JPWO2006030595A1 - Ｃｍｐ用研磨スラリー - Google Patents

Ｃｍｐ用研磨スラリー Download PDF

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Publication number
JPWO2006030595A1
JPWO2006030595A1 JP2006535087A JP2006535087A JPWO2006030595A1 JP WO2006030595 A1 JPWO2006030595 A1 JP WO2006030595A1 JP 2006535087 A JP2006535087 A JP 2006535087A JP 2006535087 A JP2006535087 A JP 2006535087A JP WO2006030595 A1 JPWO2006030595 A1 JP WO2006030595A1
Authority
JP
Japan
Prior art keywords
cmp
copper
load
slurry
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2006535087A
Other languages
English (en)
Japanese (ja)
Inventor
勝美 馬渕
勝美 馬渕
晴夫 赤星
晴夫 赤星
上方　康雄
康雄 上方
羽廣　昌信
昌信 羽廣
小野　裕
裕 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Resonac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd, Resonac Corp filed Critical Hitachi Chemical Co Ltd
Publication of JPWO2006030595A1 publication Critical patent/JPWO2006030595A1/ja
Abandoned legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2006535087A 2004-09-14 2005-08-09 Ｃｍｐ用研磨スラリー Abandoned JPWO2006030595A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004267366 2004-09-14
JP2004267366 2004-09-14
PCT/JP2005/014878 WO2006030595A1 (ja) 2004-09-14 2005-08-09 Ｃｍｐ用研磨スラリー

Publications (1)

Publication Number Publication Date
JPWO2006030595A1 true JPWO2006030595A1 (ja) 2008-05-08

Family

ID=36059853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006535087A Abandoned JPWO2006030595A1 (ja) 2004-09-14 2005-08-09 Ｃｍｐ用研磨スラリー

Country Status (5)

Country Link
US (2) US20080105651A1 (https=)
JP (1) JPWO2006030595A1 (https=)
CN (1) CN1989600A (https=)
TW (1) TW200619365A (https=)
WO (1) WO2006030595A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020037669A (ja) * 2018-09-04 2020-03-12 株式会社フジミインコーポレーテッド 研磨用組成物および研磨システム

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1803964B (zh) * 1998-12-28 2010-12-15 日立化成工业株式会社 金属研磨液材料、金属研磨液、其制造方法及使用它的研磨方法
CN102863943B (zh) * 2005-08-30 2015-03-25 花王株式会社 硬盘用基板用研磨液组合物、基板的研磨方法和制造方法
WO2007102138A2 (en) * 2007-01-02 2007-09-13 Freescale Semiconductor, Inc. Barrier slurry compositions and barrier cmp methods
CN101496143B (zh) * 2006-07-28 2011-04-06 昭和电工株式会社 研磨组合物
JP5309495B2 (ja) * 2007-01-04 2013-10-09 富士通株式会社 半導体装置の製造方法
JP2008205432A (ja) * 2007-01-25 2008-09-04 Jsr Corp 電気光学表示装置用基板に設けられた銅または銅合金からなる配線層を研磨するための化学機械研磨用水系分散体および該化学機械研磨用水系分散体を調製するためのキット、ならびに化学機械研磨方法
US8231006B2 (en) 2008-12-31 2012-07-31 Memc Singapore Pte. Ltd. Methods to recover and purify silicon particles from saw kerf
JP2012028516A (ja) * 2010-07-22 2012-02-09 Hitachi Chem Co Ltd 銅研磨用研磨液及びそれを用いた研磨方法
CN102407482A (zh) * 2011-04-29 2012-04-11 上海华力微电子有限公司 调节金属研磨速率并改善研磨过程中产生的缺陷的方法
US20130186850A1 (en) * 2012-01-24 2013-07-25 Applied Materials, Inc. Slurry for cobalt applications
JP2014027012A (ja) * 2012-07-24 2014-02-06 Toshiba Corp 半導体装置の製造方法および半導体装置の製造装置
JP6428625B2 (ja) * 2013-08-30 2018-11-28 日立化成株式会社 スラリー、研磨液セット、研磨液、及び、基体の研磨方法
CN103666373A (zh) * 2013-11-29 2014-03-26 渑池金华新材料有限公司 一种玉米芯抛光磨料
CN105336688B (zh) * 2014-05-28 2018-07-10 中芯国际集成电路制造(上海)有限公司 半导体结构的形成方法
SG11201700255UA (en) * 2014-07-15 2017-02-27 Basf Se A chemical mechanical polishing (cmp) composition
US20160053381A1 (en) * 2014-08-22 2016-02-25 Cabot Microelectronics Corporation Germanium chemical mechanical polishing
KR20190017815A (ko) * 2016-06-09 2019-02-20 히타치가세이가부시끼가이샤 Cmp용 연마액 및 연마 방법
CN111929121B (zh) * 2020-06-17 2024-01-05 风帆有限责任公司 铅酸蓄电池用铅合金金相样品制备及其组织显示的方法
CN114350317B (zh) * 2021-12-28 2023-08-15 广东红日星实业有限公司 一种研磨液及其制备方法和应用
JP7186477B1 (ja) * 2022-08-03 2022-12-09 株式会社Doi Laboratory 電気化学計測装置
CN115651533A (zh) * 2022-11-02 2023-01-31 佛山科学技术学院 一种超疏水自修复硅烷涂料及其制备方法
CN119639353B (zh) * 2024-12-25 2025-09-19 河北工业大学创新研究院(石家庄) 一种用于tsv钛阻挡层的碱性抛光液及其制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000049124A (ja) * 1998-07-23 2000-02-18 Eternal Chemical Co Ltd 半導体プロセスに使用する化学機械的研磨剤組成物
JP2003037086A (ja) * 2001-07-24 2003-02-07 Sumitomo Chem Co Ltd 金属研磨組成物及び研磨方法
JP2004123879A (ja) * 2002-10-01 2004-04-22 Fujimi Inc 研磨用組成物
JP2004235319A (ja) * 2003-01-29 2004-08-19 Fuji Photo Film Co Ltd 金属用研磨液及び研磨方法
JP2005101545A (ja) * 2003-08-05 2005-04-14 Rohm & Haas Electronic Materials Cmp Holdings Inc 半導体層を研磨するための組成物
JP2005191544A (ja) * 2003-11-13 2005-07-14 Rohm & Haas Electronic Materials Cmp Holdings Inc 銅を研磨するための組成物及び方法
JP2008501240A (ja) * 2004-05-28 2008-01-17 キャボット マイクロエレクトロニクス コーポレイション 電気化学−機械研磨組成物及び同組成物の使用方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3371775B2 (ja) * 1997-10-31 2003-01-27 株式会社日立製作所 研磨方法
EP2394960A3 (en) * 1999-05-28 2013-03-13 Hitachi Chemical Co., Ltd. Method for producing cerium oxide
US6443812B1 (en) * 1999-08-24 2002-09-03 Rodel Holdings Inc. Compositions for insulator and metal CMP and methods relating thereto
JP4078787B2 (ja) * 2000-03-31 2008-04-23 Ｊｓｒ株式会社 化学機械研磨用水系分散体
US6812193B2 (en) * 2001-08-31 2004-11-02 International Business Machines Corporation Slurry for mechanical polishing (CMP) of metals and use thereof
US20050050803A1 (en) * 2001-10-31 2005-03-10 Jin Amanokura Polishing fluid and polishing method
JP2003188120A (ja) * 2001-12-17 2003-07-04 Hitachi Chem Co Ltd 金属用研磨液及び研磨方法
JP2003218201A (ja) * 2002-01-24 2003-07-31 Mitsubishi Electric Corp 半導体装置およびその製造方法
US20030162398A1 (en) * 2002-02-11 2003-08-28 Small Robert J. Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same
US6821309B2 (en) * 2002-02-22 2004-11-23 University Of Florida Chemical-mechanical polishing slurry for polishing of copper or silver films
EP1489650B1 (en) * 2002-03-04 2010-07-14 Fujimi Incorporated Polishing composition and method for forming wiring structure
JP4152218B2 (ja) * 2003-02-25 2008-09-17 Ｎｅｃエレクトロニクス株式会社 化学的機械的研磨用スラリー

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000049124A (ja) * 1998-07-23 2000-02-18 Eternal Chemical Co Ltd 半導体プロセスに使用する化学機械的研磨剤組成物
JP2003037086A (ja) * 2001-07-24 2003-02-07 Sumitomo Chem Co Ltd 金属研磨組成物及び研磨方法
JP2004123879A (ja) * 2002-10-01 2004-04-22 Fujimi Inc 研磨用組成物
JP2004235319A (ja) * 2003-01-29 2004-08-19 Fuji Photo Film Co Ltd 金属用研磨液及び研磨方法
JP2005101545A (ja) * 2003-08-05 2005-04-14 Rohm & Haas Electronic Materials Cmp Holdings Inc 半導体層を研磨するための組成物
JP2005191544A (ja) * 2003-11-13 2005-07-14 Rohm & Haas Electronic Materials Cmp Holdings Inc 銅を研磨するための組成物及び方法
JP2008501240A (ja) * 2004-05-28 2008-01-17 キャボット マイクロエレクトロニクス コーポレイション 電気化学−機械研磨組成物及び同組成物の使用方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020037669A (ja) * 2018-09-04 2020-03-12 株式会社フジミインコーポレーテッド 研磨用組成物および研磨システム

Also Published As

Publication number Publication date
US20110027994A1 (en) 2011-02-03
TWI311150B (https=) 2009-06-21
US20080105651A1 (en) 2008-05-08
CN1989600A (zh) 2007-06-27
WO2006030595A1 (ja) 2006-03-23
TW200619365A (en) 2006-06-16

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