JPS647649B2 - - Google Patents

Info

Publication number
JPS647649B2
JPS647649B2 JP6929981A JP6929981A JPS647649B2 JP S647649 B2 JPS647649 B2 JP S647649B2 JP 6929981 A JP6929981 A JP 6929981A JP 6929981 A JP6929981 A JP 6929981A JP S647649 B2 JPS647649 B2 JP S647649B2
Authority
JP
Japan
Prior art keywords
group
polyvinyl alcohol
degree
photosensitive
main chain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6929981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57185035A (en
Inventor
Kunihiro Ichimura
Kunitaka Toyofuku
Hiroshi Ito
Shuichi Tokumasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP6929981A priority Critical patent/JPS57185035A/ja
Publication of JPS57185035A publication Critical patent/JPS57185035A/ja
Publication of JPS647649B2 publication Critical patent/JPS647649B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
JP6929981A 1981-05-11 1981-05-11 Photosensitive resin composition Granted JPS57185035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6929981A JPS57185035A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6929981A JPS57185035A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57185035A JPS57185035A (en) 1982-11-15
JPS647649B2 true JPS647649B2 (en, 2012) 1989-02-09

Family

ID=13398544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6929981A Granted JPS57185035A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57185035A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187150A (ja) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS6225750A (ja) * 1985-07-26 1987-02-03 Agency Of Ind Science & Technol 平凹版用感光性印刷版材
JP2604770B2 (ja) * 1987-12-28 1997-04-30 工業技術院長 感光性樹脂組成物
US5358999A (en) * 1992-05-29 1994-10-25 Ulano Corporation Process for preparation of photosensitive compositions of stilbazolium quaternary

Also Published As

Publication number Publication date
JPS57185035A (en) 1982-11-15

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