JPH052981B2 - - Google Patents
Info
- Publication number
- JPH052981B2 JPH052981B2 JP15792787A JP15792787A JPH052981B2 JP H052981 B2 JPH052981 B2 JP H052981B2 JP 15792787 A JP15792787 A JP 15792787A JP 15792787 A JP15792787 A JP 15792787A JP H052981 B2 JPH052981 B2 JP H052981B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- film
- sio
- resist pattern
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 12
- 239000007791 liquid phase Substances 0.000 claims description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 11
- 235000002918 Fraxinus excelsior Nutrition 0.000 description 3
- 239000002956 ash Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15792787A JPS643663A (en) | 1987-06-26 | 1987-06-26 | Forming method for fine pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15792787A JPS643663A (en) | 1987-06-26 | 1987-06-26 | Forming method for fine pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS643663A JPS643663A (en) | 1989-01-09 |
| JPH052981B2 true JPH052981B2 (enrdf_load_stackoverflow) | 1993-01-13 |
Family
ID=15660512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15792787A Granted JPS643663A (en) | 1987-06-26 | 1987-06-26 | Forming method for fine pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS643663A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2930971B2 (ja) * | 1989-06-22 | 1999-08-09 | 株式会社東芝 | パターン形成方法 |
| EP0448869A1 (en) * | 1989-12-29 | 1991-10-02 | AT&T Corp. | Optical device including a grating structure |
| US7498119B2 (en) | 2006-01-20 | 2009-03-03 | Palo Alto Research Center Incorporated | Process for forming a feature by undercutting a printed mask |
| US7365022B2 (en) | 2006-01-20 | 2008-04-29 | Palo Alto Research Center Incorporated | Additive printed mask process and structures produced thereby |
| US9960038B2 (en) | 2010-12-27 | 2018-05-01 | Brewer Science, Inc. | Processes to pattern small features for advanced patterning needs |
| JP6206667B2 (ja) * | 2013-11-06 | 2017-10-04 | 大日本印刷株式会社 | パターン形成方法 |
-
1987
- 1987-06-26 JP JP15792787A patent/JPS643663A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS643663A (en) | 1989-01-09 |
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