JPS643663A - Forming method for fine pattern - Google Patents

Forming method for fine pattern

Info

Publication number
JPS643663A
JPS643663A JP15792787A JP15792787A JPS643663A JP S643663 A JPS643663 A JP S643663A JP 15792787 A JP15792787 A JP 15792787A JP 15792787 A JP15792787 A JP 15792787A JP S643663 A JPS643663 A JP S643663A
Authority
JP
Japan
Prior art keywords
pattern
resist pattern
polycrystal silicon
resist
sio2 film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15792787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH052981B2 (enrdf_load_stackoverflow
Inventor
Toru Watanabe
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP15792787A priority Critical patent/JPS643663A/ja
Publication of JPS643663A publication Critical patent/JPS643663A/ja
Publication of JPH052981B2 publication Critical patent/JPH052981B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP15792787A 1987-06-26 1987-06-26 Forming method for fine pattern Granted JPS643663A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15792787A JPS643663A (en) 1987-06-26 1987-06-26 Forming method for fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15792787A JPS643663A (en) 1987-06-26 1987-06-26 Forming method for fine pattern

Publications (2)

Publication Number Publication Date
JPS643663A true JPS643663A (en) 1989-01-09
JPH052981B2 JPH052981B2 (enrdf_load_stackoverflow) 1993-01-13

Family

ID=15660512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15792787A Granted JPS643663A (en) 1987-06-26 1987-06-26 Forming method for fine pattern

Country Status (1)

Country Link
JP (1) JPS643663A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0324550A (ja) * 1989-06-22 1991-02-01 Toshiba Corp パターン形成方法
JPH03293623A (ja) * 1989-12-29 1991-12-25 American Teleph & Telegr Co <Att> 回析格子を有する光学素子
EP1906229A3 (en) * 2006-01-20 2008-04-23 Palo Alto Research Center Incorporated Process for forming a feature by undercutting a printed mask
US7749916B2 (en) 2006-01-20 2010-07-06 Palo Alto Research Center Incorporated Additive printed mask process and structures produced thereby
KR20140001989A (ko) * 2010-12-27 2014-01-07 브레우어 사이언스 인코포레이션 개선된 패터닝 요구를 위해 작은 특징 부분(feature)을 패터닝하는 방법
JP2015090908A (ja) * 2013-11-06 2015-05-11 大日本印刷株式会社 パターン形成方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0324550A (ja) * 1989-06-22 1991-02-01 Toshiba Corp パターン形成方法
JPH03293623A (ja) * 1989-12-29 1991-12-25 American Teleph & Telegr Co <Att> 回析格子を有する光学素子
EP1906229A3 (en) * 2006-01-20 2008-04-23 Palo Alto Research Center Incorporated Process for forming a feature by undercutting a printed mask
US7498119B2 (en) 2006-01-20 2009-03-03 Palo Alto Research Center Incorporated Process for forming a feature by undercutting a printed mask
US7749916B2 (en) 2006-01-20 2010-07-06 Palo Alto Research Center Incorporated Additive printed mask process and structures produced thereby
KR20140001989A (ko) * 2010-12-27 2014-01-07 브레우어 사이언스 인코포레이션 개선된 패터닝 요구를 위해 작은 특징 부분(feature)을 패터닝하는 방법
JP2014507795A (ja) * 2010-12-27 2014-03-27 ブルーワー サイエンス アイ エヌ シー． 高度なパターン形成に必要な小型フィーチャのパターン形成プロセス
US9960038B2 (en) 2010-12-27 2018-05-01 Brewer Science, Inc. Processes to pattern small features for advanced patterning needs
JP2015090908A (ja) * 2013-11-06 2015-05-11 大日本印刷株式会社 パターン形成方法

Also Published As

Publication number Publication date
JPH052981B2 (enrdf_load_stackoverflow) 1993-01-13

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