JPS644665B2 - - Google Patents

Info

Publication number
JPS644665B2
JPS644665B2 JP56149546A JP14954681A JPS644665B2 JP S644665 B2 JPS644665 B2 JP S644665B2 JP 56149546 A JP56149546 A JP 56149546A JP 14954681 A JP14954681 A JP 14954681A JP S644665 B2 JPS644665 B2 JP S644665B2
Authority
JP
Japan
Prior art keywords
film
oxide film
polycrystalline silicon
silicon oxide
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56149546A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5852830A (ja
Inventor
Yasuhiro Mochizuki
Akio Mimura
Tatsuya Kamei
Masahiro Okamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56149546A priority Critical patent/JPS5852830A/ja
Publication of JPS5852830A publication Critical patent/JPS5852830A/ja
Publication of JPS644665B2 publication Critical patent/JPS644665B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/60—

Landscapes

  • Formation Of Insulating Films (AREA)
  • Electrodes Of Semiconductors (AREA)
JP56149546A 1981-09-24 1981-09-24 高耐圧半導体装置 Granted JPS5852830A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56149546A JPS5852830A (ja) 1981-09-24 1981-09-24 高耐圧半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56149546A JPS5852830A (ja) 1981-09-24 1981-09-24 高耐圧半導体装置

Publications (2)

Publication Number Publication Date
JPS5852830A JPS5852830A (ja) 1983-03-29
JPS644665B2 true JPS644665B2 (enExample) 1989-01-26

Family

ID=15477509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56149546A Granted JPS5852830A (ja) 1981-09-24 1981-09-24 高耐圧半導体装置

Country Status (1)

Country Link
JP (1) JPS5852830A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61248481A (ja) * 1985-04-25 1986-11-05 Nippon Denso Co Ltd 半導体装置の製造方法
US6627511B1 (en) 1995-07-28 2003-09-30 Motorola, Inc. Reduced stress isolation for SOI devices and a method for fabricating

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51130171A (en) * 1975-05-07 1976-11-12 Sony Corp Semiconductor device
JPS57113257A (en) * 1981-01-06 1982-07-14 Oki Electric Ind Co Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS5852830A (ja) 1983-03-29

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