JPS6438747A - Production of photomask - Google Patents

Production of photomask

Info

Publication number
JPS6438747A
JPS6438747A JP19488387A JP19488387A JPS6438747A JP S6438747 A JPS6438747 A JP S6438747A JP 19488387 A JP19488387 A JP 19488387A JP 19488387 A JP19488387 A JP 19488387A JP S6438747 A JPS6438747 A JP S6438747A
Authority
JP
Japan
Prior art keywords
pattern
substrate
mask
printing
unit patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19488387A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0545944B2 (enrdf_load_stackoverflow
Inventor
Ryoji Tokari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP19488387A priority Critical patent/JPS6438747A/ja
Publication of JPS6438747A publication Critical patent/JPS6438747A/ja
Publication of JPH0545944B2 publication Critical patent/JPH0545944B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP19488387A 1987-08-04 1987-08-04 Production of photomask Granted JPS6438747A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19488387A JPS6438747A (en) 1987-08-04 1987-08-04 Production of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19488387A JPS6438747A (en) 1987-08-04 1987-08-04 Production of photomask

Publications (2)

Publication Number Publication Date
JPS6438747A true JPS6438747A (en) 1989-02-09
JPH0545944B2 JPH0545944B2 (enrdf_load_stackoverflow) 1993-07-12

Family

ID=16331906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19488387A Granted JPS6438747A (en) 1987-08-04 1987-08-04 Production of photomask

Country Status (1)

Country Link
JP (1) JPS6438747A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0414812A (ja) * 1990-05-08 1992-01-20 Fujitsu Ltd パターン形成方法
US5362583A (en) * 1992-01-31 1994-11-08 Sharp Kabushiki Kaisha Reticle mask exposure method comprising blank to remove incomplete circuits
JP2004157327A (ja) * 2002-11-06 2004-06-03 Kawasaki Microelectronics Kk 半導体デバイス用マスク、および露光方法
JP2006278820A (ja) * 2005-03-30 2006-10-12 Nikon Corp 露光方法及び装置
JP2009088549A (ja) * 2008-12-01 2009-04-23 Kawasaki Microelectronics Kk 露光方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53104173A (en) * 1977-02-23 1978-09-11 Hitachi Ltd Master reticle for photo mask production

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53104173A (en) * 1977-02-23 1978-09-11 Hitachi Ltd Master reticle for photo mask production

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0414812A (ja) * 1990-05-08 1992-01-20 Fujitsu Ltd パターン形成方法
US5362583A (en) * 1992-01-31 1994-11-08 Sharp Kabushiki Kaisha Reticle mask exposure method comprising blank to remove incomplete circuits
JP2004157327A (ja) * 2002-11-06 2004-06-03 Kawasaki Microelectronics Kk 半導体デバイス用マスク、および露光方法
JP2006278820A (ja) * 2005-03-30 2006-10-12 Nikon Corp 露光方法及び装置
JP2009088549A (ja) * 2008-12-01 2009-04-23 Kawasaki Microelectronics Kk 露光方法

Also Published As

Publication number Publication date
JPH0545944B2 (enrdf_load_stackoverflow) 1993-07-12

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