JPH0336215B2 - - Google Patents

Info

Publication number
JPH0336215B2
JPH0336215B2 JP57212233A JP21223382A JPH0336215B2 JP H0336215 B2 JPH0336215 B2 JP H0336215B2 JP 57212233 A JP57212233 A JP 57212233A JP 21223382 A JP21223382 A JP 21223382A JP H0336215 B2 JPH0336215 B2 JP H0336215B2
Authority
JP
Japan
Prior art keywords
polyvinyl acetate
photosensitive
emulsion
methyl
seconds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57212233A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59102232A (ja
Inventor
Kunihiro Ichimura
Yoji Yamazawa
Tetsuaki Tochisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Toyo Gosei Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Toyo Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toyo Gosei Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP21223382A priority Critical patent/JPS59102232A/ja
Publication of JPS59102232A publication Critical patent/JPS59102232A/ja
Publication of JPH0336215B2 publication Critical patent/JPH0336215B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP21223382A 1982-12-03 1982-12-03 スクリーン印刷版製造用感光性材料 Granted JPS59102232A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21223382A JPS59102232A (ja) 1982-12-03 1982-12-03 スクリーン印刷版製造用感光性材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21223382A JPS59102232A (ja) 1982-12-03 1982-12-03 スクリーン印刷版製造用感光性材料

Publications (2)

Publication Number Publication Date
JPS59102232A JPS59102232A (ja) 1984-06-13
JPH0336215B2 true JPH0336215B2 (en, 2012) 1991-05-30

Family

ID=16619160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21223382A Granted JPS59102232A (ja) 1982-12-03 1982-12-03 スクリーン印刷版製造用感光性材料

Country Status (1)

Country Link
JP (1) JPS59102232A (en, 2012)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11214895B2 (en) 2015-11-06 2022-01-04 Inv Performance Materials, Llc Low permeability and high strength fabric and methods of making the same
US11634841B2 (en) 2017-05-02 2023-04-25 Inv Performance Materials, Llc Low permeability and high strength woven fabric and methods of making the same
US11708045B2 (en) 2017-09-29 2023-07-25 Inv Performance Materials, Llc Airbags and methods for production of airbags

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5246815A (en) * 1984-07-04 1993-09-21 Gen. Director Of The Agency Of Industrial Science & Technology Photosensitive material for screen processing
JPH0640220B2 (ja) * 1984-07-04 1994-05-25 工業技術院長 感光性材料の製造法
JPH0666030B2 (ja) * 1984-07-04 1994-08-24 工業技術院長 スクリ−ン製版用感光性樹脂組成物
JPH0642077B2 (ja) * 1984-07-04 1994-06-01 工業技術院長 スクリ−ン製版用感光性材料
JPS6187150A (ja) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS61184534A (ja) * 1985-02-13 1986-08-18 Agency Of Ind Science & Technol 感光性樹脂水溶液の製造方法
JP2587458Y2 (ja) * 1990-07-21 1998-12-16 貞義 坂井 足場つなぎ金具
WO2007132532A1 (ja) 2006-05-17 2007-11-22 Murakami Co., Ltd. 感光性樹脂組成物およびこれを用いてなる感光性フィルムならびにスクリーン印刷用ステンシル

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5523163A (en) * 1978-08-09 1980-02-19 Agency Of Ind Science & Technol Polyvinyl alcohol type photosensitive resin and its preparation
JPS5562446A (en) * 1978-11-06 1980-05-10 Agency Of Ind Science & Technol Photosensitive resin composition for screen printing plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11214895B2 (en) 2015-11-06 2022-01-04 Inv Performance Materials, Llc Low permeability and high strength fabric and methods of making the same
US11634841B2 (en) 2017-05-02 2023-04-25 Inv Performance Materials, Llc Low permeability and high strength woven fabric and methods of making the same
US11708045B2 (en) 2017-09-29 2023-07-25 Inv Performance Materials, Llc Airbags and methods for production of airbags

Also Published As

Publication number Publication date
JPS59102232A (ja) 1984-06-13

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