JPWO2016021385A1 - アルコキシド化合物、薄膜形成用原料、薄膜の形成方法及びアルコール化合物 - Google Patents
アルコキシド化合物、薄膜形成用原料、薄膜の形成方法及びアルコール化合物 Download PDFInfo
- Publication number
- JPWO2016021385A1 JPWO2016021385A1 JP2016540139A JP2016540139A JPWO2016021385A1 JP WO2016021385 A1 JPWO2016021385 A1 JP WO2016021385A1 JP 2016540139 A JP2016540139 A JP 2016540139A JP 2016540139 A JP2016540139 A JP 2016540139A JP WO2016021385 A1 JPWO2016021385 A1 JP WO2016021385A1
- Authority
- JP
- Japan
- Prior art keywords
- group
- thin film
- carbon atoms
- mass
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Alkoxide compound Chemical class 0.000 title claims abstract description 307
- 239000010409 thin film Substances 0.000 title claims description 138
- 239000002994 raw material Substances 0.000 title claims description 94
- 238000000034 method Methods 0.000 title claims description 86
- 125000004432 carbon atom Chemical group C* 0.000 claims description 67
- 229910052751 metal Inorganic materials 0.000 claims description 47
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 45
- 239000002184 metal Substances 0.000 claims description 45
- 239000010408 film Substances 0.000 claims description 39
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 38
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 31
- 239000010949 copper Substances 0.000 claims description 27
- 229910017052 cobalt Inorganic materials 0.000 claims description 26
- 239000010941 cobalt Chemical group 0.000 claims description 26
- 230000008016 vaporization Effects 0.000 claims description 24
- 229910052802 copper Inorganic materials 0.000 claims description 23
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 20
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical group [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 17
- 125000004429 atom Chemical group 0.000 claims description 17
- 229910052759 nickel Inorganic materials 0.000 claims description 17
- 229910052710 silicon Inorganic materials 0.000 claims description 16
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 125000003277 amino group Chemical group 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000002560 nitrile group Chemical group 0.000 claims description 4
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical group [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052748 manganese Chemical group 0.000 claims description 2
- 239000011572 manganese Chemical group 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 45
- 239000002243 precursor Substances 0.000 description 44
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 42
- 150000002430 hydrocarbons Chemical group 0.000 description 42
- 238000006243 chemical reaction Methods 0.000 description 39
- 150000001875 compounds Chemical class 0.000 description 38
- 238000005229 chemical vapour deposition Methods 0.000 description 36
- 239000007789 gas Substances 0.000 description 36
- 229910052757 nitrogen Inorganic materials 0.000 description 34
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 30
- 229910052719 titanium Inorganic materials 0.000 description 30
- 239000010936 titanium Substances 0.000 description 30
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 27
- 238000004519 manufacturing process Methods 0.000 description 25
- 239000000203 mixture Substances 0.000 description 25
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 24
- 229910052739 hydrogen Inorganic materials 0.000 description 23
- 239000000243 solution Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 22
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 22
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 21
- 238000002844 melting Methods 0.000 description 19
- 230000008018 melting Effects 0.000 description 19
- 239000000126 substance Substances 0.000 description 19
- 125000000217 alkyl group Chemical group 0.000 description 18
- 229910052760 oxygen Inorganic materials 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 238000004458 analytical method Methods 0.000 description 17
- 238000000231 atomic layer deposition Methods 0.000 description 16
- 238000001816 cooling Methods 0.000 description 16
- 238000009834 vaporization Methods 0.000 description 16
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 15
- 229910052799 carbon Inorganic materials 0.000 description 15
- 238000000151 deposition Methods 0.000 description 15
- 239000007788 liquid Substances 0.000 description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 14
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 14
- 230000008021 deposition Effects 0.000 description 13
- 238000000921 elemental analysis Methods 0.000 description 13
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 13
- 230000008569 process Effects 0.000 description 13
- 238000005979 thermal decomposition reaction Methods 0.000 description 13
- 229910052786 argon Inorganic materials 0.000 description 12
- 229910044991 metal oxide Inorganic materials 0.000 description 12
- 150000004706 metal oxides Chemical class 0.000 description 12
- 239000002245 particle Substances 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 238000005755 formation reaction Methods 0.000 description 11
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 10
- 239000003960 organic solvent Substances 0.000 description 10
- 229910052708 sodium Inorganic materials 0.000 description 10
- 239000011734 sodium Substances 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 239000003921 oil Substances 0.000 description 9
- 238000010926 purge Methods 0.000 description 9
- 230000009467 reduction Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 239000012434 nucleophilic reagent Substances 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 7
- 230000001590 oxidative effect Effects 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 7
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000007865 diluting Methods 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 6
- 229910052735 hafnium Inorganic materials 0.000 description 6
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 6
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 229910052726 zirconium Inorganic materials 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 208000005156 Dehydration Diseases 0.000 description 5
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 125000000753 cycloalkyl group Chemical group 0.000 description 5
- 230000018044 dehydration Effects 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 5
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 5
- 239000003446 ligand Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 150000002736 metal compounds Chemical class 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- 125000006018 1-methyl-ethenyl group Chemical group 0.000 description 4
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- BWPTXZLFKCVPIJ-UHFFFAOYSA-N 3-(dimethoxymethyl)pentan-3-ol Chemical compound CCC(O)(CC)C(OC)OC BWPTXZLFKCVPIJ-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- 229910021580 Cobalt(II) chloride Inorganic materials 0.000 description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000000560 X-ray reflectometry Methods 0.000 description 4
- 150000003973 alkyl amines Chemical class 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 4
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229910017053 inorganic salt Inorganic materials 0.000 description 4
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- JDQLUYWHCUWSJE-UHFFFAOYSA-N methanolate;titanium(3+) Chemical compound [Ti+3].[O-]C.[O-]C.[O-]C JDQLUYWHCUWSJE-UHFFFAOYSA-N 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 4
- 125000002097 pentamethylcyclopentadienyl group Chemical group 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 4
- 238000012916 structural analysis Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- SHXHPUAKLCCLDV-UHFFFAOYSA-N 1,1,1-trifluoropentane-2,4-dione Chemical compound CC(=O)CC(=O)C(F)(F)F SHXHPUAKLCCLDV-UHFFFAOYSA-N 0.000 description 3
- QNLXXWOBNIYLGO-UHFFFAOYSA-N 1-methoxy-2,2,6,6-tetramethylheptane-3,5-dione Chemical compound COCC(C)(C)C(=O)CC(=O)C(C)(C)C QNLXXWOBNIYLGO-UHFFFAOYSA-N 0.000 description 3
- PXJCDOSDACXFTB-UHFFFAOYSA-N 2-methoxy-2,6,6-trimethylheptane-3,5-dione Chemical compound COC(C)(C)C(=O)CC(=O)C(C)(C)C PXJCDOSDACXFTB-UHFFFAOYSA-N 0.000 description 3
- CXCLHFMCTZKZHP-UHFFFAOYSA-N 3-(ethyliminomethyl)pentan-3-ol Chemical compound C(C)N=CC(CC)(CC)O CXCLHFMCTZKZHP-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 3
- 229910052691 Erbium Inorganic materials 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 229910052693 Europium Inorganic materials 0.000 description 3
- 229910052688 Gadolinium Inorganic materials 0.000 description 3
- 238000003747 Grignard reaction Methods 0.000 description 3
- 229910052689 Holmium Inorganic materials 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 229910052779 Neodymium Inorganic materials 0.000 description 3
- 229910052777 Praseodymium Inorganic materials 0.000 description 3
- 229910052773 Promethium Inorganic materials 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 229910052772 Samarium Inorganic materials 0.000 description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052775 Thulium Inorganic materials 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- 229910052769 Ytterbium Inorganic materials 0.000 description 3
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 125000004663 dialkyl amino group Chemical group 0.000 description 3
- 125000006264 diethylaminomethyl group Chemical group [H]C([H])([H])C([H])([H])N(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 125000006222 dimethylaminomethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])* 0.000 description 3
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 3
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 3
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 3
- DGCTVLNZTFDPDJ-UHFFFAOYSA-N heptane-3,5-dione Chemical compound CCC(=O)CC(=O)CC DGCTVLNZTFDPDJ-UHFFFAOYSA-N 0.000 description 3
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 3
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 3
- 125000006316 iso-butyl amino group Chemical group [H]N(*)C([H])([H])C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 3
- 229910052746 lanthanum Inorganic materials 0.000 description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 3
- 229910052752 metalloid Inorganic materials 0.000 description 3
- 150000002738 metalloids Chemical class 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 3
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 3
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 3
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 description 3
- 239000012048 reactive intermediate Substances 0.000 description 3
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 3
- 235000015067 sauces Nutrition 0.000 description 3
- 229910052706 scandium Inorganic materials 0.000 description 3
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 235000011152 sodium sulphate Nutrition 0.000 description 3
- 238000003852 thin film production method Methods 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 3
- BVPKYBMUQDZTJH-UHFFFAOYSA-N 1,1,1-trifluoro-5,5-dimethylhexane-2,4-dione Chemical compound CC(C)(C)C(=O)CC(=O)C(F)(F)F BVPKYBMUQDZTJH-UHFFFAOYSA-N 0.000 description 2
- KNRURCBWBVCBDB-UHFFFAOYSA-N 1,1-dimethoxy-2,3-dimethylbutan-2-ol Chemical compound COC(OC)C(C)(O)C(C)C KNRURCBWBVCBDB-UHFFFAOYSA-N 0.000 description 2
- SPEUIVXLLWOEMJ-UHFFFAOYSA-N 1,1-dimethoxyethane Chemical compound COC(C)OC SPEUIVXLLWOEMJ-UHFFFAOYSA-N 0.000 description 2
- QEGNUYASOUJEHD-UHFFFAOYSA-N 1,1-dimethylcyclohexane Chemical compound CC1(C)CCCCC1 QEGNUYASOUJEHD-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- RBEVHNPYSLRSKL-UHFFFAOYSA-N 1-ethylimino-2,3-dimethylbutan-2-ol Chemical compound C(C)N=CC(C(C)C)(O)C RBEVHNPYSLRSKL-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- CEGGECULKVTYMM-UHFFFAOYSA-N 2,6-dimethylheptane-3,5-dione Chemical compound CC(C)C(=O)CC(=O)C(C)C CEGGECULKVTYMM-UHFFFAOYSA-N 0.000 description 2
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 description 2
- UODWDGLNLDJQAN-UHFFFAOYSA-N 3-(methyliminomethyl)pentan-3-ol Chemical compound CN=CC(CC)(CC)O UODWDGLNLDJQAN-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- 125000004861 4-isopropyl phenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- KHZGUWAFFHXZLC-UHFFFAOYSA-N 5-methylhexane-2,4-dione Chemical compound CC(C)C(=O)CC(C)=O KHZGUWAFFHXZLC-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 229910052692 Dysprosium Inorganic materials 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 229910052771 Terbium Inorganic materials 0.000 description 2
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- ZXZMQWZQMZHFOR-UHFFFAOYSA-L azane;dichloronickel Chemical compound N.N.N.N.N.N.Cl[Ni]Cl ZXZMQWZQMZHFOR-UHFFFAOYSA-L 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- QFYBRRIPNPVECS-UHFFFAOYSA-N copper;methanol Chemical compound [Cu].OC.OC QFYBRRIPNPVECS-UHFFFAOYSA-N 0.000 description 2
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 2
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- ILPNRWUGFSPGAA-UHFFFAOYSA-N heptane-2,4-dione Chemical compound CCCC(=O)CC(C)=O ILPNRWUGFSPGAA-UHFFFAOYSA-N 0.000 description 2
- QAMFBRUWYYMMGJ-UHFFFAOYSA-N hexafluoroacetylacetone Chemical compound FC(F)(F)C(=O)CC(=O)C(F)(F)F QAMFBRUWYYMMGJ-UHFFFAOYSA-N 0.000 description 2
- TXGJTWACJNYNOJ-UHFFFAOYSA-N hexane-2,4-diol Chemical compound CCC(O)CC(C)O TXGJTWACJNYNOJ-UHFFFAOYSA-N 0.000 description 2
- 125000006038 hexenyl group Chemical group 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 2
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 229910052705 radium Inorganic materials 0.000 description 2
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 150000002910 rare earth metals Chemical group 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000002269 spontaneous effect Effects 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 2
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- SYTBZMRGLBWNTM-SNVBAGLBSA-N (R)-flurbiprofen Chemical compound FC1=CC([C@H](C(O)=O)C)=CC=C1C1=CC=CC=C1 SYTBZMRGLBWNTM-SNVBAGLBSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- BGYBONWLWSMGNV-UHFFFAOYSA-N 1,4,7,10,13,16,19,22-octaoxacyclotetracosane Chemical compound C1COCCOCCOCCOCCOCCOCCOCCO1 BGYBONWLWSMGNV-UHFFFAOYSA-N 0.000 description 1
- QBPPRVHXOZRESW-UHFFFAOYSA-N 1,4,7,10-tetraazacyclododecane Chemical compound C1CNCCNCCNCCN1 QBPPRVHXOZRESW-UHFFFAOYSA-N 0.000 description 1
- MDAXKAUIABOHTD-UHFFFAOYSA-N 1,4,8,11-tetraazacyclotetradecane Chemical compound C1CNCCNCCCNCCNC1 MDAXKAUIABOHTD-UHFFFAOYSA-N 0.000 description 1
- UFOXNPJWBCYEJE-UHFFFAOYSA-N 1-(2-methoxyethoxy)heptane-3,5-dione Chemical compound COCCOCCC(CC(CC)=O)=O UFOXNPJWBCYEJE-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- KKUCFCKVNGCYQM-UHFFFAOYSA-N 1-fluoro-5,5-dimethylhexane-2,4-dione Chemical compound CC(C)(C)C(=O)CC(=O)CF KKUCFCKVNGCYQM-UHFFFAOYSA-N 0.000 description 1
- NSIPDYNOORNMRL-UHFFFAOYSA-N 1-methoxy-2-methylpropan-2-olate titanium(4+) Chemical compound COCC(C)(C)O[Ti](OC(C)(C)COC)(OC(C)(C)COC)OC(C)(C)COC NSIPDYNOORNMRL-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- XEZNGIUYQVAUSS-UHFFFAOYSA-N 18-crown-6 Chemical compound C1COCCOCCOCCOCCOCCO1 XEZNGIUYQVAUSS-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- YRAJNWYBUCUFBD-UHFFFAOYSA-N 2,2,6,6-tetramethylheptane-3,5-dione Chemical compound CC(C)(C)C(=O)CC(=O)C(C)(C)C YRAJNWYBUCUFBD-UHFFFAOYSA-N 0.000 description 1
- LHBTVHHNZDSQES-UHFFFAOYSA-N 2,3-dimethyl-1-propan-2-yliminobutan-2-ol Chemical compound C(C)(C)N=CC(C(C)C)(O)C LHBTVHHNZDSQES-UHFFFAOYSA-N 0.000 description 1
- CVBVIDRXQAQQKH-UHFFFAOYSA-N 2,4,6-trimethyl-N-propan-2-yl-5-propan-2-yliminohept-3-en-3-amine Chemical compound C(C)(C)NC(C(C)C)=C(C(C(C)C)=NC(C)C)C CVBVIDRXQAQQKH-UHFFFAOYSA-N 0.000 description 1
- OXOBSWQLEHNKSO-UHFFFAOYSA-N 2,6-dimethyl-N-propan-2-yl-5-propan-2-yliminohept-3-en-3-amine Chemical compound C(C)(C)NC(C(C)C)=CC(C(C)C)=NC(C)C OXOBSWQLEHNKSO-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- NAMYKGVDVNBCFQ-UHFFFAOYSA-N 2-bromopropane Chemical compound CC(C)Br NAMYKGVDVNBCFQ-UHFFFAOYSA-N 0.000 description 1
- BTANRVKWQNVYAZ-UHFFFAOYSA-N 2-butanol Substances CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 1
- DSKYSDCYIODJPC-UHFFFAOYSA-N 2-butyl-2-ethylpropane-1,3-diol Chemical compound CCCCC(CC)(CO)CO DSKYSDCYIODJPC-UHFFFAOYSA-N 0.000 description 1
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- VVALZQWOQKHDIM-UHFFFAOYSA-N 2-methylheptane-3,5-dione Chemical compound CCC(=O)CC(=O)C(C)C VVALZQWOQKHDIM-UHFFFAOYSA-N 0.000 description 1
- QUVMSYUGOKEMPX-UHFFFAOYSA-N 2-methylpropan-1-olate;titanium(4+) Chemical compound [Ti+4].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-] QUVMSYUGOKEMPX-UHFFFAOYSA-N 0.000 description 1
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 1
- VRERIMWKEOGULR-UHFFFAOYSA-N 3-(propan-2-yliminomethyl)pentan-3-ol Chemical compound C(C)(C)N=CC(CC)(CC)O VRERIMWKEOGULR-UHFFFAOYSA-N 0.000 description 1
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- XPQCITLHEHJFAV-UHFFFAOYSA-N C(C(C)C)C1(C=CC=C1)[Ti](OC)(OC)OC Chemical compound C(C(C)C)C1(C=CC=C1)[Ti](OC)(OC)OC XPQCITLHEHJFAV-UHFFFAOYSA-N 0.000 description 1
- IPTGOPJXEXTNCE-UHFFFAOYSA-N C(C)C1(C=CC=C1)[Ti](N(C)C)(N(C)C)N(C)C Chemical compound C(C)C1(C=CC=C1)[Ti](N(C)C)(N(C)C)N(C)C IPTGOPJXEXTNCE-UHFFFAOYSA-N 0.000 description 1
- ANWKVNXHQDRSQF-UHFFFAOYSA-N C(C)C1(C=CC=C1)[Ti](N(CC)C)(N(CC)C)N(C)CC Chemical compound C(C)C1(C=CC=C1)[Ti](N(CC)C)(N(CC)C)N(C)CC ANWKVNXHQDRSQF-UHFFFAOYSA-N 0.000 description 1
- DTOHEKDIBNUSIP-UHFFFAOYSA-N C(C)C1(C=CC=C1)[Ti](OC)(OC)OC Chemical compound C(C)C1(C=CC=C1)[Ti](OC)(OC)OC DTOHEKDIBNUSIP-UHFFFAOYSA-N 0.000 description 1
- HDGRKNWTTXGATK-UHFFFAOYSA-N C(CC)C1(C=CC=C1)[Ti](OC)(OC)OC Chemical compound C(CC)C1(C=CC=C1)[Ti](OC)(OC)OC HDGRKNWTTXGATK-UHFFFAOYSA-N 0.000 description 1
- XJSOMZOHHHAEHM-UHFFFAOYSA-N C(CCC)C1(C=CC=C1)[Ti](OC)(OC)OC Chemical compound C(CCC)C1(C=CC=C1)[Ti](OC)(OC)OC XJSOMZOHHHAEHM-UHFFFAOYSA-N 0.000 description 1
- ZYMRFAAFCPNQEF-UHFFFAOYSA-N C1(C=CC=C1)[Ti](N(CC)C)(N(CC)C)N(C)CC Chemical compound C1(C=CC=C1)[Ti](N(CC)C)(N(CC)C)N(C)CC ZYMRFAAFCPNQEF-UHFFFAOYSA-N 0.000 description 1
- RWXRWFPGHUQFHW-UHFFFAOYSA-N C1(C=CC=C1)[Ti](N(CC)CC)(N(CC)CC)N(CC)CC Chemical compound C1(C=CC=C1)[Ti](N(CC)CC)(N(CC)CC)N(CC)CC RWXRWFPGHUQFHW-UHFFFAOYSA-N 0.000 description 1
- HXAAXAPDZBYKPT-UHFFFAOYSA-N CC1(C=CC=C1)[Ti](N(CC)CC)(N(CC)CC)N(CC)CC Chemical compound CC1(C=CC=C1)[Ti](N(CC)CC)(N(CC)CC)N(CC)CC HXAAXAPDZBYKPT-UHFFFAOYSA-N 0.000 description 1
- YQZCFUHFPMUPFE-UHFFFAOYSA-N CC1(C=CC=C1)[Ti](OC)(OC)OC Chemical compound CC1(C=CC=C1)[Ti](OC)(OC)OC YQZCFUHFPMUPFE-UHFFFAOYSA-N 0.000 description 1
- CXOZQHPXKPDQGT-UHFFFAOYSA-N CC1C=CCC1 Chemical compound CC1C=CCC1 CXOZQHPXKPDQGT-UHFFFAOYSA-N 0.000 description 1
- NCXAGZDEWYLGHS-UHFFFAOYSA-N CCC(=C(C=NC(C)C)N)C Chemical compound CCC(=C(C=NC(C)C)N)C NCXAGZDEWYLGHS-UHFFFAOYSA-N 0.000 description 1
- YMMQIRAORSQFSY-UHFFFAOYSA-N CCC(C)(C)[Ti](C(C)(C)CC)(C(C)(C)CC)C(C)(C)CC Chemical compound CCC(C)(C)[Ti](C(C)(C)CC)(C(C)(C)CC)C(C)(C)CC YMMQIRAORSQFSY-UHFFFAOYSA-N 0.000 description 1
- TXPAAJFKASNIGR-UHFFFAOYSA-N CN(C)[Ti](C1C=CC=C1)(N(C)C)N(C)C Chemical compound CN(C)[Ti](C1C=CC=C1)(N(C)C)N(C)C TXPAAJFKASNIGR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- GAWLEIWDCURQAS-UHFFFAOYSA-N N-tert-butyl-4-tert-butylimino-3-methylpent-2-en-2-amine Chemical compound C(C)(C)(C)NC(C)=C(C(C)=NC(C)(C)C)C GAWLEIWDCURQAS-UHFFFAOYSA-N 0.000 description 1
- DQKVYVLRFDXQAN-UHFFFAOYSA-N N-tert-butyl-5-tert-butylimino-2,2,6,6-tetramethylhept-3-en-3-amine Chemical compound C(C)(C)(C)NC(C(C)(C)C)=CC(C(C)(C)C)=NC(C)(C)C DQKVYVLRFDXQAN-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- MOSURRVHVKOQHA-UHFFFAOYSA-N [Tb].[Dy] Chemical compound [Tb].[Dy] MOSURRVHVKOQHA-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- BTGRAWJCKBQKAO-UHFFFAOYSA-N adiponitrile Chemical compound N#CCCCCC#N BTGRAWJCKBQKAO-UHFFFAOYSA-N 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 125000005263 alkylenediamine group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- YLBGXUJFSMDKDD-UHFFFAOYSA-N benzene-1,4-dicarbonitrile;pyridine Chemical compound C1=CC=NC=C1.N#CC1=CC=C(C#N)C=C1 YLBGXUJFSMDKDD-UHFFFAOYSA-N 0.000 description 1
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 1
- LEQVBGOJANWCKL-UHFFFAOYSA-N bis(trimethylsilyl)azanide;cobalt(2+) Chemical compound [Co+2].C[Si](C)(C)[N-][Si](C)(C)C.C[Si](C)(C)[N-][Si](C)(C)C LEQVBGOJANWCKL-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- MGWYSXZGBRHJNE-UHFFFAOYSA-N cyclohexane-1,4-dicarbonitrile Chemical compound N#CC1CCC(C#N)CC1 MGWYSXZGBRHJNE-UHFFFAOYSA-N 0.000 description 1
- VBWIZSYFQSOUFQ-UHFFFAOYSA-N cyclohexanecarbonitrile Chemical compound N#CC1CCCCC1 VBWIZSYFQSOUFQ-UHFFFAOYSA-N 0.000 description 1
- 125000004985 dialkyl amino alkyl group Chemical group 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- 125000004984 dialkylaminoalkoxy group Chemical group 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- UNTITLLXXOKDTB-UHFFFAOYSA-N dibenzo-24-crown-8 Chemical compound O1CCOCCOCCOC2=CC=CC=C2OCCOCCOCCOC2=CC=CC=C21 UNTITLLXXOKDTB-UHFFFAOYSA-N 0.000 description 1
- BBGKDYHZQOSNMU-UHFFFAOYSA-N dicyclohexano-18-crown-6 Chemical compound O1CCOCCOC2CCCCC2OCCOCCOC2CCCCC21 BBGKDYHZQOSNMU-UHFFFAOYSA-N 0.000 description 1
- QMLGNDFKJAFKGZ-UHFFFAOYSA-N dicyclohexano-24-crown-8 Chemical compound O1CCOCCOCCOC2CCCCC2OCCOCCOCCOC2CCCCC21 QMLGNDFKJAFKGZ-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- NNUZNYLOAGGAIU-UHFFFAOYSA-N diethylazanide titanium(3+) Chemical compound CCN(CC)[Ti](N(CC)CC)N(CC)CC NNUZNYLOAGGAIU-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- CRGGFGFWZPSXPP-UHFFFAOYSA-N dimethylazanide;titanium(3+) Chemical compound [Ti+3].C[N-]C.C[N-]C.C[N-]C CRGGFGFWZPSXPP-UHFFFAOYSA-N 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- LIWAQLJGPBVORC-UHFFFAOYSA-N ethylmethylamine Chemical compound CCNC LIWAQLJGPBVORC-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- ZTOMUSMDRMJOTH-UHFFFAOYSA-N glutaronitrile Chemical compound N#CCCCC#N ZTOMUSMDRMJOTH-UHFFFAOYSA-N 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- FRIJBUGBVQZNTB-UHFFFAOYSA-M magnesium;ethane;bromide Chemical compound [Mg+2].[Br-].[CH2-]C FRIJBUGBVQZNTB-UHFFFAOYSA-M 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910001960 metal nitrate Inorganic materials 0.000 description 1
- 150000002737 metalloid compounds Chemical class 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- NZTCVGHPDWAALP-UHFFFAOYSA-N methyl 2,2-dimethoxyacetate Chemical compound COC(OC)C(=O)OC NZTCVGHPDWAALP-UHFFFAOYSA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 1
- DWFKOMDBEKIATP-UHFFFAOYSA-N n'-[2-[2-(dimethylamino)ethyl-methylamino]ethyl]-n,n,n'-trimethylethane-1,2-diamine Chemical compound CN(C)CCN(C)CCN(C)CCN(C)C DWFKOMDBEKIATP-UHFFFAOYSA-N 0.000 description 1
- LSHROXHEILXKHM-UHFFFAOYSA-N n'-[2-[2-[2-(2-aminoethylamino)ethylamino]ethylamino]ethyl]ethane-1,2-diamine Chemical compound NCCNCCNCCNCCNCCN LSHROXHEILXKHM-UHFFFAOYSA-N 0.000 description 1
- GVWISOJSERXQBM-UHFFFAOYSA-N n-methylpropan-1-amine Chemical compound CCCNC GVWISOJSERXQBM-UHFFFAOYSA-N 0.000 description 1
- XHFGWHUWQXTGAT-UHFFFAOYSA-N n-methylpropan-2-amine Chemical compound CNC(C)C XHFGWHUWQXTGAT-UHFFFAOYSA-N 0.000 description 1
- POQOWGAHVMCAJX-UHFFFAOYSA-N n-propan-2-yl-4-propan-2-yliminopent-2-en-2-amine Chemical compound CC(C)NC(C)=CC(C)=NC(C)C POQOWGAHVMCAJX-UHFFFAOYSA-N 0.000 description 1
- JGSNEDLVBCUMDQ-UHFFFAOYSA-N n-tert-butyl-4-tert-butyliminopent-2-en-2-amine Chemical compound CC(C)(C)NC(C)=CC(C)=NC(C)(C)C JGSNEDLVBCUMDQ-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- BTNXBLUGMAMSSH-UHFFFAOYSA-N octanedinitrile Chemical compound N#CCCCCCCC#N BTNXBLUGMAMSSH-UHFFFAOYSA-N 0.000 description 1
- 239000013110 organic ligand Substances 0.000 description 1
- OOFGXDQWDNJDIS-UHFFFAOYSA-N oxathiolane Chemical compound C1COSC1 OOFGXDQWDNJDIS-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- UKODFQOELJFMII-UHFFFAOYSA-N pentamethyldiethylenetriamine Chemical compound CN(C)CCN(C)CCN(C)C UKODFQOELJFMII-UHFFFAOYSA-N 0.000 description 1
- GTCCGKPBSJZVRZ-UHFFFAOYSA-N pentane-2,4-diol Chemical compound CC(O)CC(C)O GTCCGKPBSJZVRZ-UHFFFAOYSA-N 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- XRVCFZPJAHWYTB-UHFFFAOYSA-N prenderol Chemical compound CCC(CC)(CO)CO XRVCFZPJAHWYTB-UHFFFAOYSA-N 0.000 description 1
- 229950006800 prenderol Drugs 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- OGHBATFHNDZKSO-UHFFFAOYSA-N propan-2-olate Chemical compound CC(C)[O-] OGHBATFHNDZKSO-UHFFFAOYSA-N 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- ASRAWSBMDXVNLX-UHFFFAOYSA-N pyrazolynate Chemical compound C=1C=C(Cl)C=C(Cl)C=1C(=O)C=1C(C)=NN(C)C=1OS(=O)(=O)C1=CC=C(C)C=C1 ASRAWSBMDXVNLX-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- BHRZNVHARXXAHW-UHFFFAOYSA-N sec-butylamine Chemical compound CCC(C)N BHRZNVHARXXAHW-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/06—Cobalt compounds
- C07F15/065—Cobalt compounds without a metal-carbon linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
- C07F1/08—Copper compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/02—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups
- C07C251/04—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups having carbon atoms of imino groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C251/06—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups having carbon atoms of imino groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of a saturated carbon skeleton
- C07C251/08—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups having carbon atoms of imino groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of a saturated carbon skeleton being acyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/72—Hydrazones
- C07C251/74—Hydrazones having doubly-bound carbon atoms of hydrazone groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C251/76—Hydrazones having doubly-bound carbon atoms of hydrazone groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of a saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/04—Nickel compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/04—Nickel compounds
- C07F15/045—Nickel compounds without a metal-carbon linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/06—Cobalt compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Description
例えば、化学気相成長用原料等を気化させて金属銅薄膜を形成する場合においては、200℃以上の加熱を行うことによって得られる金属銅薄膜の電気抵抗値が高くなってしまう問題があった。該問題の原因は特定できていないが、200℃以上の加熱を行うことによって、得られる薄膜中に存在する銅粒子の粒径が大きくなってしまうことや該粒子が凝集してしまうことが原因ではないかと推察される。そこで、金属銅薄膜形成用の化学気相成長法用原料としては、200℃未満で熱分解が発生する金属銅薄膜形成用の化学気相成長法用原料が求められていた。従来のアルコキシド化合物では、熱安定性の点で十分に満足し得るものはなかった。
即ち、本発明は、下記一般式(I)で表されるアルコキシド化合物、該アルコキシド化合物を含有してなる薄膜形成用原料、及び該薄膜形成用原料を用いた薄膜の形成方法に係るものである。
Lは、水素原子、ハロゲン原子、水酸基、アミノ基、アジ基、ホスフィド基、ニトリル基、カルボニル基、炭素原子数1〜12の炭化水素基又は下記一般式(L−1)〜(L−13)で表される基を表す。Mは、金属原子又はケイ素原子を表し、nは、1以上の整数を表し、mは、0以上の整数を表し、n+mは、Mで表される金属原子又はケイ素原子の価数を表す。)
ただし、R4がメチル基であり、R5がメチル基又はエチル基である場合、R6は水素又は下記一般式(Y−1)〜(Y−8)で表される基を表す。
Lは、水素原子、ハロゲン、水酸基、アミノ基、アジ基、ホスフィド基、ニトリル基、カルボニル基、炭素原子数1〜12の炭化水素基又は下記一般式(L−1)〜(L−13)で表される基を表す。Mは、金属原子又はケイ素原子を表し、nは、1以上の整数を表し、mは、0以上の整数を表し、n+mは、Mで表される金属原子又はケイ素原子の価数を表す。)
また、堆積速度は、原料の供給条件(気化温度、気化圧力)、反応温度、反応圧力によりコントロールすることができる。堆積速度は、大きいと得られる薄膜の特性が悪化する場合があり、小さいと生産性に問題を生じる場合があるので、0.01〜100nm/分が好ましく、1〜50nm/分がより好ましい。また、ALD法の場合は、所望の膜厚が得られるようにサイクルの回数でコントロールされる。
ただし、R4がメチル基であり、R5がメチル基又はエチル基である場合、R6は、水素原子又は下記一般式(Y−1)〜(Y−8)で表される基を表す。)
例えば、下記反応式(1)のようにマグネシウムを触媒として、アルキル化合物とアルコキシカルボン酸アルキル化合物とをグリニャール反応させ、さらにアルキルアミンを反応させたものを適切な溶媒で抽出し、脱水処理することで得る方法や、下記反応式(2)のように、マグネシウムを触媒として、アルキル化合物とアルコキシケトンアルキル化合物とをグリニャール反応させ、さらにアルキルアミンを反応させたものを適切な溶媒で抽出し、脱水処理することで得る方法や、下記反応式(3)のように、マグネシウムを触媒として、アルキル化合物とジアルキルジケトン化合物とをグリニャール反応させ、さらにアルキルアミンを反応させたものを適切な溶媒で抽出し、脱水処理することで得る方法が挙げられる。
反応フラスコに、3−ジメトキシメチル−3−ペンタノール22.43g、純水40g、36%塩酸3.6gを氷冷下で加えて、5時間撹拌を行った。その後、40%メチルアミン水溶液23.72gを氷冷下滴下し、17時間反応させた。この時の反応液のpHは10〜11であった。トルエン32.9gを加え、有機層を抽出・分液し、硫酸マグネシウムを加えて脱水・ろ過を行った。減圧下オイルバス90℃にて溶媒を留去し、アルコール化合物No.134を得た。収量は7.69g、収率は43%であった。
(1)GC−MS m/z: 129(M+)
(3)元素分析 C:65.4質量%、H:12.1質量%、O:11.2質量%、N:11.3質量%(理論値;C:65.1質量%、H:11.7質量%、O:12.4質量%、N:10.8質量%)
反応フラスコに、エチルマグネシウムブロミドのジエチルエーテル溶液(濃度:21.85質量%、277g)を加え、氷冷バスにて撹拌し0℃付近まで冷却した。この溶液にメチルジメトキシアセテート(25g)を1時間で滴下し、グリニャール反応を行った。その後室温に戻して12時間反応を行った。反応液を氷冷して、飽和塩化アンモニウム水溶液200gを滴下した後、36%塩酸溶液10mLを滴下してpHを中性付近に調整した。その後、溶液を分液ロートに移してヘキサン50gで有機物を抽出・分液し、適量の硫酸マグネシウムで脱水した。このヘキサン懸濁液のろ過後、オイルバス65℃付近で脱溶媒を行った。オイルバス100℃付近減圧下で蒸留を行い、無色透明の3−ジメトキシメチル−3−ペンタノール22.4g(GC純度96.3%)を得た。3−ジメトキシメチル−3−ペンタノール、7gに純水10gと36%塩酸1gを氷冷下で加えて、終夜撹拌を行った。その後、33%エチルアミン水溶液9.5gを氷冷下滴下し、10時間反応させた。この時の反応液のpHは10〜11であった。撹拌を止めると少量の有機層と水層に分離し、有機層はNMRの結果よりアルコール化合物No.140であることが分かった。目的物の収量は2.7g、収率は33%であった。
(1)GC−MS m/z: 143(M+)
(2)1NMR(溶媒:重ベンゼン)(ケミカルシフト:多重度:H数)
(7.020:s:1)(4.379:s:1)(3.171〜3.193:q:2)(1.559〜1.649:m:2)(1.310〜1.400:m:2)(0.979〜1.016:t:3)(0.837〜0.874:t:6)
(3)元素分析 C:67.5質量%、H:12.1質量%、O:12.0質量%、N:9.6質量%(理論値;C:67.1質量%、H:12.0質量%、O:11.2質量%、N:9.8質量%)
反応フラスコに、3−ジメトキシメチル−3−ペンタノール19.67g、純水35g、36%塩酸8.9gを氷冷下で加えて、4時間撹拌を行った。その後、イソプロピルアミン16.67gを氷冷下滴下し、18時間反応させた。この時の反応液のpHは10〜11であった。トルエン28.8gを加え、有機層を抽出・分液し、硫酸マグネシウムを加えて脱水・ろ過を行った。減圧下オイルバス90℃にて溶媒を留去し、アルコール化合物No.146を得た。収量は13.48g、収率は69%であった。
(1)GC−MS m/z: 157(M+)
(3)元素分析 C:69.0質量%、H:11.9質量%、O:11.0質量%、N:8.9質量%(理論値;C:68.7質量%、H:12.2質量%、O:10.2質量%、N:8.9質量%)
反応フラスコに、マグネシウム2.17gとテトラヒドロフラン118gを仕込み、その中にバス温度50℃で2−ブロモプロパン11.3gをゆっくりと滴下した。室温まで冷却し2時間撹拌した後、ピルビンアルデヒドジメチルアセタール10.3gをゆっくりと滴下し、室温下で20時間撹拌した。8%塩酸水溶液39gと塩化アンモニウム25.3gを加えてクエンチした。そこにヘキサン26.7gを加えて目的物(中間体)を有機層に抽出し、硫酸ナトリウムで乾燥させ、ろ過を行った。バス温度85℃、微減圧下でヘキサンを留去し、得られた残渣をバス温度85℃、微減圧下、塔頂温度50℃で蒸留し中間体である1,1−ジメトキシ−2,3−ジメチル−2−ブタノールを得た。1,1−ジメトキシ−2,3−ジメチル−2−ブタノール6.0gにH2O18.5gを加え、その中に室温下36%塩酸水溶液2.1gをゆっくりと滴下した。2時間撹拌後、33%エチルアミン水溶液15.3gを水冷下ゆっくりと滴下した。室温下20時間撹拌後、トルエン31.2gを加え目的物を有機層に抽出した。硫酸ナトリウムで脱水、ろ過を行い、バス温度85℃、微減圧でトルエンを留去した。得られた残渣をバス温度85℃、微減圧下で蒸留しアルコール化合物No.166を得た。収量は3.6g(GC純度92%)、収率は27%であった。
(1)GC−MS m/z: 143(M+)
(3)元素分析 C:67.4質量%、H:12.3質量%、O:10.5質量%、N:9.4質量%(理論値;C:67.0質量%、H:12.0質量%、O:11.2質量%、N:9.8質量%)
反応フラスコに、1,1−ジメトキシ−2,3−ジメチル−2−ブタノール10.0g(純度90%品)とH2O10.0gを仕込み、その中に氷冷下36%塩酸水溶液1.5gをゆっくりと滴下し、室温下で20時間撹拌した。氷冷下イソプロピルアミン11.5gをゆっくりと滴下し、室温まで昇温後20時間撹拌した。トルエン70gを加え目的物を有機層に抽出した。硫酸ナトリウムで脱水、ろ過を行い、1−イソプロピルイミノ−2,3−ジメチル2−ブタノールのトルエン溶液(3.19質量%)を得た。減圧下オイルバス90℃にて溶媒を留去し、アルコール化合物No.167を得た。
(1)GC−MS m/z: 157(M+)
(3)元素分析 C:69.0質量%、H:11.9質量%、O:10.6質量%、N:8.8質量%(理論値;C:68.7質量%、H:12.2質量%、O:10.2質量%、N:8.9質量%)
200ml4つ口フラスコに塩化コバルト(II)を4.04g、テトラヒドロフラン16gを仕込み、室温下で撹拌した。その中に、アルコール化合物No.134(3−メチルイミノメチル−3−ペンタノール)より調製して得たナトリウムアルコキシド8.77gをテトラヒドロフラン17gで希釈した溶液を氷冷下で滴下した。滴下終了後、室温下で16時間撹拌し、ろ過を行った。得られたろ液からテトラヒドロフランを除去し、残渣を60Pa、130℃の条件下で蒸留して、アルコキシド化合物No.43を収量1.34g、収率14.5%で得た。
(1)減圧TG−DTA
質量50%減少温度:136.2℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)元素分析 Co:18.4質量%、C:53.6質量%、H:8.7質量%、O:10.6質量%、N:8.6質量%(理論値;Co:18.7質量%、C:53.3質量%、H:9.0質量%、O:10.1質量%、N:8.9質量%)
200ml4つ口フラスコに塩化コバルト(II)を13.23g、テトラヒドロフラン48gを仕込み、室温下で撹拌した。その中に、アルコール化合物No.140(3−エチルイミノメチル−3−ペンタノール)より調製して得たナトリウムアルコキシド33.04gをテトラヒドロフラン50gで希釈した溶液を氷冷下で滴下した。滴下終了後、室温下で22時間撹拌し、ろ過を行った。得られたろ液からテトラヒドロフランを除去し、残渣を40Pa、125℃の条件下で蒸留して、アルコキシド化合物No.49を収量28.70g、収率83.5%で得た。得られたアルコキシド化合物No.49の単結晶X線構造解析の結果を図5に示す。
(1)減圧TG−DTA
質量50%減少温度:125.8℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)元素分析 Co:16.5質量%、C:56.3質量%、H:9.5質量%、O:9.8質量%、N:7.9質量%(理論値;Co:17.2質量%、C:56.0質量%、H:9.4質量%、O:9.3質量%、N:8.2質量%)
200ml4つ口フラスコに塩化コバルト(II)を5.75g、テトラヒドロフラン18gを仕込み、室温下で撹拌した。その中に、アルコール化合物No.146(3−イソプロピルイミノメチル−3−ペンタノール)より調製して得たナトリウムアルコキシド15.06gをテトラヒドロフラン17gで希釈した溶液を氷冷下で滴下した。滴下終了後、室温下で29時間撹拌し、ろ過を行った。得られたろ液からテトラヒドロフランを除去し、残渣を50Pa、135℃の条件下で蒸留して、アルコキシド化合物No.55を収量5.53g、収率35.1%で得た。
(1)減圧TG−DTA
質量50%減少温度:130.3℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)元素分析 Co:15.0質量%、C:59.0質量%、H:9.7質量%、O:8.9質量%、N:7.5質量%(理論値;Co:15.9質量%、C:58.2質量%、H:9.8質量%、O:8.6質量%、N:7.5質量%)
100ml3つ口フラスコに塩化コバルト(II)1.52gおよびテトラヒドロフラン8.22gを仕込み、室温下で撹拌した。その中に、アルコール化合物No.166(1−エチルイミノ−2,3−ジメチル−2−ブタノール)より調製して得たナトリウムアルコキシド3.80gをテトラヒドロフラン7.95gで希釈した溶液を氷冷下で滴下した。滴下終了後、室温下で15時間撹拌し、ろ過を行った。得られたろ液からテトラヒドロフランを除去し、残渣を45Pa、バス温度130℃、塔頂温度90℃の条件下で蒸留して、アルコキシド化合物No.75を収量1.56g、収率39.3%で得た。
(1)減圧TG−DTA
質量50%減少温度:123℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)元素分析 Co:16.9質量%、C:56.2質量%、H:9.2質量%、O:9.7質量%、N:8.3質量%(理論値;Co:17.2質量%、C:56.0質量%、H:9.4質量%、O:9.3質量%、N:8.2質量%)
アルゴンガス雰囲気下、銅(II)メトキシド0.59gに、アルコール化合物No.134(3−メチルイミノメチル−3−ペンタノール)の3.8質量%トルエン溶液32gを滴下した。すぐに溶解して紫色を呈し、そのまま室温下で20時間撹拌した。オイルバス温度70℃、微減圧下でトルエンを留去し、次いでオイルバス温度90℃、減圧下で残留するトルエンを完全に留去した。得られた紫色固体を100℃、40Paで蒸留して目的物を得た。得られた化合物は融点60℃の固体であった。化合物の収率は70%であった。得られた化合物について、単結晶X線構造解析を行った。図6に単結晶X線構造解析により得られた分子構造を示す。この結果から、得られた化合物がアルコキシド化合物No.171であることが確認できた。
(1)減圧TG−DTA
質量50%減少温度:120℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)元素分析 Cu:19.7質量%、C:52.4質量%、H:8.9質量%、O:10.7質量%、N:8.4質量%(理論値;Cu:19.9質量%、C:52.6質量%、H:8.8質量%、O:10.0質量%、N:8.8質量%)
アルゴンガス雰囲気下、銅(II)メトキシド0.62gに、アルコール化合物No.140(3−エチルイミノメチル−3−ペンタノール)の3.7質量%トルエン溶液38gを滴下した。すぐに溶解して紫色を呈し、そのまま室温下で18時間撹拌した。オイルバス温度70℃、微減圧下でトルエンを留去し、次いでオイルバス温度90℃、減圧下で残留するトルエンを完全に留去した。得られた紫色液体を100℃、40Paで蒸留して紫色液体であるアルコキシド化合物No.172を得た。アルコキシド化合物No.172の収率は45%であった。
(1)減圧TG−DTA
質量50%減少温度:120℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)元素分析 Cu:18.4質量%、C:54.9質量%、H:8.8質量%、O:9.0質量%、N:8.2質量%(理論値;Cu:18.3質量%、C:55.2質量%、H:9.3質量%、O:9.2質量%、N:8.1質量%)
500ml4つ口フラスコにヘキサアンミンニッケル(II)塩化物を4.97g、テトラヒドロフラン95gを仕込み、室温下で撹拌した。その中に、アルコール(3−エチルイミノメチル−3−ペンタノール)の17.2質量%トルエン溶液36.0gより調製して得たナトリウムアルコキシドをテトラヒドロフラン180gで希釈した溶液を、氷冷下で滴下した。滴下終了後、70℃加熱下で撹拌した後、テトラヒドロフラン、トルエンを除去した。この残渣をヘキサンに溶解させ、ろ過を行った。得られたろ液からヘキサンを除去し、残渣を25Pa、100℃の条件下で精製して、化合物No.221物を収量2.80g、収率37.8%で得た。
(1)減圧TG−DTA
質量50%減少温度:134℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)元素分析 Ni:17.3質量%、C:56.2質量%、H:9.2質量%、O:9.2質量%、N:8.0質量%(理論値;Ni:17.10質量%、C:56.01質量%、H:9.40質量%、O:9.33質量%、N:8.16質量%)
(3)1NMR(溶媒:重ベンゼン)(ケミカルシフト:多重度:H数)
(6.877:s:2)(2.745〜2.797:q:4)(1.328〜1.386:m:8)(1.229〜1.266:t:12)(1.147〜1.182:t:6)
200ml4つ口フラスコにヘキサアンミンニッケル(II)塩化物を6.88g、テトラヒドロフラン42.8gを仕込み、室温下で撹拌した。その中に、アルコール(1−エチルイミノ−2,3−ジメチル−2−ブタノール)より調製して得たナトリウムアルコキシド9.80gをテトラヒドロフラン42.8gで希釈した溶液を氷冷下で滴下した。滴下終了後、室温下で14時間撹拌した。2時間過熱還流を行い、室温まで放冷ののち、減圧下テトラヒドロフランを留去した。得られた残渣にヘキサン65gを加え、ろ過を行った。得られたろ液からヘキサンを留去し、残渣を50Pa、100℃の条件下で蒸留して、化合物No.247を収量2.50g、収率30.7%で得た。
(1)減圧TG−DTA
質量50%減少温度:132.9℃(10トール、Ar流量:50ml/分、昇温10℃/分)
(2)1NMR(溶媒:重ベンゼン)(ケミカルシフト:多重度:H数)
(7.030:d:2)(2.932〜2.593:m:4)(1.605〜1.509:m:2)(1.661:dd:12)(1.084〜1.117:m:12)
(3)元素分析 Ni:17.2質量%、C:56.3質量%、H:9.0質量%、O:9.3質量%、N:7.9質量%(理論値;Ni:17.1質量%、C:56.0質量%、H:9.40質量%、O:9.33質量%、N:8.16質量%)
アルコキシド化合物No.43、49、55、75、171、172、221及び247について、大気中で放置することで自然発火性の有無を確認した。結果を表1に示す。
アルコキシド化合物No.43、49、55、75、171、172、221、247並びに以下に示す比較化合物1〜6について、DSC測定装置を用いて熱分解開始温度を測定した。結果を表2に示す。
アルコキシド化合物No.43、49、55及び75を化学気相成長用原料とし、図2に示す装置を用いて以下の条件のALD法により、シリコンウエハ上に金属コバルト薄膜を製造した。得られた薄膜について、X線反射率法による膜厚測定、X線回折法及びX線光電子分光法による薄膜構造及び薄膜組成の確認を行ったところ、膜厚は2〜4nmであり、膜組成は金属コバルト(XPS分析によるCo2pピークで確認)であり、炭素含有量は検出下限である0.1atom%よりも少なかった。1サイクル当たりに得られる膜厚は、0.02〜0.04nmであった。
反応温度(基板温度);300℃、反応性ガス;水素ガス
(工程)
下記(1)〜(4)からなる一連の工程を1サイクルとして、100サイクル繰り返した。
(1)気化室温度:110℃、気化室圧力50Paの条件で気化させた化学気相成長用原料の蒸気を導入し、系圧50Paで30秒間堆積させる。
(2)5秒間のアルゴンパージにより、未反応原料を除去する。
(3)反応性ガスを導入し、系圧力50Paで30秒間反応させる。
(4)5秒間のアルゴンパージにより、未反応原料を除去する。
アルコキシド化合物No.171及び172を化学気相成長用原料とし、図3に示すプラズマ成膜装置を用いて以下の条件のPEALD法により、シリコンウエハ上に金属銅薄膜を製造した。得られた薄膜について、X線反射率法による膜厚測定、X線回折法及びX線光電子分光法による薄膜構造及び薄膜組成の確認を行ったところ、膜厚は2〜4nmであり、膜組成は金属銅(XPS分析によるCu2pピークで確認)であり、炭素含有量は検出下限である0.1atom%よりも少なかった。1サイクル当たりに得られる膜厚は、0.02〜0.04nmであった。
反応温度(基板温度);60℃、反応性ガス;水素ガス、プラズマ出力;50W
(工程)
下記(1)〜(4)からなる一連の工程を1サイクルとして、100サイクル繰り返した。
(1)原料容器加熱温度:60℃、原料容器内圧力50Paの条件で気化させた化学気相成長用原料の蒸気を導入し、系圧50Paで30秒間堆積させる。
(2)5秒間のアルゴンパージにより、未反応原料を除去する。
(3)反応性ガスとプラズマを導入し、系圧力50Paで30秒間反応させる。
(4)5秒間のアルゴンパージにより、未反応原料を除去する。
アルコキシド化合物No.221及び247を各々化学気相成長用原料とし、図1に示す装置を用いて以下の条件の熱ALD法により、シリコンウエハ上に金属ニッケル薄膜を製造した。得られた薄膜について、X線反射率法による膜厚測定、X線回折法及びX線光電子分光法による薄膜構造及び薄膜組成の確認を行ったところ、どちらも膜厚は20〜40nmであり、膜組成は金属ニッケル(XPS分析によるNi2pピークで確認)であり、炭素および窒素含有量は検出下限である0.1atom%よりも少なかった。1サイクル当たりに得られる膜厚は、0.02〜0.04nmであった。
反応温度(基板温度);230℃、反応性ガス;水素ガス
(工程)
下記(1)〜(4)からなる一連の工程を1サイクルとして、1000サイクル繰り返した。
(1)気化室温度:70℃、気化室圧力50Paの条件で気化させた化学気相成長用原料の蒸気を導入し、系圧50Paで30秒間堆積させる。
(2)5秒間のアルゴンパージにより、未反応原料を除去する。
(3)反応性ガスを導入し、系圧力50Paで30秒間反応させる。
(4)5秒間のアルゴンパージにより、未反応原料を除去する。
アルコキシド化合物No.221及び247を各々化学気相成長用原料とし、図3に示すプラズマ成膜装置を用いて以下の条件のPEALD法により、シリコンウエハ上に金属ニッケル薄膜を製造した。得られた薄膜について、X線反射率法による膜厚測定、X線回折法及びX線光電子分光法による薄膜構造及び薄膜組成の確認を行ったところ、どちらも膜厚は50〜70nmであり、膜組成は金属銅(XPS分析によるNi2pピークで確認)であり、炭素および窒素含有量は検出下限である0.1atom%よりも少なかった。1サイクル当たりに得られる膜厚は、0.05〜0.07nmであった。
反応温度(基板温度);70℃、反応性ガス;水素ガス、プラズマ出力;50W
(工程)
下記(1)〜(4)からなる一連の工程を1サイクルとして、1000サイクル繰り返した。
(1)原料容器加熱温度:70℃、原料容器内圧力50Paの条件で気化させた化学気相成長用原料の蒸気を導入し、系圧50Paで30秒間堆積させる。
(2)5秒間のアルゴンパージにより、未反応原料を除去する。
(3)反応性ガスとプラズマを導入し、系圧力50Paで30秒間反応させる。
(4)5秒間のアルゴンパージにより、未反応原料を除去する。
Claims (5)
- 下記一般式(I)で表されるアルコキシド化合物。
Lは、水素原子、ハロゲン原子、水酸基、アミノ基、アジ基、ホスフィド基、ニトリル基、カルボニル基、炭素原子数1〜12の炭化水素基又は下記一般式(L−1)〜(L−13)で表される基を表す。Mは、金属原子又はケイ素原子を表し、nは1以上の整数を表し、mは0以上の整数を表し、n+mは、Mで表される金属原子又はケイ素原子の価数を表す。)
- 上記一般式(I)において、Mが銅、鉄、ニッケル、コバルト又はマンガンである、請求項1に記載のアルコキシド化合物。
- 請求項1又は2に記載のアルコキシド化合物を含有してなる薄膜形成用原料。
- 請求項3に記載の薄膜形成用原料を気化させて得られるアルコキシド化合物を含有する蒸気を、基体が設置された成膜チャンバー内に導入し、該アルコキシド化合物を分解及び/又は化学反応させて該基体の表面に金属原子及びケイ素原子から選ばれる少なくとも1種の原子を含有する薄膜を形成する薄膜の形成方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014159270 | 2014-08-05 | ||
JP2014159270 | 2014-08-05 | ||
PCT/JP2015/070385 WO2016021385A1 (ja) | 2014-08-05 | 2015-07-16 | アルコキシド化合物、薄膜形成用原料、薄膜の形成方法及びアルコール化合物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2016021385A1 true JPWO2016021385A1 (ja) | 2017-05-18 |
JP6662779B2 JP6662779B2 (ja) | 2020-03-11 |
Family
ID=55263658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016540139A Active JP6662779B2 (ja) | 2014-08-05 | 2015-07-16 | アルコキシド化合物、薄膜形成用原料、薄膜の形成方法及びアルコール化合物 |
Country Status (8)
Country | Link |
---|---|
US (2) | US10011623B2 (ja) |
EP (1) | EP3178808A4 (ja) |
JP (1) | JP6662779B2 (ja) |
KR (1) | KR102415479B1 (ja) |
CN (1) | CN106660946B (ja) |
IL (1) | IL249717B (ja) |
TW (1) | TWI668203B (ja) |
WO (1) | WO2016021385A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11918675B2 (en) | 2019-12-16 | 2024-03-05 | Colgate-Palmolive Company | Oral care compositions |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4310634A (en) * | 1979-10-15 | 1982-01-12 | Texaco Development Corp. | Novel polyisocyanurate catalyst |
WO2014077089A1 (ja) * | 2012-11-13 | 2014-05-22 | 株式会社Adeka | 金属アルコキシド化合物、薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1027265A (en) * | 1962-08-10 | 1966-04-27 | Sicedison Spa | Alpha-hydroxy-oximes and alpha-acyloxy-oximes |
US3359314A (en) * | 1962-08-10 | 1967-12-19 | Montedison Spa | Process for preparing alpha hydroxy oximes |
US3869278A (en) | 1972-07-27 | 1975-03-04 | Merrill Wilcox | Hydroxylamines and derivatives thereof as abscission agents |
DE2338010A1 (de) | 1972-07-27 | 1974-02-14 | Ciba Geigy Ag | Verfahren zur regulierung des wachstums und der entwicklung von pflanzen |
GB1419080A (en) | 1972-12-29 | 1975-12-24 | Cheminova As | Chemical compounds having juvenile hormone activity |
GB1537828A (en) | 1975-03-26 | 1979-01-04 | Shell Int Research | Extraction of copper values from aqueous solutions with hydroxy-oximes |
US4237069A (en) | 1979-07-02 | 1980-12-02 | Allied Chemical Corporation | Production of alpha-hydroxy oximes |
JPS5865257A (ja) | 1981-10-12 | 1983-04-18 | Baiorisaac Center:Kk | スレオニン混合物の製造方法 |
DE3228099A1 (de) * | 1982-07-28 | 1984-02-02 | Bayer Ag, 5090 Leverkusen | Pyridyloxy-oximino-derivate |
JPS59174834A (ja) | 1983-03-25 | 1984-10-03 | Fuji Photo Film Co Ltd | 乾式画像形成方法 |
EP0122512B1 (en) | 1983-03-25 | 1988-06-22 | Fuji Photo Film Co., Ltd. | Dry image-forming process and material therefor |
DE19524623A1 (de) | 1995-07-06 | 1997-01-09 | Basf Ag | 5-Pyrazolylbenzoesäure-Derivate |
US7057030B2 (en) | 2002-03-15 | 2006-06-06 | E. I. Du Pont De Nemours And Company | Rhodococcus gene encoding aldoxime dehydratase |
WO2006107121A1 (en) | 2005-04-07 | 2006-10-12 | Korea Research Institue Of Chemical Technology | Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same |
JP4781012B2 (ja) | 2005-05-30 | 2011-09-28 | 株式会社Adeka | アルコール化合物を配位子とした金属化合物及び薄膜形成用原料並びに薄膜の製造方法 |
KR100675983B1 (ko) | 2006-03-06 | 2007-01-30 | 한국화학연구원 | 신규의 코발트 아미노알콕사이드 화합물 및 그 제조 방법 |
JP5690684B2 (ja) * | 2011-08-02 | 2015-03-25 | 株式会社Adeka | アルコキシド化合物 |
US8907115B2 (en) | 2012-12-10 | 2014-12-09 | Wayne State University | Synthesis and characterization of first row transition metal complexes containing α-keto hydrazonate ligands as potential precursors for use in metal film deposition |
US9758866B2 (en) * | 2013-02-13 | 2017-09-12 | Wayne State University | Synthesis and characterization of first row transition metal complexes containing α-imino alkoxides as precursors for deposition of metal films |
-
2015
- 2015-07-16 WO PCT/JP2015/070385 patent/WO2016021385A1/ja active Application Filing
- 2015-07-16 EP EP15829762.2A patent/EP3178808A4/en active Pending
- 2015-07-16 JP JP2016540139A patent/JP6662779B2/ja active Active
- 2015-07-16 CN CN201580040201.7A patent/CN106660946B/zh active Active
- 2015-07-16 US US15/318,755 patent/US10011623B2/en active Active
- 2015-07-16 KR KR1020167035931A patent/KR102415479B1/ko active IP Right Grant
- 2015-07-29 TW TW104124553A patent/TWI668203B/zh active
-
2016
- 2016-12-22 IL IL249717A patent/IL249717B/en active IP Right Grant
-
2018
- 2018-06-04 US US15/996,693 patent/US20180282358A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4310634A (en) * | 1979-10-15 | 1982-01-12 | Texaco Development Corp. | Novel polyisocyanurate catalyst |
WO2014077089A1 (ja) * | 2012-11-13 | 2014-05-22 | 株式会社Adeka | 金属アルコキシド化合物、薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
Non-Patent Citations (8)
Title |
---|
GREGORY K. FRIESTAD ET AL.: "Diastereoselective Vinyl Addition to Chiral Hydrazones via Tandem Thiyl Radical Addition and Silicon", ORGANIC LETTERS, vol. 2, no. 26, JPN6019007976, 2000, pages 4237 - 4240, XP055449434, ISSN: 0004157560, DOI: 10.1021/ol0067991 * |
KATRITZKY, A. R. ET AL., THE JOURNAL OF ORGANIC CHEMISTRY, vol. 56, JPN6019037034, 1991, pages 2143 - 2147, ISSN: 0004157556 * |
KIMPE, N. D. ET AL., CANADIAN JOURNAL OF CHEMISTRY, vol. 62, JPN7019003114, 1984, pages 1812 - 1816, ISSN: 0004157557 * |
M. S. NECHAEV ET AL.: "Initiation of ethylene polymerization on organoelement cations L2MMe+(M=Ge,Sn) with intramolecular c", RUSSIAN CHEMICAL BULLETIN, INTERNATIONAL EDITION, vol. 57(7), JPN6015040775, 2008, pages 1364 - 1373, ISSN: 0004157558 * |
PETER ZANDBERGEN ET AL.: "A One-Pot Reduction-Transimination-Reduction Synthesis of N-substituted β-Ethanolamines from Cyanoh", TETRAHEDRON, vol. 48(19), JPN6015040776, 1992, pages 3977 - 82, ISSN: 0004157559 * |
TAKUYA ITOH ET AL.: "Stereostructure of Komodoquinone A, a Neuritogenic Anthracycline, from Marine Streptomyces sp. KS3", CHEMICAL AND PHARMACEUTICAL BULLETIN, vol. 51(12), JPN6019007980, 2003, pages 1402 - 1404, ISSN: 0004157563 * |
VANDA CERE ET AL.: "Indium-Mediated Allylation of the N,N-Dimethyl Glyoxal Mono-Hydrazone:One-Pot Synthesis of Bis-Homoa", SYNLETT, JPN6019007978, 1999, pages 1585 - 1587, ISSN: 0004157562 * |
VANDA CERE ET AL.: "Nucleophilic Addition of Organometallic Reagents to N,N-Dimethyl- and SAMP-Glyoxal-Monohydrazones", TRAHEDRON, vol. 55, no. 4, JPN6019007977, 1999, pages 1087 - 1098, XP004151331, ISSN: 0004157561, DOI: 10.1016/S0040-4020(98)01087-4 * |
Also Published As
Publication number | Publication date |
---|---|
KR102415479B1 (ko) | 2022-06-30 |
TW201619126A (zh) | 2016-06-01 |
CN106660946A (zh) | 2017-05-10 |
CN106660946B (zh) | 2019-07-23 |
JP6662779B2 (ja) | 2020-03-11 |
EP3178808A4 (en) | 2018-03-21 |
IL249717A0 (en) | 2017-02-28 |
US20170129912A1 (en) | 2017-05-11 |
US10011623B2 (en) | 2018-07-03 |
EP3178808A1 (en) | 2017-06-14 |
IL249717B (en) | 2020-06-30 |
TWI668203B (zh) | 2019-08-11 |
WO2016021385A1 (ja) | 2016-02-11 |
KR20170041660A (ko) | 2017-04-17 |
US20180282358A1 (en) | 2018-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6465699B2 (ja) | ジアザジエニル化合物、薄膜形成用原料、薄膜の製造方法及びジアザジエン化合物 | |
JP6184030B2 (ja) | アルミニウム化合物、薄膜形成用原料及び薄膜の製造方法 | |
KR102046334B1 (ko) | 금속 알콕시드 화합물, 박막 형성용 원료, 박막의 제조방법 및 알코올 화합물 | |
KR102541122B1 (ko) | 신규 화합물, 박막 형성용 원료 및 박막의 제조 방법 | |
IL263665A (en) | Vanadium compound, a raw material for creating a thin layer and a method for producing a thin layer | |
US11618762B2 (en) | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | |
JP6343481B2 (ja) | 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 | |
JP6662779B2 (ja) | アルコキシド化合物、薄膜形成用原料、薄膜の形成方法及びアルコール化合物 | |
JP2018035072A (ja) | ジアザジエニル化合物、薄膜形成用原料及び薄膜の製造方法 | |
JP6408178B2 (ja) | アルコキシド化合物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180510 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190312 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190507 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20191001 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191030 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20191126 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191226 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200204 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200213 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 6662779 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |