構造 Download PDFInfo
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- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
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- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
- C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
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- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
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- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/10—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation effected solely by twisting, wrapping, bending, crimping, or other permanent deformation
- H01R4/18—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation effected solely by twisting, wrapping, bending, crimping, or other permanent deformation by crimping
- H01R4/183—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation effected solely by twisting, wrapping, bending, crimping, or other permanent deformation by crimping for cylindrical elongated bodies, e.g. cables having circular cross-section
- H01R4/184—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation effected solely by twisting, wrapping, bending, crimping, or other permanent deformation by crimping for cylindrical elongated bodies, e.g. cables having circular cross-section comprising a U-shaped wire-receiving portion
- H01R4/185—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation effected solely by twisting, wrapping, bending, crimping, or other permanent deformation by crimping for cylindrical elongated bodies, e.g. cables having circular cross-section comprising a U-shaped wire-receiving portion combined with a U-shaped insulation-receiving portion
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- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/58—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation characterised by the form or material of the contacting members
- H01R4/62—Connections between conductors of different materials; Connections between or with aluminium or steel-core aluminium conductors
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
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- C—CHEMISTRY; METALLURGY
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
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Abstract
Description
・めっき浴組成
スルファミン酸ニッケル:300g/L
塩化ニッケル:5g/L
ホウ酸:30g/L
・浴温:45℃
・電流密度:5A/dm2
・硫酸亜鉛七水和物:250g/L
・硫酸ナトリウム:150g/L
・pH=1.2
・浴温:45℃
・電流密度:5A/dm2
・めっき浴組成
硫酸亜鉛七水和物:75g/L
硫酸ニッケル六水和物:180g/L
硫酸ナトリウム:140g/L
・pH=2.0
・浴温:45℃
・電流密度:5A/dm2
・めっき浴組成
硫酸錫(II):40g/L
硫酸亜鉛七水和物:5g/L
クエン酸三ナトリウム:65g/L
非イオン性界面活性剤:1g/L
・pH=5.0
・浴温:25℃
・電流密度:3A/dm2
・めっき浴組成
硫酸マンガン一水和物:110g/L
硫酸亜鉛七水和物:50g/L
クエン酸三ナトリウム:250g/L
・pH=5.3
・浴温:30℃
・電流密度:5A/dm2
・めっき浴組成
メタンスルホン酸錫:200g/L
メタンスルホン酸:100g/L
光沢剤
・浴温:35℃
・電流密度:5A/dm2
腐食電流については、直径2mmの露出部を残し樹脂で被覆した純アルミニウム線と直径6mmの露出部を残し樹脂で被覆した試料とを距離1mmにて露出部を対向させて設置し、23℃、5質量%の食塩水中でアルミニウム線と試料との間に流れる腐食電流を測定した。腐食電流測定には北斗電工株式会社製無抵抗電流計HA1510を用い、試料を150℃で1時間加熱した後と加熱前との腐食電流を比較した。1000分間の平均電流値と、さらに長時間試験を実施した1000〜3000分間の平均電流値を比較した。
曲げ加工性については、試験片を圧延方向が長手となるように切出し、JISH3110に規定されるW曲げ試験治具を用い、圧延方向に対して直角方向となるように9.8×103Nの荷重で曲げ加工を施した。その後、実体顕微鏡にて観察を行った。曲げ加工性評価は、試験後の曲げ加工部に明確なクラックが認められないレベルを「優」と評価し、若干のクラックが認められるが、発生したクラックにより銅合金母材の露出までは認められないレベルを「良」と評価し、発生したクラックにより銅合金母材が露出しているレベルを「不良」と評価した。
ウイスカ発生状況の評価については、1cm2四方に切り出した平板状のサンプルを、55℃95%RHの条件で1000時間放置し、電子顕微鏡により、×100倍の倍率にて3視野を観察し、その中で最も長いウイスカの長さを測定した。ウイスカの発生が認められなかったものを「優」とし、ウイスカが発生しているもののその長さが50μm未満のものを「良」、ウイスカの長さが50μm以上100μm未満のものを「可」、ウイスカ長さが100μm以上のものを「不良」とした。
接触抵抗の測定方法はJCBA−T323に準拠し、4端子接触抵抗試験機(山崎精機研究所製:CRS−113−AU)を用い、摺動式(1mm)で荷重0.98N時の接触抵抗を測定した。平板試料のめっき表面に対して測定を実施した。
2 基材
3 下地層
4 亜鉛層
5 錫層
10 端子
11 接続部
12 電線
12a 心線
12b 被覆部
13 心線かしめ部
14 被覆かしめ部
Claims (9)
- 銅又は銅合金からなる基材の上に、亜鉛合金からなる亜鉛層と、錫合金からなる錫層とがこの順に積層されてなり、これら亜鉛層及び錫層は、その全体の中に含まれる錫の付着量が0.5mg/cm2以上7.0mg/cm2以下であり、亜鉛の付着量が0.07mg/cm2以上2.0mg/cm2以下であり、表面近傍における亜鉛の含有率は0.2質量%以上、10質量%以下であることを特徴とするコネクタ用端子材。
- 腐食電位が銀塩化銀電極に対して−500mV以下−900mV以上であることを特徴とする請求項1に記載のコネクタ用端子材。
- 前記錫層又は前記亜鉛層の少なくともいずれかには、添加元素としてニッケル、鉄、マンガン、モリブデン、コバルト、カドミウム、鉛のいずれかを1種以上含み、その付着量は0.01mg/cm2以上0.3mg/cm2以下であることを特徴とする請求項1に記載のコネクタ用端子材。
- 前記亜鉛の付着量は前記添加元素の付着量の1倍以上10倍以下であることを特徴とする請求項1に記載のコネクタ用端子材。
- 前記基材と前記亜鉛層との間に、ニッケル又はニッケル合金からなる下地層が形成されており、該下地層は、厚みが0.1μm以上5μm以下であり、ニッケル含有率が80質量%以上であることを特徴とする請求項1に記載のコネクタ用端子材。
- 帯板状に形成されるとともに、その長さ方向に沿うキャリア部に、プレス加工により端子に成形されるべき複数の端子用部材が前記キャリア部の長さ方向に間隔をおいて連結されていることを特徴とする請求項1に記載のコネクタ用端子材。
- 請求項1に記載のコネクタ用端子材からなることを特徴とする端子。
- 請求項7記載の端子がアルミニウム又はアルミニウム合金からなる電線の端末に圧着されていることを特徴とする電線端末部構造。
- 銅又は銅合金からなる基材の上に、亜鉛及び錫を含む錫亜鉛層が積層されてなり、前記錫亜鉛層は、その全体の中に含まれる錫の付着量が0.5mg/cm2以上7.0mg/cm2以下であり、亜鉛の付着量が0.07mg/cm2以上2.0mg/cm2以下であり、表面近傍における亜鉛の含有率は0.2質量%以上、10質量%以下であることを特徴とするコネクタ用端子材。
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JP6686965B2 (ja) | 2017-05-16 | 2020-04-22 | 三菱マテリアル株式会社 | 錫めっき付銅端子材及び端子並びに電線端末部構造 |
CN110997984B (zh) * | 2017-07-28 | 2022-04-26 | 三菱综合材料株式会社 | 镀锡铜端子材、端子及电线终端部结构 |
JP7404053B2 (ja) | 2019-12-11 | 2023-12-25 | Dowaメタルテック株式会社 | Snめっき材およびその製造方法 |
JP7380448B2 (ja) * | 2020-06-26 | 2023-11-15 | 三菱マテリアル株式会社 | アルミニウム心線用防食端子材とその製造方法、及び防食端子並びに電線端末部構造 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010168666A (ja) * | 2010-04-23 | 2010-08-05 | Nippon Mining & Metals Co Ltd | ウィスカーが抑制されたCu−Zn合金耐熱Snめっき条 |
JP2016169439A (ja) * | 2015-03-13 | 2016-09-23 | 三菱マテリアル株式会社 | 錫めっき付銅端子材及びその製造方法並びに電線端末部構造 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01259195A (ja) * | 1988-04-07 | 1989-10-16 | Kobe Steel Ltd | 銅または銅合金の錫被覆材料 |
KR100392528B1 (ko) * | 1998-09-11 | 2003-07-23 | 닛코 킨조쿠 가부시키가이샤 | 금속재료, 금속재료의 제조방법 및 금속재료를 이용한 단자 및 커넥터 |
JP2002115093A (ja) * | 2000-10-10 | 2002-04-19 | Nisshin Steel Co Ltd | はんだ濡れ性,耐食性に優れた複層めっき鋼板 |
JP5588597B2 (ja) * | 2007-03-23 | 2014-09-10 | 富士フイルム株式会社 | 導電性材料の製造方法及び製造装置 |
JP4402132B2 (ja) | 2007-05-18 | 2010-01-20 | 日鉱金属株式会社 | リフローSnめっき材及びそれを用いた電子部品 |
JP4940081B2 (ja) * | 2007-09-28 | 2012-05-30 | Jx日鉱日石金属株式会社 | リフローSnめっき材及びそれを用いた電子部品 |
JP5385683B2 (ja) * | 2009-05-22 | 2014-01-08 | 矢崎総業株式会社 | コネクタ端子 |
EP2620275B1 (en) * | 2012-01-26 | 2019-10-02 | Mitsubishi Materials Corporation | Tin-plated copper-alloy material for terminal and method for producing the same |
JP2013218866A (ja) | 2012-04-09 | 2013-10-24 | Auto Network Gijutsu Kenkyusho:Kk | 端子付き電線及びその製造方法 |
EP2722930A1 (de) * | 2012-10-16 | 2014-04-23 | Delphi Technologies, Inc. | Beschichtetes Kontaktelement |
US9748683B2 (en) * | 2013-03-29 | 2017-08-29 | Kobe Steel, Ltd. | Electroconductive material superior in resistance to fretting corrosion for connection component |
EP2799595A1 (de) * | 2013-05-03 | 2014-11-05 | Delphi Technologies, Inc. | Elektrisches Kontaktelement |
JP2015133306A (ja) | 2014-01-16 | 2015-07-23 | 株式会社オートネットワーク技術研究所 | コネクタ用電気接点材料及びその製造方法 |
JP2016014165A (ja) * | 2014-07-01 | 2016-01-28 | 株式会社Shカッパープロダクツ | 銅合金材、銅合金材の製造方法、リードフレームおよびコネクタ |
EP3012919B8 (de) * | 2014-10-20 | 2019-01-09 | Aptiv Technologies Limited | Elektrisches Kontaktelement und Verfahren dafür |
JP2017014031A (ja) | 2015-06-29 | 2017-01-19 | 三星ダイヤモンド工業株式会社 | スクライブ方法並びにスクライブ装置 |
CN105350046A (zh) * | 2015-10-23 | 2016-02-24 | 衢州顺络电路板有限公司 | 用于取代金手指的线路板及其制造方法 |
US11088472B2 (en) | 2015-11-27 | 2021-08-10 | Mitsubishi Materials Corporation | Tin-plated copper terminal material, terminal, and wire terminal part structure |
JP6226037B2 (ja) * | 2015-12-15 | 2017-11-08 | 三菱マテリアル株式会社 | 錫めっき付き銅端子材の製造方法 |
JP6743756B2 (ja) * | 2016-05-10 | 2020-08-19 | 三菱マテリアル株式会社 | 錫めっき付銅端子材及び端子並びに電線端末部構造 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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JP2016169439A (ja) * | 2015-03-13 | 2016-09-23 | 三菱マテリアル株式会社 | 錫めっき付銅端子材及びその製造方法並びに電線端末部構造 |
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US20190386415A1 (en) | 2019-12-19 |
TW201834313A (zh) | 2018-09-16 |
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MX2019009049A (es) | 2019-11-12 |
US11211729B2 (en) | 2021-12-28 |
EP3575448A4 (en) | 2020-12-09 |
CN110214203A (zh) | 2019-09-06 |
JP2019073803A (ja) | 2019-05-16 |
JP6501039B2 (ja) | 2019-04-17 |
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