JPS6453423A - Detection of etching end point - Google Patents
Detection of etching end pointInfo
- Publication number
- JPS6453423A JPS6453423A JP20969187A JP20969187A JPS6453423A JP S6453423 A JPS6453423 A JP S6453423A JP 20969187 A JP20969187 A JP 20969187A JP 20969187 A JP20969187 A JP 20969187A JP S6453423 A JPS6453423 A JP S6453423A
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- silicon
- film
- silicon oxide
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20969187A JPS6453423A (en) | 1987-08-24 | 1987-08-24 | Detection of etching end point |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20969187A JPS6453423A (en) | 1987-08-24 | 1987-08-24 | Detection of etching end point |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6453423A true JPS6453423A (en) | 1989-03-01 |
Family
ID=16577033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20969187A Pending JPS6453423A (en) | 1987-08-24 | 1987-08-24 | Detection of etching end point |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6453423A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5147740A (en) * | 1990-08-09 | 1992-09-15 | Rockwell International Corporation | Structure and process for fabricating conductive patterns having sub-half micron dimensions |
JP2006196735A (ja) * | 2005-01-14 | 2006-07-27 | Yamaha Corp | サイドスペーサ形成法 |
-
1987
- 1987-08-24 JP JP20969187A patent/JPS6453423A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5147740A (en) * | 1990-08-09 | 1992-09-15 | Rockwell International Corporation | Structure and process for fabricating conductive patterns having sub-half micron dimensions |
JP2006196735A (ja) * | 2005-01-14 | 2006-07-27 | Yamaha Corp | サイドスペーサ形成法 |
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