JPWO2009119784A1 - 環状化合物、環状化合物の製造方法、環状化合物からなるフォトレジスト基材、フォトレジスト組成物、微細加工方法、半導体装置及び装置 - Google Patents

環状化合物、環状化合物の製造方法、環状化合物からなるフォトレジスト基材、フォトレジスト組成物、微細加工方法、半導体装置及び装置 Download PDF

Info

Publication number
JPWO2009119784A1
JPWO2009119784A1 JP2010505813A JP2010505813A JPWO2009119784A1 JP WO2009119784 A1 JPWO2009119784 A1 JP WO2009119784A1 JP 2010505813 A JP2010505813 A JP 2010505813A JP 2010505813 A JP2010505813 A JP 2010505813A JP WO2009119784 A1 JPWO2009119784 A1 JP WO2009119784A1
Authority
JP
Japan
Prior art keywords
group
formula
represented
carbon atoms
cyclic compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010505813A
Other languages
English (en)
Japanese (ja)
Inventor
宏寿 石井
宏寿 石井
知行 蓬田
知行 蓬田
柏村　孝
孝 柏村
貴紀 大和田
貴紀 大和田
奈緒子 舛田
奈緒子 舛田
亜弥 折井
亜弥 折井
典夫 鞆津
典夫 鞆津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
Original Assignee
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd
Publication of JPWO2009119784A1 publication Critical patent/JPWO2009119784A1/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/708—Ethers
    • C07C69/712—Ethers the hydroxy group of the ester being etherified with a hydroxy compound having the hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/30—Compounds having groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/92—Systems containing at least three condensed rings with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
JP2010505813A 2008-03-28 2009-03-27 環状化合物、環状化合物の製造方法、環状化合物からなるフォトレジスト基材、フォトレジスト組成物、微細加工方法、半導体装置及び装置 Pending JPWO2009119784A1 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP2008087428 2008-03-28
JP2008088015 2008-03-28
JP2008087428 2008-03-28
JP2008088015 2008-03-28
JP2008102095 2008-04-10
JP2008102095 2008-04-10
JP2008184685 2008-07-16
JP2008184685 2008-07-16
PCT/JP2009/056218 WO2009119784A1 (fr) 2008-03-28 2009-03-27 Composé cyclique, processus de production d'un composé cyclique, matériau à base de résine photosensible comprenant ce composé cyclique, composition de résine photosensible, procédé de microtraitement, dispositif à semi-conducteur, et appareil

Publications (1)

Publication Number Publication Date
JPWO2009119784A1 true JPWO2009119784A1 (ja) 2011-07-28

Family

ID=41113968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010505813A Pending JPWO2009119784A1 (ja) 2008-03-28 2009-03-27 環状化合物、環状化合物の製造方法、環状化合物からなるフォトレジスト基材、フォトレジスト組成物、微細加工方法、半導体装置及び装置

Country Status (3)

Country Link
JP (1) JPWO2009119784A1 (fr)
TW (1) TW200949439A (fr)
WO (1) WO2009119784A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5702917B2 (ja) * 2009-05-11 2015-04-15 東京応化工業株式会社 ポジ型レジスト組成物、レジストパターン形成方法、高分子化合物、化合物
WO2011037072A1 (fr) * 2009-09-24 2011-03-31 三菱瓦斯化学株式会社 Composé cyclique, composition sensible au rayonnement, et procédé de formation de motif de réserve
JPWO2011037071A1 (ja) * 2009-09-24 2013-02-21 三菱瓦斯化学株式会社 環状化合物、感放射線性組成物およびレジストパターン形成法
JP2011079764A (ja) * 2009-10-06 2011-04-21 Mitsubishi Gas Chemical Co Inc 環状化合物、その製造方法、感放射線性組成物およびレジストパターン形成方法
JP2013067612A (ja) * 2011-09-23 2013-04-18 Rohm & Haas Electronic Materials Llc カリックスアレーン化合物およびこれを含むフォトレジスト組成物
JP2013079230A (ja) * 2011-09-23 2013-05-02 Rohm & Haas Electronic Materials Llc カリックスアレーンおよびこれを含むフォトレジスト組成物
CN105264440B (zh) * 2013-06-07 2019-09-24 三菱瓦斯化学株式会社 抗蚀剂组合物

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6093517A (en) * 1998-07-31 2000-07-25 International Business Machines Corporation Calixarenes for use as dissolution inhibitors in lithographic photoresist compositions
WO2005097725A1 (fr) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. Composes de calixresorcinarene, materiaux de base de photoresist, et compositions de ceux-ci
JP2006091657A (ja) * 2004-09-27 2006-04-06 Fuji Photo Film Co Ltd 電子線、ｅｕｖ又はｘ線用ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4524234B2 (ja) * 2005-09-26 2010-08-11 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
JP4976697B2 (ja) * 2006-01-27 2012-07-18 出光興産株式会社 環状化合物、並びにそれからなるフォトレジスト基材及び組成物
JP2007293250A (ja) * 2006-03-27 2007-11-08 Fujifilm Corp ポジ型レジスト組成物およびそれを用いたパターン形成方法

Also Published As

Publication number Publication date
TW200949439A (en) 2009-12-01
WO2009119784A1 (fr) 2009-10-01

Similar Documents

Publication Publication Date Title
JP5049935B2 (ja) ポジ型レジスト組成物およびレジストパターン形成方法
TWI594073B (zh) 負型顯影用光阻組成物，及光阻圖型之形成方法
JP5354420B2 (ja) 環状化合物、フォトレジスト基材、フォトレジスト組成物、微細加工方法及び半導体装置
TWI384325B (zh) 光阻組成物，光阻圖型之形成方法，新穎化合物及其製造方法，與酸產生劑
TWI534531B (zh) 光阻組成物，光阻圖型之形成方法，高分子化合物
TWI389922B (zh) 高分子化合物，正型光阻組成物，及光阻圖型之形成方法
KR20150118132A (ko) 레지스트 조성물, 레지스트 패턴 형성방법 및 이것에 이용하는 폴리페놀 유도체
TWI601730B (zh) 光阻組成物，光阻圖型之形成方法，新穎化合物，酸產生劑
TW202032270A (zh) 化合物
WO2009119784A1 (fr) Composé cyclique, processus de production d'un composé cyclique, matériau à base de résine photosensible comprenant ce composé cyclique, composition de résine photosensible, procédé de microtraitement, dispositif à semi-conducteur, et appareil
TWI424265B (zh) 新穎之化合物及其製造方法，酸產生劑，光阻組成物及光阻圖型之形成方法
TWI525391B (zh) 光阻組成物及光阻圖型之形成方法
JP2010138109A (ja) 環状化合物及びその製造方法
TWI614230B (zh) 化合物、自由基聚合起始劑、化合物之製造方法、聚合物、光阻組成物、光阻圖型之形成方法
TWI537682B (zh) 正型光阻組成物、光阻圖型之形成方法
JP5544078B2 (ja) ポジ型レジスト組成物およびレジストパターン形成方法
TWI427416B (zh) 正型光阻組成物、光阻圖型之形成方法、高分子化合物及化合物
JP5435995B2 (ja) 環状化合物の製造方法
WO2010067621A1 (fr) Composés cycliques et compositions de résine photosensible les utilisant
WO2010067622A1 (fr) Composés cycliques stéréoisomères, leur procédé de fabrication, compositions comprenant les composés cycliques stéréoisomères et leur procédé de fabrication
JP2010285376A (ja) 環状化合物、フォトレジスト基材及びフォトレジスト組成物
JP2009098448A (ja) 極端紫外光用及び／又は電子線用フォトレジスト組成物及びそれを用いた微細加工方法
WO2010067627A1 (fr) Précurseur d'un groupement inhibant la dissolution dissociable en milieu acide et composé cyclique portant un groupement inhibiteur de dissolution dissociable en milieu acide
WO2010143436A1 (fr) Composé cyclique, matériau à base de photorésist et composition de photorésist
JP5373124B2 (ja) 化合物