JPS6457208A - Manufacture of diffraction grating - Google Patents
Manufacture of diffraction gratingInfo
- Publication number
- JPS6457208A JPS6457208A JP21558287A JP21558287A JPS6457208A JP S6457208 A JPS6457208 A JP S6457208A JP 21558287 A JP21558287 A JP 21558287A JP 21558287 A JP21558287 A JP 21558287A JP S6457208 A JPS6457208 A JP S6457208A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- diffraction grating
- covering layer
- etching
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To easily form a diffraction grating having a phase shift by using a usual interference exposing method, by forming a covering layer which is not dissolved by a solvent of a resist, to uniform thickness, removing by etching only the part on the resist of the covering layer, and thereafter, etching a substrate by using the covering layer as a mask. CONSTITUTION:On a part or the whole of a resist 12 of a diffraction grating pattern which is formed on a substrate 11, a covering layer 13 which is not dissolved by a solvent of the resist 12 is formed to uniform thickness. Subsequently, only the part on the resist 12 of the covering layer 13 is removed by etching. After the resist 12 is removed, etching of the substrate 11 is executed by using the covering layer 13 as a mask. In such a way, by utilizing the resist of the diffraction grating pattern which has bee formed by a usual interference exposing method, a diffraction grating having a phase shift of 1/4 wavelength can be obtained by a simple process.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21558287A JPS6457208A (en) | 1987-08-28 | 1987-08-28 | Manufacture of diffraction grating |
US07/947,981 US5300190A (en) | 1987-06-24 | 1992-09-21 | Process of producing diffraction grating |
US08/172,824 US5540345A (en) | 1987-06-24 | 1993-12-27 | Process of producing diffraction grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21558287A JPS6457208A (en) | 1987-08-28 | 1987-08-28 | Manufacture of diffraction grating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6457208A true JPS6457208A (en) | 1989-03-03 |
Family
ID=16674822
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21558287A Pending JPS6457208A (en) | 1987-06-24 | 1987-08-28 | Manufacture of diffraction grating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6457208A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011022547A (en) * | 2009-06-17 | 2011-02-03 | Sumitomo Electric Ind Ltd | Method of forming diffraction grating |
-
1987
- 1987-08-28 JP JP21558287A patent/JPS6457208A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011022547A (en) * | 2009-06-17 | 2011-02-03 | Sumitomo Electric Ind Ltd | Method of forming diffraction grating |
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