JPS6439022A - Electron beam system - Google Patents
Electron beam systemInfo
- Publication number
- JPS6439022A JPS6439022A JP19570287A JP19570287A JPS6439022A JP S6439022 A JPS6439022 A JP S6439022A JP 19570287 A JP19570287 A JP 19570287A JP 19570287 A JP19570287 A JP 19570287A JP S6439022 A JPS6439022 A JP S6439022A
- Authority
- JP
- Japan
- Prior art keywords
- blanking
- electron beam
- aligning coil
- lenses
- constitution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19570287A JPS6439022A (en) | 1987-08-04 | 1987-08-04 | Electron beam system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19570287A JPS6439022A (en) | 1987-08-04 | 1987-08-04 | Electron beam system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6439022A true JPS6439022A (en) | 1989-02-09 |
Family
ID=16345557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19570287A Pending JPS6439022A (en) | 1987-08-04 | 1987-08-04 | Electron beam system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6439022A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008235571A (ja) * | 2007-03-20 | 2008-10-02 | Canon Inc | 露光装置及びデバイス製造方法 |
US20140203185A1 (en) * | 2013-01-18 | 2014-07-24 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
-
1987
- 1987-08-04 JP JP19570287A patent/JPS6439022A/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008235571A (ja) * | 2007-03-20 | 2008-10-02 | Canon Inc | 露光装置及びデバイス製造方法 |
US20140203185A1 (en) * | 2013-01-18 | 2014-07-24 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
JP2014138175A (ja) * | 2013-01-18 | 2014-07-28 | Nuflare Technology Inc | 荷電粒子ビーム描画装置、試料面へのビーム入射角調整方法、および荷電粒子ビーム描画方法 |
US9236223B2 (en) * | 2013-01-18 | 2016-01-12 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
US10192712B2 (en) | 2013-01-18 | 2019-01-29 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
US11145483B2 (en) | 2013-01-18 | 2021-10-12 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
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