JPS57157442A - Electrostatic deflecting electron gun - Google Patents
Electrostatic deflecting electron gunInfo
- Publication number
- JPS57157442A JPS57157442A JP4337781A JP4337781A JPS57157442A JP S57157442 A JPS57157442 A JP S57157442A JP 4337781 A JP4337781 A JP 4337781A JP 4337781 A JP4337781 A JP 4337781A JP S57157442 A JPS57157442 A JP S57157442A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- deflecting
- electron beam
- shield
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/70—Arrangements for deflecting ray or beam
- H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
- H01J29/74—Deflecting by electric fields only
Abstract
PURPOSE:To prevent drop of deflection sensitivity by arranging an electrode to restrict the diameter of electron beam between the X-Y shield and X deflection electrodes. CONSTITUTION:An Y deflecting electrode 3, X-Y shield electrode 4 and X deflecting electrode 5 are installed in the sequence named in front of the group or grid electrodes 2 to accelerate and focus the electron beam 1 emitted by a cathode and thereby an electrostatic deflecting electron gun is formed. Between said X-Y shield 4 and X deflecting 5 electrodes is interposed an electrode 10 having a beam passing hole, which is so designed as to throat the configuration of the electron beam 1 lenghtwise in the Y direction and widthwise in the X direction, and this shall be kept at 0 volt. Accordingly, the configuration of the electron beam 1 spread is absorbed by the electrode 10, not by the X deflecting electrode, which will eliminate drop of deflecting voltage and thereby prevent the deflection sensitivity from lowering.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4337781A JPS57157442A (en) | 1981-03-24 | 1981-03-24 | Electrostatic deflecting electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4337781A JPS57157442A (en) | 1981-03-24 | 1981-03-24 | Electrostatic deflecting electron gun |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57157442A true JPS57157442A (en) | 1982-09-29 |
Family
ID=12662127
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4337781A Pending JPS57157442A (en) | 1981-03-24 | 1981-03-24 | Electrostatic deflecting electron gun |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57157442A (en) |
-
1981
- 1981-03-24 JP JP4337781A patent/JPS57157442A/en active Pending
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