JPWO2011004825A1 - ウエハ貼着用粘着シートおよびそれを用いたウエハの加工方法 - Google Patents

ウエハ貼着用粘着シートおよびそれを用いたウエハの加工方法 Download PDF

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Publication number
JPWO2011004825A1
JPWO2011004825A1 JP2011521930A JP2011521930A JPWO2011004825A1 JP WO2011004825 A1 JPWO2011004825 A1 JP WO2011004825A1 JP 2011521930 A JP2011521930 A JP 2011521930A JP 2011521930 A JP2011521930 A JP 2011521930A JP WO2011004825 A1 JPWO2011004825 A1 JP WO2011004825A1
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JP
Japan
Prior art keywords
wafer
styrene
adhesive sheet
pressure
resin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011521930A
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English (en)
Japanese (ja)
Inventor
郷史 大田
郷史 大田
朗 矢吹
朗 矢吹
正三 矢野
正三 矢野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
THE FURUKAW ELECTRIC CO., LTD.
Original Assignee
THE FURUKAW ELECTRIC CO., LTD.
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Application filed by THE FURUKAW ELECTRIC CO., LTD. filed Critical THE FURUKAW ELECTRIC CO., LTD.
Publication of JPWO2011004825A1 publication Critical patent/JPWO2011004825A1/ja
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/24Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/50Additional features of adhesives in the form of films or foils characterized by process specific features
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2453/00Presence of block copolymer
    • C09J2453/006Presence of block copolymer in the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dicing (AREA)
JP2011521930A 2009-07-08 2010-07-06 ウエハ貼着用粘着シートおよびそれを用いたウエハの加工方法 Pending JPWO2011004825A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009162009 2009-07-08
JP2009162009 2009-07-08
PCT/JP2010/061485 WO2011004825A1 (ja) 2009-07-08 2010-07-06 ウエハ貼着用粘着シートおよびそれを用いたウエハの加工方法

Publications (1)

Publication Number Publication Date
JPWO2011004825A1 true JPWO2011004825A1 (ja) 2012-12-20

Family

ID=43429249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011521930A Pending JPWO2011004825A1 (ja) 2009-07-08 2010-07-06 ウエハ貼着用粘着シートおよびそれを用いたウエハの加工方法

Country Status (6)

Country Link
JP (1) JPWO2011004825A1 (zh)
KR (1) KR101336430B1 (zh)
CN (1) CN102473617B (zh)
MY (1) MY154860A (zh)
TW (1) TWI447202B (zh)
WO (1) WO2011004825A1 (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6058534B2 (ja) * 2011-05-17 2017-01-11 リンテック株式会社 フィルムおよび粘着シート
JP5546518B2 (ja) * 2011-09-28 2014-07-09 古河電気工業株式会社 脆性ウェハ裏面研削用粘着テープ及びそれを用いた研削方法
WO2014021698A1 (ko) * 2012-08-03 2014-02-06 주식회사 엘지화학 접착 필름 및 이를 이용한 유기전자장치의 봉지 방법
JP6373251B2 (ja) * 2013-02-22 2018-08-15 デンカ株式会社 粘着シートを用いた電子部品の製造方法
KR101659057B1 (ko) * 2013-09-30 2016-09-22 주식회사 엘지화학 다이싱 필름 및 다이싱 다이본딩 필름
JP6264126B2 (ja) * 2014-03-20 2018-01-24 日立化成株式会社 ウエハ加工用テープ
JP6068386B2 (ja) * 2014-03-31 2017-01-25 日東電工株式会社 熱硬化型ダイボンドフィルム、ダイシング・ダイボンドフィルム及び半導体装置の製造方法
JP6280459B2 (ja) * 2014-06-27 2018-02-14 株式会社ディスコ テープ拡張装置
US20180230337A1 (en) * 2014-10-20 2018-08-16 Sekisui Plastics Co., Ltd. Tacky gel sheet having adhesive applications, method for producing same, method for fixing a pair of objects, and composite material
JP6445315B2 (ja) * 2014-12-12 2018-12-26 日東電工株式会社 ダイシングシート、ダイシング・ダイボンドフィルム及び半導体装置の製造方法
JP6623639B2 (ja) * 2015-09-18 2019-12-25 住友ベークライト株式会社 仮固定用テープ
JP6310492B2 (ja) * 2016-03-31 2018-04-11 古河電気工業株式会社 電子デバイスパッケージ用テープ
SG11201800287UA (en) * 2016-03-31 2018-02-27 Furukawa Electric Co Ltd Removable adhesive sheet for semiconductor processing
WO2017170436A1 (ja) * 2016-03-31 2017-10-05 古河電気工業株式会社 半導体加工用粘着シート
WO2018079552A1 (ja) 2016-10-27 2018-05-03 三井化学東セロ株式会社 電子装置の製造方法、電子装置製造用粘着性フィルムおよび電子部品試験装置
SG11201903703WA (en) * 2016-10-27 2019-05-30 Mitsui Chemicals Tohcello Inc Method for manufacturing electronic apparatus, adhesive film for manufacturing electronic apparatus, and electronic component testing apparatus
WO2018105613A1 (ja) * 2016-12-07 2018-06-14 古河電気工業株式会社 半導体加工用テープ
JP6800062B2 (ja) * 2017-03-28 2020-12-16 古河電気工業株式会社 粘着テープ
JP6535047B2 (ja) * 2017-05-12 2019-06-26 古河電気工業株式会社 半導体加工用粘着テープ
JP7400263B2 (ja) * 2018-08-23 2023-12-19 東レ株式会社 フィルム、及びフィルムの製造方法
JP7430853B2 (ja) * 2019-05-28 2024-02-14 シーカ テクノロジー アクチェンゲゼルシャフト 接着剤の選定方法および接着複合体並びに接着複合体の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002155249A (ja) * 2000-11-22 2002-05-28 Mitsui Chemicals Inc ウエハ加工用粘着テープ及びその製造方法並びに使用方法
JP2008066688A (ja) * 2006-08-11 2008-03-21 Furukawa Electric Co Ltd:The ウェハ加工用テープ
WO2009063793A1 (ja) * 2007-11-15 2009-05-22 The Furukawa Electric Co., Ltd. 半導体ウエハ加工用粘着テープ
WO2009078440A1 (ja) * 2007-12-18 2009-06-25 The Furukawa Electric Co., Ltd. ウエハ貼着用粘着シートおよびウエハの加工方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003092273A (ja) * 2001-09-19 2003-03-28 Mitsubishi Plastics Ind Ltd 半導体ウエハ用ダイシングフィルム
JP4851246B2 (ja) 2006-06-12 2012-01-11 古河電気工業株式会社 ポリプロピレンに水素添加したスチレン・ブタジエン共重合体を加えた相分離構造を有する組成物を基材とするレーザーダイシング用ダイシングテープ。
JP5019580B2 (ja) * 2006-09-20 2012-09-05 古河電気工業株式会社 ウエハ貼着用貼着シートおよびウエハの加工方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002155249A (ja) * 2000-11-22 2002-05-28 Mitsui Chemicals Inc ウエハ加工用粘着テープ及びその製造方法並びに使用方法
JP2008066688A (ja) * 2006-08-11 2008-03-21 Furukawa Electric Co Ltd:The ウェハ加工用テープ
WO2009063793A1 (ja) * 2007-11-15 2009-05-22 The Furukawa Electric Co., Ltd. 半導体ウエハ加工用粘着テープ
WO2009078440A1 (ja) * 2007-12-18 2009-06-25 The Furukawa Electric Co., Ltd. ウエハ貼着用粘着シートおよびウエハの加工方法

Also Published As

Publication number Publication date
WO2011004825A1 (ja) 2011-01-13
KR101336430B1 (ko) 2013-12-04
MY154860A (en) 2015-08-14
TW201118146A (en) 2011-06-01
CN102473617A (zh) 2012-05-23
KR20120023811A (ko) 2012-03-13
CN102473617B (zh) 2015-04-29
TWI447202B (zh) 2014-08-01

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