JPWO2017056378A1 - 太陽電池セルの製造方法 - Google Patents
太陽電池セルの製造方法 Download PDFInfo
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- JPWO2017056378A1 JPWO2017056378A1 JP2017542691A JP2017542691A JPWO2017056378A1 JP WO2017056378 A1 JPWO2017056378 A1 JP WO2017056378A1 JP 2017542691 A JP2017542691 A JP 2017542691A JP 2017542691 A JP2017542691 A JP 2017542691A JP WO2017056378 A1 JPWO2017056378 A1 JP WO2017056378A1
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims description 33
- 239000010409 thin film Substances 0.000 claims abstract description 53
- 239000010408 film Substances 0.000 claims abstract description 32
- 239000004065 semiconductor Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 238000007747 plating Methods 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 238000001039 wet etching Methods 0.000 claims description 2
- 210000004027 cell Anatomy 0.000 description 41
- 239000010949 copper Substances 0.000 description 29
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 27
- 229910052802 copper Inorganic materials 0.000 description 27
- 229910052581 Si3N4 Inorganic materials 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 20
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 20
- 238000000926 separation method Methods 0.000 description 8
- 238000000059 patterning Methods 0.000 description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000003486 chemical etching Methods 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 244000126211 Hericium coralloides Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells back-junction, i.e. rearside emitter, solar cells, e.g. interdigitated base-emitter regions back-junction cells
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- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0745—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells
- H01L31/0747—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising a AIVBIV heterojunction, e.g. Si/Ge, SiGe/Si or Si/SiC solar cells comprising a heterojunction of crystalline and amorphous materials, e.g. heterojunction with intrinsic thin layer
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Abstract
Description
(太陽電池セルの構成)
(太陽電池セル70の製造方法)
(光電変換部の製造方法)
(太陽電池セル70の電極形成方法)
(S1)
(S2)
(S3)
(S4)
(S5)
(発明の効果)
(太陽電池セルのバスバー部への適用)
Claims (6)
- 半導体基板上に導電性薄膜層を形成する第1の工程と、
前記導電性薄膜層上に絶縁膜を形成する第2の工程と、
前記絶縁膜を一部除去することにより導電性薄膜層露出部を形成する第3の工程と、
前記導電性薄膜層露出部にめっき被膜を形成する第4の工程と、
前記めっき被膜と重ならない領域にある、前記絶縁膜及び前記導電性薄膜層を除去する第5の工程と、
を含む太陽電池セルの製造方法であって、
前記第4の工程で形成する前記めっき被膜は、前記絶縁膜を覆うように形成する、太陽電池セルの製造方法。 - 前記第5の工程にレーザを用いる、請求項1に記載の太陽電池セルの製造方法。
- 前記第3の工程にレーザを用いる、請求項1又は2に記載の太陽電池セルの製造方法。
- 前記第5の工程にウエットエッチングを用いる、請求項1乃至3のいずれか一項に記載の太陽電池セルの製造方法。
- 前記導電性薄膜層は、金属薄膜層及び透明導電性酸化膜層のうち少なくとも一方を含む、請求項1乃至4のいずれか一項に記載の太陽電池セルの製造方法。
- 前記半導体基板は、水素を含む非晶質シリコンからなる光電変換層を含む、請求項1乃至5のいずれか一項に記載の太陽電池セルの製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015193233 | 2015-09-30 | ||
JP2015193233 | 2015-09-30 | ||
PCT/JP2016/003838 WO2017056378A1 (ja) | 2015-09-30 | 2016-08-23 | 太陽電池セルの製造方法 |
Related Child Applications (1)
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JP2019070340A Division JP6771166B2 (ja) | 2015-09-30 | 2019-04-02 | 太陽電池セルの製造方法 |
Publications (2)
Publication Number | Publication Date |
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JPWO2017056378A1 true JPWO2017056378A1 (ja) | 2018-06-21 |
JP6516112B2 JP6516112B2 (ja) | 2019-05-22 |
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JP2017542691A Expired - Fee Related JP6516112B2 (ja) | 2015-09-30 | 2016-08-23 | 太陽電池セルの製造方法 |
JP2019070340A Expired - Fee Related JP6771166B2 (ja) | 2015-09-30 | 2019-04-02 | 太陽電池セルの製造方法 |
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JP2019070340A Expired - Fee Related JP6771166B2 (ja) | 2015-09-30 | 2019-04-02 | 太陽電池セルの製造方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US10312396B2 (ja) |
JP (2) | JP6516112B2 (ja) |
CN (1) | CN108140686B (ja) |
WO (1) | WO2017056378A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110121787B (zh) * | 2016-10-25 | 2022-10-14 | 信越化学工业株式会社 | 高光电变换效率太阳能电池及高光电变换效率太阳能电池的制造方法 |
JP2019133985A (ja) * | 2018-01-29 | 2019-08-08 | パナソニック株式会社 | 太陽電池セル及び太陽電池セルの製造方法 |
WO2021171953A1 (ja) * | 2020-02-26 | 2021-09-02 | 株式会社カネカ | 太陽電池および太陽電池製造方法 |
JP7449152B2 (ja) | 2020-04-23 | 2024-03-13 | 株式会社カネカ | 太陽電池の製造方法および太陽電池 |
CN115394864A (zh) * | 2022-03-11 | 2022-11-25 | 浙江爱旭太阳能科技有限公司 | 太阳能电池的导电接触结构、组件及发电系统 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04342172A (ja) * | 1991-05-17 | 1992-11-27 | Mitsubishi Electric Corp | 半導体装置 |
JP2010157655A (ja) * | 2009-01-05 | 2010-07-15 | Sharp Corp | 太陽電池素子の製造方法および化合物半導体ウェハ |
US20120186649A1 (en) * | 2009-09-17 | 2012-07-26 | Tetrasun, Inc. | Selective transformation in functional films, and solar cell applications thereof |
JP2013026269A (ja) * | 2011-07-15 | 2013-02-04 | Sanyo Electric Co Ltd | 太陽電池及び太陽電池の製造方法 |
JP2015082603A (ja) * | 2013-10-23 | 2015-04-27 | 株式会社カネカ | 太陽電池の製造方法及びめっき用治具 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2010104098A1 (ja) | 2009-03-10 | 2010-09-16 | 三洋電機株式会社 | 太陽電池の製造方法及び太陽電池 |
JP5485060B2 (ja) * | 2010-07-28 | 2014-05-07 | 三洋電機株式会社 | 太陽電池の製造方法 |
WO2013081104A1 (ja) * | 2011-12-02 | 2013-06-06 | 三洋電機株式会社 | 太陽電池、太陽電池モジュール及び太陽電池の製造方法 |
KR20140066285A (ko) * | 2012-11-22 | 2014-06-02 | 삼성에스디아이 주식회사 | 태양 전지 및 이의 제조 방법 |
WO2015198978A1 (ja) * | 2014-06-27 | 2015-12-30 | シャープ株式会社 | 光電変換装置およびその製造方法 |
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2016
- 2016-08-23 CN CN201680058003.8A patent/CN108140686B/zh not_active Expired - Fee Related
- 2016-08-23 JP JP2017542691A patent/JP6516112B2/ja not_active Expired - Fee Related
- 2016-08-23 WO PCT/JP2016/003838 patent/WO2017056378A1/ja active Application Filing
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2018
- 2018-03-28 US US15/938,864 patent/US10312396B2/en not_active Expired - Fee Related
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2019
- 2019-04-02 JP JP2019070340A patent/JP6771166B2/ja not_active Expired - Fee Related
- 2019-04-16 US US16/385,724 patent/US10475946B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04342172A (ja) * | 1991-05-17 | 1992-11-27 | Mitsubishi Electric Corp | 半導体装置 |
JP2010157655A (ja) * | 2009-01-05 | 2010-07-15 | Sharp Corp | 太陽電池素子の製造方法および化合物半導体ウェハ |
US20120186649A1 (en) * | 2009-09-17 | 2012-07-26 | Tetrasun, Inc. | Selective transformation in functional films, and solar cell applications thereof |
JP2013026269A (ja) * | 2011-07-15 | 2013-02-04 | Sanyo Electric Co Ltd | 太陽電池及び太陽電池の製造方法 |
JP2015082603A (ja) * | 2013-10-23 | 2015-04-27 | 株式会社カネカ | 太陽電池の製造方法及びめっき用治具 |
Also Published As
Publication number | Publication date |
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CN108140686B (zh) | 2020-12-15 |
CN108140686A (zh) | 2018-06-08 |
JP6771166B2 (ja) | 2020-10-21 |
WO2017056378A1 (ja) | 2017-04-06 |
US20180219119A1 (en) | 2018-08-02 |
US20190245108A1 (en) | 2019-08-08 |
US10475946B2 (en) | 2019-11-12 |
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