JPS645473B2 - - Google Patents

Info

Publication number
JPS645473B2
JPS645473B2 JP55173530A JP17353080A JPS645473B2 JP S645473 B2 JPS645473 B2 JP S645473B2 JP 55173530 A JP55173530 A JP 55173530A JP 17353080 A JP17353080 A JP 17353080A JP S645473 B2 JPS645473 B2 JP S645473B2
Authority
JP
Japan
Prior art keywords
region
drain region
voltage
insulating substrate
offset gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55173530A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5796568A (en
Inventor
Toshihide Kuryama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP55173530A priority Critical patent/JPS5796568A/ja
Publication of JPS5796568A publication Critical patent/JPS5796568A/ja
Publication of JPS645473B2 publication Critical patent/JPS645473B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6704Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6713Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
    • H10D30/6715Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes characterised by the doping profiles, e.g. having lightly-doped source or drain extensions
    • H10D30/6717Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes characterised by the doping profiles, e.g. having lightly-doped source or drain extensions the source and the drain regions being asymmetrical

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP55173530A 1980-12-09 1980-12-09 Semiconductor device and high-voltage circuit using said device Granted JPS5796568A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55173530A JPS5796568A (en) 1980-12-09 1980-12-09 Semiconductor device and high-voltage circuit using said device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55173530A JPS5796568A (en) 1980-12-09 1980-12-09 Semiconductor device and high-voltage circuit using said device

Publications (2)

Publication Number Publication Date
JPS5796568A JPS5796568A (en) 1982-06-15
JPS645473B2 true JPS645473B2 (enrdf_load_stackoverflow) 1989-01-30

Family

ID=15962233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55173530A Granted JPS5796568A (en) 1980-12-09 1980-12-09 Semiconductor device and high-voltage circuit using said device

Country Status (1)

Country Link
JP (1) JPS5796568A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5796568A (en) 1982-06-15

Similar Documents

Publication Publication Date Title
US5808344A (en) Single-transistor logic and CMOS inverters
JPS63310175A (ja) 電界効果トランジスタ
JP2609619B2 (ja) 半導体装置
JPH1187727A5 (enrdf_load_stackoverflow)
JPS6043693B2 (ja) 駆動回路
JP2839375B2 (ja) 半導体集積回路装置
JPS6119164A (ja) 相補型集積回路とその製造方法
JPH0653497A (ja) 入出力保護回路を備えた半導体装置
US4370669A (en) Reduced source capacitance ring-shaped IGFET load transistor in mesa-type integrated circuit
JP2655053B2 (ja) 半導体集積回路装置
JPS645473B2 (enrdf_load_stackoverflow)
JPH06275826A (ja) 半導体装置
JPS5937858B2 (ja) 半導体装置およびその製法
JP2004288873A (ja) 半導体装置
JP3248791B2 (ja) 半導体装置
JPH0337748B2 (enrdf_load_stackoverflow)
JPH0846145A (ja) 半導体回路装置
JPH0319231Y2 (enrdf_load_stackoverflow)
JPH0817206B2 (ja) 半導体装置
JPS5858747A (ja) Mos型半導体集積回路
JPH0590515A (ja) 電圧転送回路
JPH02102575A (ja) 半導体装置
JP3118893B2 (ja) 縦型mosトランジスタ
JPH0212016B2 (enrdf_load_stackoverflow)
KR950003238B1 (ko) 다중-전극을 이용한 논리소자의 구조